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| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | MILA-5000 Series |
| Instrument Type | High-Vacuum Rapid Thermal Annealer |
| Sample Size | 2-inch wafer |
| Temperature Range | Ambient to 1200 °C |
| Max. Heating Rate | 50 °C/s |
| Cooling Rate | 30 °C/s |
| Temperature Accuracy | ±2.0 °C |
| Temperature Uniformity | ±2.0 °C |
| Base Vacuum (MILA-5000UHV) | 1×10⁻⁵ Pa |
| Atmosphere Options | Vacuum, N₂, Ar, O₂, forming gas, ambient air |
| Heating Source | Gold-coated infrared halogen lamps |
| Cooling Method | Integrated water-cooled chamber base |
| Control Interface | USB-connected PC software + front-panel touchscreen |
| Real-time Monitoring | Top quartz viewport + optional integrated CCD camera system |
| Optional Integration | Four-point probe resistivity measurement module |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | RTP-6 |
| Instrument Type | Standard Vacuum Rapid Thermal Annealing Furnace |
| Sample Size | 6-inch wafer |
| Temperature Range | RT to 1000 °C |
| Maximum Ramp Rate | 80 °C/s |
| Annealing Temperature Accuracy | ±0.5 °C |
| Temperature Uniformity | ±10 °C |
| Cooling | Water-cooled chamber (forced convection cooling enabled via optional chiller) |
| Heating Zones | 9 independently controlled zones |
| Atmosphere Control | Vacuum + continuous gas flow (N₂, O₂, forming gas, Ar, etc.) |
| Optional Accessories | Quartz shielding plate, pyrometer (for non-contact temperature monitoring), vacuum pump, recirculating water chiller |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SAL1000 Series |
| Substrate Size | 4-inch (φ100 mm) |
| Process Temperature | Up to 350 °C |
| Precursor Channels | 2 |
| Uniformity | ≤3% (1σ, across 4-inch wafer) |
| Vacuum Base Pressure | ≤5 Pa |
| Dimensions (W×H×D) | 582 × 450 × 410 mm |
| Weight | 50 kg |
| Optional Accessories | Powder deposition stage (0–45° tilt, 5 cm³ capacity), ozone generator, N₂ purge module, glovebox integration kit, precursor heaters (up to 200 °C), dry vacuum pump, exhaust abatement unit |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | Mila-5050 |
| Sample Diameter | 50 mm (2 inch) |
| Temperature Range | 25–1200 °C |
| Max. Heating Rate | 50 °C/s |
| Cooling Rate | 20 °C/s |
| Temperature Accuracy | ±1% of setpoint |
| Temperature Uniformity | ±1% across sample zone at 1000 °C |
| Vacuum Capability | Standard configuration supports low-vacuum rapid thermal processing |
| Control Interface | USB-connected PID temperature controller with real-time monitoring and programmable ramp/soak profiles |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SAL3000 |
| Substrate Size | Ø100 mm (4-inch) |
| Process Temperature Range | 350–800 °C |
| Precursor Channels | 6 |
| Uniformity | ≤3% (at Ø100 mm) |
| Dimensions (W × H × D) | 1418 × 1728 × 840 mm |
| Weight | 200 kg |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SAL-3000Plus |
| Substrate Size | 4-inch (100 mm) |
| Process Temperature Range | 350–800 °C |
| Number of Precursor Lines | 6 |
| Vacuum Base Pressure | ≤5 Pa |
| Film Thickness Uniformity | ≤3% @ 100 mm |
| System Dimensions (W × H × D) | 835 × 1644 × 700 mm |
| Weight | 160 kg |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | RHL-P Series |
| Sample Size | 1.2-inch (30.5 mm) wafers |
| Temperature Range | RT to 1350 °C |
| Max. Heating Rate | 50 °C/s |
| Max. Cooling Rate | 30 °C/s |
| Temperature Accuracy | ±3 °C |
| Temperature Uniformity | ±3 °C |
| Chamber Dimensions (varies by model) | Ø20 mm × 80 mm to Ø50 mm × 80 mm |
| Cooling Requirement | External recirculating water chiller (required) |
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