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| Brand | Allresist |
|---|---|
| Origin | Germany |
| Model | AR-P 6200 |
| Product Type | Positive-tone e-beam resist |
| Key Variants | AR-P 6200.09 (standard), AR-P 6200.13 (thick-film), AR-P 6200.18 (ultra-thick), AR-P 6200.04 (low-temperature optimized) |
| Developer Compatibility | AR 600-546, AR 600-548, AR 600-55, AR 600-50/2 |
| Acceleration Voltage Range | 1–100 kV |
| Film Thickness Range | 50 nm – 1.5 µm |
| Sensitivity (AR-P 6200.09, 30 kV, AR 600-546) | ~55 µC/cm² (D₀), ~220 pC/cm² (10 nm trenches) |
| Contrast (γ) | 14.2 |
| Resolution | ≤6 nm (at 6 °C, optimized process) |
| Plasma Etch Resistance | High (CF₄ + O₂), superior to PMMA (AR-P 679.03) and ZEP 520A |
| Post-Exposure Bake (PEB) | Not required |
| Lift-off Capability | ≤20 nm metal lines, defined undercut tunable via dose |
| Two-Layer Compatibility | Validated with AR-P 617 series (e.g., AR-P 617.06) |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Model | SX AR-PC 5000/41 |
| Type | Acid-Resistant, Non-Photosensitive Protective Resist |
| Compatibility | KOH (40% w/w), HF (50% w/w) |
| Processing | Spin-Coatable |
| Regulatory Status | Import Product for Semiconductor Fabrication |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AR-N 4400 |
| Pricing | Available Upon Request |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AR-N 4600 (Atlas 46) |
| Pricing | Available Upon Request |
| Brand | Allresist |
|---|---|
| Origin | UK |
| Model | PMMA Electra 92 (AR-PC 50) |
| Formulation | Aqueous/isopropanol solution of polyaniline derivative |
| Application | Charge-dissipative topcoat for non-novolac e-beam resists |
| Removal | Post-exposure aqueous rinse |
| Compliance | Compatible with standard e-beam lithography workflows (JEOL, Raith, Zeiss systems) |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Semiconductor Process Chemicals |
| Model Range | AR Series |
| Pricing | Upon Request |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Product Type | Conductive Spin-Coatable Anticharging Coating for E-beam Lithography & SEM/FIB Imaging |
| Model | AR-PC 5090.02, AR-PC 5091.02 |
| Film Thickness | ~40 nm at 4000 rpm |
| Developer | Deionized Water |
| UV/E-beam Insensitivity | Yes |
| Compatibility | AR-PC 5090.02 — PMMA, CSAR 62, HSQ |
| Solubility Post-Exposure | Aqueous |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Model | AR-N7700 |
| Type | Chemically Amplified Negative Tone Resist |
| Exposure Modalities | Electron Beam (e-beam), Deep Ultraviolet (248 nm) |
| UV Transparency Range | 248–265 nm & 290–330 nm |
| Etch Resistance | High (Compatible with CF₄, CHF₃, O₂-based Plasma Etching) |
| Packaging | 100 mL amber glass bottles under nitrogen purge |
| Brand | Allresist |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | AR-P 610 Series |
| Pricing | Upon Request |
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