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| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Super LIX-R |
| Price | Upon Request |
| Temperature Range (°C) | 0–50 |
| Heating/Cooling Rate (°C/min) | 0.01–1.5 |
| Temperature Accuracy (°C) | ±0.1 |
| Sample Diameter (mm) | Φ5 ±0.5 |
| Sample Length (mm) | 12–20 |
| Measurement Range (µm) | 20 |
| Resolution (nm) | <0.2 |
| CTE Detection Limit | 5 × 10⁻⁹ K⁻¹ |
| Thermal Stability | <±0.001 °C/min at 0.1 °C/min ramp |
| Atmosphere | Low-pressure He (100 Pa) |
| Sensor | PT-100 Platinum RTD (JIS C 1604-1997 Class A) |
| Laser | He-Ne, 632.8 nm, 5 mW (IEC 60825-1 Class 3B) |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model Series | PS, PSS |
| Heating Zone Width (PS) | 40 mm |
| Heating Zone Width (PSS) | 20 mm |
| Compatible Substrate Diameter | 50–300 mm |
| Application Scope | Rapid thermal processing (RTP), wafer annealing, solar cell sintering, FPD substrate heating, thin-metal foil annealing |
| Configuration | Modular assembly for extended heating zones |
| Compliance | Designed for integration into Class 100–1000 cleanroom-compatible production lines |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | HT-RTA59HD |
| Heating Method | High-Power Focused Halogen Lamp |
| Max Temperature | 1800 °C (achieved in ≤10 s for □15 mm samples) |
| Sample Chamber Atmosphere | Dual-gas inlet (N₂ and Ar), quartz tube encapsulation |
| Cooling | Forced-air cooling for lamp assembly |
| Form Factor | Benchtop, manual slide-rail sample loading |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | RHL-E Series |
| Heating Principle | Radiative heating via high-intensity near-infrared lamp array with water-cooled gold-coated elliptical reflector |
| Max Operating Temperature (E-type) | Up to 1200°C |
| Lamp Spectral Peak | ~1.15 µm |
| Reflector Material | Precision-polished aluminum substrate with vacuum-deposited Au coating |
| Cooling | Integrated water-circulation jacket for reflector and chamber housing |
| Sample Geometry Compatibility | Cylindrical/rod-shaped specimens |
| Reflective Geometry | Elliptical (E-series) |
| Compliance | Designed for ISO/IEC 17025-compliant lab environments |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | WET-1200 |
| Temperature Range (Static Drop) | Ambient to 1500 °C |
| Temperature Range (Extrusion Drop, optional) | Ambient to 1200 °C |
| Sample Substrate | Ø10 mm × 2 mm |
| Measurement Atmospheres | Vacuum, Controlled Gas Flow, Ambient Air |
| Measurement Methods | Static Drop Method, Optional Extrusion Drop Method |
| Application Scope | High-temperature wettability analysis of molten metals, alloys, glasses, and ceramics against solid substrates |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Advance Riko |
| Pricing | Available Upon Request |
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