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| Brand | Aurora |
|---|---|
| Origin | USA |
| Model | 1200 Plus |
| Instrument Type | Flame and Graphite Furnace AAS |
| Monochromator | Concave Grating |
| Optical System | Double-Beam |
| Detector | Photomultiplier Tube (PMT) |
| Background Correction | Zeeman and D₂ Lamp (1 kHz, Smith-Hieftje mode) |
| Wavelength Range | 185–900 nm |
| Atomizer Temperature Range (GFAAS) | Room Temperature to 3000 °C (programmable) |
| Heating Rate (GFAAS) | Up to 3800 K/s |
| Auto-sampler | Optional XYZ Robotic Sampler with On-line Pre-concentration (up to 100×) |
| Lamp Mount | 6-position Rotating Lamp Tower (4 standard + 2 high-intensity lamp power supplies) |
| Software Compliance | FDA 21 CFR Part 11–ready audit trail, electronic signature support, GLP/GMP data integrity features |
| Brand | Anric |
|---|---|
| Model | AT |
| Type | Desktop Atomic Layer Deposition (ALD) System |
| Origin | USA |
| Chamber Temperature Range | RT–350 °C |
| Precursor Source Temperature Range | RT–150 °C |
| Process Pressure Range | 0.1–1.5 Torr |
| Maximum Precursor Sources | 5 |
| Substrate Compatibility | Up to 4″ wafers (expandable to 6″) |
| Cycle Time | 6–10 cycles per minute |
| Control Interface | Touchscreen PLC |
| Chamber Architecture | Compact, R&D-Optimized |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | Mila-5000 Series |
| Instrument Type | High-Vacuum Rapid Thermal Annealing Furnace |
| Vacuum Level (Mila-5000UHV) | ≤1×10⁻⁵ Pa |
| Max Heating Rate | Up to 50 °C/s |
| Cooling Method | Integrated Water-Cooled Chamber |
| Atmosphere Options | Vacuum, Inert Gas (N₂, Ar), Ambient Air, Controlled Flow Gas |
| Sample Environment | O-Ring Sealed Quartz Tube |
| Real-Time Monitoring | Top-Mount Optical Viewport + Optional USB Camera Integration |
| Temperature Control | Built-in Programmable PID Controller with Dual Display (Setpoint vs. Actual) |
| Interface | USB 2.0 for PC-Based Program Configuration and Data Logging |
| Brand | Allied |
|---|---|
| Origin | USA |
| Model | MultiPrep™ |
| Sample Type | Cryogenic-compatible |
| Output Particle Size | ≥0.5 mm |
| Drive Motor | 0.5 HP (375 W) |
| Grinding Disk Speed | 5–350 RPM (5-RPM increments) |
| Z-axis Resolution | 1 µm |
| Tilt & Swing Adjustment Range | +10° / –2.5° (0.02° increment) |
| Sample Load Capacity | 0–600 g (100 g increments) |
| Dimensions (Standard) | 381 × 660 × 508 mm (W×D×H) |
| Weight (Standard) | 43 kg |
| Compliance | CE, ISO 9001-aligned design, GLP-ready architecture |
| Power Supply | 100–240 V, 50/60 Hz, single-phase |
| Brand | Anton Paar TriTec (formerly CSM, Switzerland) |
|---|---|
| Origin | Switzerland |
| Model | Lovis 2000 M/ME |
| Viscosity Range | 0.3–10,000 mPa·s |
| Repeatability | < 0.1 % |
| Reproducibility | < 0.5 % |
| Ball Fall Time Range | 0–250 s (up to 1000 s with extended mode) |
| Time Resolution | 0.001 s |
| Temperature Control Range | +5 to +100 °C |
| Temperature Stability | ±0.005 °C |
| Temperature Accuracy | < ±0.02 °C |
| Sample Volume | 0.1–0.8 mL |
| Power Supply | 100–240 V, 50–60 Hz, 190 VA |
| Dimensions (L×W×H) | 482 × 420 × 231 mm |
| Weight | 17 kg |
| Brand | Angstrom Sun |
|---|---|
| Origin | USA |
