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Kegonas Instrument Trading (Shanghai) Co., Ltd.

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BrandAGUS
OriginJapan
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelSSP-1000
Price RangeUSD 110,000 – 138,000
Maximum Substrate Diameterφ100 mm
Thickness Uniformity±5% over φ100 mm area
RF Power ModePulsed RF (13.56 MHz)
Gas InletsStandard 1, Optional 2
Sputtering OrientationUpward, Lateral, Downward (reconfigurable cubic chamber)
Target CompatibilityMetallic, Oxide (e.g., Al₂O₃, SiO₂), Nitride, and Magnetic Targets (optional)
Substrate HolderRotatable or Fixed
ViewportIntegrated Quartz Observation Window
Cathode ShieldingRemovable Cathode Protection Plate with Integrated Sputter Timer for Thickness Estimation
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BrandAGUS
OriginJapan
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelSPS-Sx Series
PricingAvailable Upon Request
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BrandAGUS
OriginJapan
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelSPS-Rx Series
PricingAvailable Upon Request
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BrandADVANCE RIKO
OriginJapan
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelAPD
PricingUpon Request
Vacuum Chamber Dimensions400 × 400 × 300 mm (L×W×H)
Pumping System450 L/s Turbo-Molecular Pump
Plasma Source1 Standard, Up to 3 Optional
Operating PressureHigh Vacuum to Low-Pressure Reactive Gases (N₂, O₂, H₂, Ar)
Target GeometryCylindrical or Tubular, Ø10 mm × 17 mm
Target Resistivity< 0.01 Ω·cm
Capacitance Bank360 µF × 5 (Optional Configurations Available)
Pulse Frequency1–5 Hz
Discharge Voltage Range70–400 V (Max 150 V at 1800 µF)
Human-Machine InterfaceIndustrial Touchscreen Control Panel
APD-P Powder CollectorØ95 mm × 30 mm
Collection Rate13–20 cm³/h (Dependent on Particle Size & Density)
Rotation Speed1–50 rpm
APD-S Substrate HolderCompatible with 2-inch (50.8 mm) Wafers/Foils
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