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| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | PuriSmart-100 |
| Application Level | Laboratory-Scale R&D |
| Instrument Type | High-Pressure Preparative HPLC System |
| Flow Rate Range | 0–50.00 mL/min (per pump) |
| Maximum Operating Pressure | 30 MPa |
| Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Baseline Noise | ±0.1 mAU (at 254 nm) |
| Baseline Drift | 0.2 mAU/h (at 254 nm) |
| Detection Modes | Dual-Wavelength UV-VIS, Online UV-VIS Spectral Scanning |
| Gradient Capability | Binary, Low-Delay Mixing |
| Fraction Collection | X-Y Robotic Fraction Collector |
| Software Compliance | Audit Trail, User Management, Data Integrity per FDA 21 CFR Part 11 & GLP Principles |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | PuriSmart-200 |
| Application Level | Laboratory-Scale R&D |
| Instrument Type | High-Pressure Preparative HPLC System |
| Flow Rate Range | 0–100 mL/min |
| Flow Accuracy | ±1.5% |
| Pressure Range | 0–30 MPa |
| Pressure Pulsation | < ±0.2 MPa |
| Wavelength Range | 190–850 nm (dual-wavelength simultaneous detection) |
| Wavelength Accuracy | ±1 nm |
| Wavelength Repeatability | 0.1 nm |
| Baseline Noise | ±0.1 mAU at 254 nm |
| Baseline Drift | 0.2 mAU/30 min at 254 nm |
| Sample Injection Volume | 5 mL (standard), customizable |
| Detector Light Source | Deuterium–Tungsten dual-lamp assembly |
| Monochromator | 1200-line/mm holographic grating |
| Fraction Collection | X-Y matrix-type collector |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | ScalePuri-100 |
| Application Level | Laboratory & Pilot-Scale |
| Instrument Type | Medium-to-High Pressure Preparative LC |
| Flow Rate Range | 0–100 mL/min (pump), up to 800 mL/min (gradient mixing) |
| Flow Accuracy | RSD = 0.5% |
| Flow Precision | RSD = 1% |
| Max Operating Pressure | 150 bar |
| Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Wavelength Repeatability | ±0.2 nm |
| Baseline Noise | 3 × 10⁻⁵ AU |
| Data Acquisition Rate | 5 Hz |
| Detection Mode | UV-VIS with Quad-Wavelength Real-Time Monitoring |
| Column Compatibility | Axial Compression Columns, 50–100 mm ID |
| Prep Capacity | Gram-scale (up to 100 g per run) |
| System Control | Fully Software-Driven with Audit Trail, User Management, and Electronic Signature Support |
| Brand | KEZHE Shanghai |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | FlashDoctor-1000 |
| Application Level | Laboratory-Scale |
| Instrument Type | High-Pressure Preparative Liquid Chromatography System |
| Flow Rate Range | 0–120 mL/min |
| Flow Accuracy | ±1.5% |
| Pressure Rating | 145 psi (1.0 MPa) |
| Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Spectral Bandwidth | 8 nm |
| Baseline Noise | ±0.2 mAU @ 254 nm |
| Baseline Drift | 0.2 mAU @ 254 nm |
| Fraction Collection | X-Y Robotic Matrix with 135-tube Capacity (standard 15 × 150 mm tubes) |
| Detection Options | Dual-Wavelength UV Detector (D₂ + Tungsten lamp) |
| Brand | KEZHE / KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Regional Classification | Domestic (China) |
| Model | PuriMaster-2000 |
| Application Level | Laboratory-Scale R&D |
| Instrument Type | High-Pressure Preparative Liquid Chromatography System |
| Flow Rate Range | 0–100 mL/min |
| Flow Accuracy | RSD ≤ 0.5% |
| Flow Precision | RSD ≤ 1.0% |
| Maximum Pressure | 4000 PSI (27.6 MPa) |
| Wavelength Range | 190–850 nm (dual-wavelength simultaneous detection) |
| Wavelength Accuracy | ±1 nm |
| Wavelength Repeatability | 0.2 nm |