| Model | Angstrom Dep II |
| Substrate Size | 4", 6", 8", or 12" wafers |
| Process Temperature Range | 25–400 °C (optional extended range available) |
| Precursor Channels | 4 standard (upgradable to 6) |
| Uniformity | < 1% (1σ, across full wafer) |
| Footprint | 950 mm × 700 mm (W × D) |
| Cleanroom Compatibility | ISO Class 5 (Class 100) compliant |
| Deposition Modes | Thermal ALD, Plasma-Enhanced ALD (PE-ALD), and Powder ALD capable |
| Weight | Configurable (typical system: ~350 kg) |
| Brand | Angstrom |
|---|---|
| Origin | USA |
| Model | Angstrom-dep Powder ALD |
| Base Heating Range | 25–450 °C (optional up to 650 °C) |
| Substrate Uniformity | <1% (Al₂O₃ on 4″ wafer) |
| Precursor Lines | 4 / 6 / 8 configurable |
| Precursor Bottle Capacity & Temp | 100 mL, ambient to 250 °C |
| ALD Valves | Swagelok high-temp valves (150 / 200 / 250 °C options) |
| Carrier Gases | N₂ or Ar |
| Vacuum System | Alcatel mechanical pump (optional Pfeiffer turbomolecular or dry scroll pump) |
| Optional Modules | Load-lock chamber, glovebox integration, cryo-trap, ozone generator, plasma source, in-situ monitoring (QCM, ellipsometry, RGA), exhaust abatement |
| Brand | Angstrom |
|---|---|
| Origin | USA |
| Model | ELS5000 |
| Energy Resolution | 0.7 meV |
| Angular Resolution | 0.08° (momentum resolution ≈ 0.002 Å⁻¹ at 7.4 eV incident energy) |
| Optical Architecture | 4-grid tungsten electron optics, UHV-compatible, no polymer-coated or fiberglass-insulated wiring |
| Field of View | 103° |
| Electron Gun Diameter | 1.59 cm |
| Retractable Optics | Standard 2-inch to optional 4-inch retraction |
| Compatibility | AES-compatible, ARPES-integrated capable |
| Detection Modes | pA–nA current range with integrated lock-in amplifier and MCP detector |
| Brand | Anasys |
|---|---|
| Origin | USA |
| Model | nanoIR2-FS |
| Instrument Type | Laboratory Benchtop System |
| Core Principle | Photothermal Induced Resonance (PTIR) Coupled with Atomic Force Microscopy (AFM-IR) |
| Spectral Range | 1000–4000 cm⁻¹ (Standard Tunable Quantum Cascade Laser Source) |
| Spatial Resolution | <10 nm |
| Spectral Acquisition Speed | <3 s per spectrum |
| Data Sampling Interval | Adjustable down to 0.25 cm⁻¹ (FT-based spectral reconstruction) |
| Sample Mode | Ambient or Controlled Environment (N₂-purged optional) |
| Compatible Chemometrics Software | Anasys IR-Spectra™ (with NIST-compatible spectral libraries, ASTM E1421-22 compliant preprocessing) |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Model | AR-P 6200 |
| Product Type | Positive-tone e-beam resist |
| Key Variants | AR-P 6200.09 (standard), AR-P 6200.13 (thick-film), AR-P 6200.18 (ultra-thick), AR-P 6200.04 (low-temperature optimized) |
| Developer Compatibility | AR 600-546, AR 600-548, AR 600-55, AR 600-50/2 |
| Acceleration Voltage Range | 1–100 kV |
| Film Thickness Range | 50 nm – 1.5 µm |
| Sensitivity (AR-P 6200.09, 30 kV, AR 600-546) | ~55 µC/cm² (D₀), ~220 pC/cm² (10 nm trenches) |
| Contrast (γ) | 14.2 |
| Resolution | ≤6 nm (at 6 °C, optimized process) |
| Plasma Etch Resistance | High (CF₄ + O₂), superior to PMMA (AR-P 679.03) and ZEP 520A |
| Post-Exposure Bake (PEB) | Not required |
