- All
- Favorite
- Popular
- Most rated
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS 7f-GEO |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Beam Energy | 1–23 keV |
| Mass Range | 1–360 Da |
| Mass Resolution (M/ΔM) | <20,000 |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS 7f-Auto |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Ion Beam Energy Range | 1–15 keV |
| Mass Range | 1–360 Da |
| Mass Resolution (M/ΔM) | >20,000 |
| Ion Sources | O₂⁺ and Cs⁺ reactive primary ion sources |
| Depth Profiling Capability | High depth resolution & high dynamic range (>10⁶) |
| Automation | Fully motorized sample storage chamber with auto-load/unload, coaxial primary ion gun, remote operation support |
| Detection Limit | Sub-ppq (parts-per-quadrillion) for selected elements in matrix-matched standards |
| Reproducibility | RSD < 0.5% for repeated analyses under standardized conditions |
| Brand | Cameca |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | LEAP 5000 |
| Price Range | USD 6.2–6.9 million (FOB) |
| Acceleration Voltage | Up to 20 kV |
| Magnification | Field-ion imaging resolution < 0.3 nm, atomic-scale 3D reconstruction |
| Detection Efficiency | > 37% (pulse mode), > 60% (laser mode) |
| Mass Resolution (m/Δm) | > 1,000 at 100 Da |
| Spatial Resolution | ≤ 0.3 nm lateral, ≤ 0.2 nm depth (in optimal conditions) |
| Data Acquisition Rate | Up to 1 million atoms/hour |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | AKONIS |
| Instrument Type | Magnetic Sector SIMS |
| Certification | SEMI S2/S8, E4, E5, E39, E84 Compliant |
| Automation Level | Full In-Line Integration |
| Minimum Measurement Spot Size | 20 µm |
| Positioning Accuracy | < 2 µm |
| Primary Ion Energy Range | < 150 eV (EXLIE Column) |
| Wafer Handling | Full-Size Patterned & Blank Wafer Compatible |
| Cost of Ownership | Optimized for High-Volume Semiconductor Fab Deployment |
| Regulatory Alignment | Designed for GLP/GMP-aligned process control environments |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS 1300-HR3 |
| Primary Beam Energy | 2–15 keV |
| Mass Range | 1–600 amu |
| Mass Resolution | 40,000 |
| Mass Analyzer Type | Magnetic Sector |
| Detector System | 10¹² Ω Faraday Cup + Multi-Collector Array |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | IMS Wf / SC Ultra |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Beam Energy Range | 150 eV – 13 keV |
| Mass Range | 1–360 Da |
| Mass Resolution (M/ΔM) | 20,000 |
| Sample Stage Capacity | Up to 300 mm wafer (IMS Wf) |
| Automation | Fully motorized sample transfer between load lock and analysis chamber |
| Compliance | Designed for GLP/GMP-aligned semiconductor process control environments |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | NanoSIMS 50L |
| Instrument Type | Magnetic Sector Mass Spectrometer |
| Primary Ion Beam Spot Size | ≥0.5 µm with ion current density ≥100 mA/cm² |
| Mass Range | >238 |
| Mass Resolution (M/ΔM) | >6000 |
| Brand | Cameca |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | EIKOS |
| Price Range | USD 3.2–3.8 million (FOB) |
| Acceleration Voltage | Not Applicable (Field Evaporation-Based Operation) |
| Magnification | Not Defined (Atom-by-Atom Reconstruction, Not Optical Imaging) |
| Brand | Cameca |
|---|---|
| Origin | France |
| Model | QUAD4550 |
| Instrument Type | Quadrupole SIMS |
| Primary Ion Beam Energy Range | 250 eV – 5 keV |
| Mass Range | 1–350 Da |
| Mass Resolution | Not Available |
| Base Pressure | ≤1×10⁻¹⁰ mbar (≤1×10⁻⁸ Pa) |
Show next