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| Brand | AGUS |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SSP-1000 |
| Price Range | USD 110,000 – 138,000 |
| Maximum Substrate Diameter | φ100 mm |
| Thickness Uniformity | ±5% over φ100 mm area |
| RF Power Mode | Pulsed RF (13.56 MHz) |
| Gas Inlets | Standard 1, Optional 2 |
| Sputtering Orientation | Upward, Lateral, Downward (reconfigurable cubic chamber) |
| Target Compatibility | Metallic, Oxide (e.g., Al₂O₃, SiO₂), Nitride, and Magnetic Targets (optional) |
| Substrate Holder | Rotatable or Fixed |
| Viewport | Integrated Quartz Observation Window |
| Cathode Shielding | Removable Cathode Protection Plate with Integrated Sputter Timer for Thickness Estimation |
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