| Lift-off Capability | ≤20 nm metal lines, defined undercut tunable via dose |
| Two-Layer Compatibility | Validated with AR-P 617 series (e.g., AR-P 617.06) |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Model | SX AR-PC 5000/41 |
| Type | Acid-Resistant, Non-Photosensitive Protective Resist |
| Compatibility | KOH (40% w/w), HF (50% w/w) |
| Processing | Spin-Coatable |
| Regulatory Status | Import Product for Semiconductor Fabrication |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AR-N 4400 |
| Pricing | Available Upon Request |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AR-N 4600 (Atlas 46) |
| Pricing | Available Upon Request |
| Brand | Allresist |
|---|---|
| Origin | UK |
| Model | PMMA Electra 92 (AR-PC 50) |
| Formulation | Aqueous/isopropanol solution of polyaniline derivative |
| Application | Charge-dissipative topcoat for non-novolac e-beam resists |
| Removal | Post-exposure aqueous rinse |
| Compliance | Compatible with standard e-beam lithography workflows (JEOL, Raith, Zeiss systems) |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Semiconductor Process Chemicals |
| Model Range | AR Series |
| Pricing | Upon Request |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Product Type | Conductive Spin-Coatable Anticharging Coating for E-beam Lithography & SEM/FIB Imaging |
| Model | AR-PC 5090.02, AR-PC 5091.02 |
| Film Thickness | ~40 nm at 4000 rpm |
| Developer | Deionized Water |
| UV/E-beam Insensitivity | Yes |
| Compatibility | AR-PC 5090.02 — PMMA, CSAR 62, HSQ |
| Solubility Post-Exposure | Aqueous |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Model | SAL3000 |
| Substrate Compatibility | Up to φ100 mm (4-inch) |
| Maximum Precursor Channels | 6 |
| Uniformity | ≤3% @ 100 mm |
| Process Temperature Range | Ambient to 800 °C (with optional heater) |
| Precursor Temperature Control | Up to 200 °C |
| Vacuum System | Dry Pump Compatible |
| Exhaust Treatment | Optional Scrubber Integration |
| Software | Touchscreen GUI with ≥30 Programmable Recipes |
| System Architecture | Integrated Mainframe and Control Enclosure |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Model | AR-N7700 |
| Type | Chemically Amplified Negative Tone Resist |
| Exposure Modalities | Electron Beam (e-beam), Deep Ultraviolet (248 nm) |
| UV Transparency Range | 248–265 nm & 290–330 nm |
| Etch Resistance | High (Compatible with CF₄, CHF₃, O₂-based Plasma Etching) |
| Packaging | 100 mL amber glass bottles under nitrogen purge |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | AR-P 610 Series |
| Pricing | Upon Request |
| Origin | Finland |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | R-Series |
| Price Range | USD 135,000 – 270,000 (FOB Helsinki) |
| Substrate Size | 50–200 mm (2″–8″, 8″ available on request) |
| Process Temperature | Up to 500 °C |
| Precursor Channels | 2–6 (gas, vaporized liquid, or solid-source compatible) |
| Weight | 200 kg |
| Dimensions (W × H × D) | 70 × 105 × 92.5 cm |
| Uniformity | < ±1% across 200 mm wafers (typical, SiO₂ on Si) |
| Brand | RION (Japan) |
|---|---|
| Origin | Japan |
| Model | VM-54 |
| Weight | ~1 kg |
| Frequency Range | 1–80 Hz |
| Measurement Axes | X, Y, Z (simultaneous) |