| Baseline Noise | ±3×10⁻⁵ AU (254 nm) |
| Data Acquisition Rate | 5 Hz |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | PuriMaster-7000 |
| Application Level | Laboratory Grade |
| Instrument Type | High-Pressure Preparative Liquid Chromatograph |
| Flow Rate Range | 0–100 mL/min (customizable up to 200 mL/min) |
| Flow Accuracy | RSD ≤ 0.5% |
| Flow Precision | RSD ≤ 1.0% |
| Maximum Pressure | 4000 psi (27.6 MPa) |
| Wavelength Range | 190–850 nm (quad-wavelength simultaneous detection) |
| Wavelength Accuracy | ±0.2 nm |
| Wavelength Repeatability | ±0.4 nm |
| Baseline Noise | ≤3 × 10⁻⁵ AU |
| Data Acquisition Rate | 5 Hz |
| Autosampler Capacity | 42 or 144 positions |
| Fraction Collector Capacity | 160 × 15 × 150 mm test tubes |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | ScalePuri-150 |
| Application Level | Laboratory & Pilot-Scale |
| Instrument Type | High-Pressure Preparative Liquid Chromatograph |
| Flow Rate Range | 0.01–1000 mL/min |
| Flow Accuracy | ±2.0% |
| Flow Precision | ±1.5% (injector pump) |
| Maximum Pressure | 10 MPa (100 bar) |
| Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Baseline Noise | ±0.1 mAU @ 254 nm |
| Baseline Drift | 0.2 mAU/30 min @ 254 nm |
| Data Acquisition Rate | Not specified |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Model | ScalePuri-50 |
| Application Level | Pilot-Scale Laboratory |
| Instrument Type | High-Pressure Preparative Liquid Chromatograph |
| Maximum Flow Rate | 0–200 mL/min |
| Flow Accuracy | ±2.0% |
| Pressure Rating | Up to 20 MPa |
| Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Spectral Bandwidth | 8 nm |
| Baseline Noise | ±0.2 mAU (at 254 nm) |
| Baseline Drift | 0.5 mAU (at 254 nm) |
| Detection Modes | Quadruple Wavelength Simultaneous Monitoring |
| Column Compatibility | Axial Compression Columns (DAC50, ID 10–50 mm) |
| Fraction Collection | Volume-, Peak-, Time-, or Threshold-Triggered |
| Software Compliance | 21 CFR Part 11 Ready, Audit Trail, Electronic Signatures, User & Role Management |
| Regulatory Alignment | Designed for GLP/GMP environments, supports IQ/OQ/PQ validation |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | PrepChromaster-7000 |
| Application Level | Industrial-Scale Preparative |
| Instrument Type | High-Pressure Preparative Liquid Chromatograph |
| Flow Rate Range | 0–250 mL/min (single pump), 0–500 mL/min (dual pump) |
| Flow Accuracy | RSD ≤ 0.5% |
| Flow Precision | RSD ≤ 0.5% |
| Maximum Operating Pressure | 200 bar (standard), upgradable to 300 bar |
| Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Wavelength Repeatability | ±0.2 nm |
| Baseline Noise | 3 × 10⁻⁵ AU |
| Data Acquisition Rate | 5 Hz |
| Brand | KEZHE / KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic (China-Made) |
| Model | PuriMaster-5000 |
| Application Level | Laboratory-Scale |
| Instrument Type | High-Pressure Preparative HPLC |
| Flow Rate Range | 0–100 mL/min |
| Flow Accuracy | RSD ≤ 0.5% |
| Flow Precision | RSD ≤ 0.5% |
| Maximum Pressure | 4000 PSI (27.6 MPa) |
| Wavelength Range | 190–850 nm (simultaneous quad-wavelength detection) |
| Wavelength Accuracy | ±2 nm |
| Wavelength Repeatability | 0.4 nm |
| Baseline Noise | 3 × 10⁻⁵ AU |
| Data Acquisition Rate | 5 Hz |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | PuriMaster-3500C1 |
| Application Level | Laboratory-grade |
| Instrument Type | High-Pressure Preparative Liquid Chromatograph |
| Pump Pressure Rating | 300 bar |
