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| Brand | Angstrom |
|---|---|
| Origin | USA |
| Model | Angstrom-dep Powder ALD |
| Base Heating Range | 25–450 °C (optional up to 650 °C) |
| Substrate Uniformity | <1% (Al₂O₃ on 4″ wafer) |
| Precursor Lines | 4 / 6 / 8 configurable |
| Precursor Bottle Capacity & Temp | 100 mL, ambient to 250 °C |
| ALD Valves | Swagelok high-temp valves (150 / 200 / 250 °C options) |
| Carrier Gases | N₂ or Ar |
| Vacuum System | Alcatel mechanical pump (optional Pfeiffer turbomolecular or dry scroll pump) |
| Optional Modules | Load-lock chamber, glovebox integration, cryo-trap, ozone generator, plasma source, in-situ monitoring (QCM, ellipsometry, RGA), exhaust abatement |
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