| Output Options | 3-channel analog AC output |
| Data Storage | CF card (CSV format) |
| Compliance | ISO 6954:2000, ISO 2631-2 (Wm weighting) |
| Measurement Modes | Acceleration (m/s²) or Velocity (mm/s) |
| Sensor Compatibility | PV-83C (triaxial) or PV-57 (uniaxial) |
| Operating Temperature | −10 to +50 °C |
| Relative Humidity | ≤90% RH |
| Power Supply | 4 × IEC R14 (C-size) alkaline batteries (16 h continuous operation) |
| Dimensions | 200 × 56 × 175 mm |
| Display | Dual LCD (primary + secondary) |
| Data Capacity | Up to 50,000 records (with VX-54WS card) |
| Optional Analysis Modules | VX-54WS (ship vibration), VX-54WB (human vibration), VX-54WH (power tool vibration), VX-54FT (FFT spectral analysis) |
| Environmental Protection | Water-resistant carrying case |
| Origin | Sichuan, China |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic (China) |
| Model | G-33D4 |
| Pricing | Available Upon Request |
| Exposure Mode | Contact Printing |
| Resolution | 1 µm (at 10× line depth ratio) |
| Light Source | High-Stability 365 nm UV LED |
| Illumination Uniformity | ±3% |
| Exposure Area | 110 mm × 110 mm |
| UV Intensity Range | 0–30 mW/cm² (adjustable) |
| Beam Divergence | ≤3° |
| UV Source Lifetime | ≥20,000 hours |
| Operating Surface Temperature | ≤30 °C |
| Alignment Accuracy | ≤1 µm |
| Optical Magnification | 91× to 570× (software-enhanced digital zoom) |
| Control System | 4-inch PLC with OMRON timing relay (0.1–999.9 s exposure) |
| Vacuum System | Direct-coupled vacuum pump with dual-stage anti-vibration isolation |
| Microscopy | Dual-field upright or horizontal stereo microscope with four 1/3″ CCD cameras and real-time imaging memory |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Kosaka SE-500-59 |
| Price Range | USD 42,000 – 56,000 |
| Measurement Principle | Contact Stylus Profilometry (ISO 3274, ISO 4287, ISO 11562 compliant) |
| Vertical Measurement Range | ±400 µm (800 µm total) |
| Vertical Resolution | 0.08 nm |
| Horizontal Measurement Length | 55 mm (extendable to 81 mm via multi-trace stitching) |
| Straightness Accuracy | ≤0.3 µm over 55 mm |
| Stylus Tip Radius | 2 µm diamond |
| Stylus Force | 0.75 mN |
| Scan Speeds | 0.05–2.0 mm/s (6 discrete speeds + high-speed positioning) |
| Filter Types | Gaussian, 2RC, Special Gaussian |
| Cutoff Wavelengths (Roughness) | λc = 0.08, 0.25, 0.8, 2.5, 8.0 mm |
| Cutoff Wavelengths (Waviness) | λf = 0.8, 2.5, 8.0, 25.0 mm |
| Evaluation Parameters | 120+ standardized parameters per ISO, JIS, ANSI/ASME B46.1, and DIN 4768 |
| Display | 640×480 RGB TFT color LCD with capacitive touchscreen |
| Data Storage | USB flash drive (up to 8 GB) |
| Interface | RS-232 serial output |
| Power Supply | AC 90–240 V, 50/60 Hz, 200 VA |
| Brand | Thermo Fisher Scientific |
|---|---|
| Origin | Netherlands |
| Model | Tundra |
| Acceleration Voltage | 200 kV (standard configuration) |
| Magnification Range | ×50 to ×1,000,000 |
| Specimen Stage | Single-tilt cryo-transfer holder with automated loading |
| Minimum Information Limit | ≤3.5 Å under optimal conditions (SPA workflow) |
| Footprint | 3.2 m × 2.8 m (including shielding and service clearance) |
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