| Flow Rate Range | 0–50 mL/min per pump |
| Flow Stability | ≤2% RSD |
| UV-Vis Detection Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Wavelength Repeatability | 0.2 nm |
| Detector Light Source | Dual-lamp system (Deuterium + Tungsten) |
| Fraction Collection | 6-port switching valve (standard) |
| Auto-sampler Quantitative Loop | 3 mL |
| Gradient Capability | Binary high-pressure mixing |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | PuriMaster-3000A |
| Application Level | Industrial-Scale Preparative |
| Instrument Type | Medium-to-Low Pressure Preparative LC |
| Flow Rate Range | 0–250 mL/min (single pump), 0–500 mL/min (dual pump) |
| Flow Accuracy | RSD = 0.5% |
| Flow Precision | RSD = 1.0% |
| Maximum Pressure | 50 bar (standard) |
| Wavelength Range | 190–850 nm (quad-wavelength simultaneous detection) |
| Wavelength Repeatability | ±0.2 nm |
| Baseline Noise | 3 × 10⁻⁵ AU |
| Data Acquisition Rate | 5 Hz |
| Brand | KEZHE Shanghai |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | FlashDoctor-1000Pro |
| Application Level | Laboratory-Scale |
| Instrument Type | High-Pressure Preparative Liquid Chromatograph |
| Flow Rate Range | 0–200 mL/min |
| Flow Accuracy | ±1.5% |
| Pressure Rating | 200 psi (13.8 bar) |
| Wavelength Range | 190–850 nm |
| Wavelength Accuracy | ±1 nm |
| Spectral Bandwidth | 8 nm |
| Baseline Noise | ±0.2 mAU @ 254 nm |
| Baseline Drift | 0.2 mAU/30 min @ 254 nm |
| Flow Path Configuration | Binary Solvent Delivery |
| Fraction Collection | X-Y Robotic Matrix (135-tube capacity, standard 15 × 150 mm tubes) |
| Detection Options | UV/Vis Detector (D₂ + Tungsten lamp), optional ELSD |
| Column Compatibility | Normal-phase (e.g., silica, 12 g & 25 g), reversed-phase (C18, 40 g), and empty loading columns (12 g) |
| Software Features | Method-based fraction triggering, peak integration & quantitation, audit trail, user management, lamp life monitoring, intensity calibration, TLC-guided method recommendation |
| Brand | KEZHE Shanghai |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | FlashDoctor-2000 |
| Application Level | Laboratory-Scale |
| Instrument Type | High-Pressure Preparative Liquid Chromatograph |
| Flow Rate Range | 0–300 mL/min |
| Flow Accuracy | ±2.0% |
| Flow Precision | <1.5% |
| Maximum Pressure | 300 psi (2.07 MPa) |
| Wavelength Range | 200–800 nm |
| Wavelength Accuracy | ±1 nm |
| Baseline Noise | ±0.2 mAU (at 254 nm) |
| Baseline Drift | 0.2 mAU/h (at 254 nm) |
| Spectral Bandwidth | 8 nm |
| Flow Cell Path Length | 0.3 mm |
| Detection Modes | UV-Vis (DAD), optional ELSD |
| Fraction Collection | 2D X-Y robotic collector (135-tube capacity, standard 15 × 150 mm tubes) |
| Column Compatibility | Reversible normal-phase and reversed-phase (e.g., C18), flash columns up to 40 mm ID |
| Software Compliance | Audit trail, user management, electronic signature support per FDA 21 CFR Part 11 requirements |
| System Architecture | Integrated benchtop unit, ventilated cabinet compatible |
| Brand | KEZHE SHANGHAI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | OEM Manufacturer |
| Product Category | Domestic |
| Model | PrepChromaster-8000 |
| Flow Rate Range | 0–200 mL/min (single pump), 0–400 mL/min (dual pump) |
| Flow Accuracy | RSD ≤ 0.5% |
| Flow Precision | RSD ≤ 1% |
| Maximum Pressure | 15 MPa |
| Wavelength Range | ±1 nm |
| Wavelength Repeatability | 0.2 nm |
| Baseline Noise | 3 × 10⁻⁵ AU |
| Data Acquisition Rate | 5 Hz |
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