Ion Sputter Coaters
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Showing 31–45 of 45 results
| Origin | Japan |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SC-701MKII |
| Target Material | Au (standard), optional Pt, Pt-Pd, Au-Pd, Pd, Ag |
| Target Diameter | 49 mm |
| Control Method | Manual |
| Chamber Dimensions | 90 mm × 90 mm (D × H) |
| Sample Stage Diameter | 50 mm |
| Sputtering Gas | Argon (Ar) under high vacuum |
| Sputtering Mode | DC Magnetron Sputtering |
| Sputtering Time Range | 0–15 min (standard), up to 30 min in continuous mode |
| Operating Pressure | 5–30 Pa |
| High Voltage/Current | 1.2 kV / 9.9 mA |
| Gas Inlet Control | Precision needle valve |
| Pumping Speed | 20 L/min |
| Origin | Beijing, China |
|---|---|
| Manufacturer Type | Distributor |
| Origin Category | Domestic |
| Model | SD-160 |
| Price Range | USD 1,400 – 7,200 (est.) |
| Target Materials (Standard) | Au |
| Optional | Ag, Pt |
| Target Dimensions | 50 mm × 0.1 mm |
| Control Mode | Manual |
| Chamber Dimensions | Ø150 mm × H120 mm |
| Sample Stage Diameter | 70 mm |
| Sputtering Gases | Ar, N₂, O₂ |
| Max Sputtering Current | 30 mA (rated), 50 mA (peak) |
| Sputtering Rate | >4 nm/min (Au on Si under standard Ar conditions) |
| Input Power | 220 V AC, 50 Hz (110 V option available) |
| Vacuum Pump | High-performance two-stage rotary vane pump (integrated) |
| Brand | Shuyun |
|---|---|
| Origin | United Kingdom |
| Model | C60-20S |
| Operating Voltage Range | 5–20 kV |
| Beam Current | 50 nA |
| Spot Size | 100 µm |
| Scan Area | 4 × 4 mm |
| Source-to-Head Distance | 142 mm |
| Recommended Working Distance | 50 mm |
| Power Supply | 3U 19″ rack-mountable unit |
| Input Power | 110–240 VAC, 13 A, 50/60 Hz |
| Software Platform | Windows 10 or later |
| Integration Flange | NW 63 CF |
| Valve Type | Integrated gate valve |
| Brand | Ted Pella |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | 208HR |
| Target Material | Gold (Au) |
| Target Diameter | φ58 mm |
| Control Method | Programmable Digital Control |
| Chamber Dimensions | Ø120 mm × H120 mm |
| Sample Stage Capacity | 12 SEM stubs |
| Stage Height Adjustment Range | 50 mm |
| Sputtering Gas | Air or Argon |
| Base Pressure | 1 × 10⁻⁵ mbar |
| Pumping Speed | 300 L/min at 0.1 mbar |
| Pumpdown Time | ≤60 s to 1 × 10⁻³ mbar |
| Operating Pressure Range | 0.2–0.005 mbar |
| Deposition Rate Tunability | 0.002–1.0 nm/s |
| Current Selection | 20/40/60/80 mA (digitally selectable) |
| Magnetron Type | Low-Voltage Planar Magnetron |
| Safety Interlock | Yes |
| Vacuum Gauge | Analog + digital readout |
| Optional Thickness Monitor | MTM-20 Quartz Crystal Microbalance |
| Brand | Ted Pella |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | M108C |
| Target Material | Carbon Rod |
| Target Dimensions | Ø5 mm × 100 mm |
| Control Mode | Fully Automatic with Manual Override |
| Chamber Dimensions | Ø120 mm × H120 mm |
| Sample Stage | 12-position holder with 50 mm vertical adjustability |
| Sputtering Gas | Air or Argon |
| Operating Voltage Range | Adjustable (Manual Mode) |
| Current Range | 0–200 mA |
| Ultimate Vacuum | ≤0.01 mbar |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | ETD-2000 |
| Target Material | Gold (Au), 50 mm diameter × 0.1 mm thickness |
| Control Method | Manual |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage | Ø50–70 mm, vertically adjustable |
| Sputtering Gases | Multiple inert gases (e.g., Ar, N₂, Kr) |
| Maximum DC Voltage | −1600 V |
| Ion Current Range | 0–50 mA |
| Ultimate Vacuum | ≤ 4 × 10⁻² mbar |
| Timer Range | 0–3600 s |
| Pumping System | VRD-8 rotary vane pump (2 L/s) |
| Input Power | 220 V AC, 50 Hz (110 V option available) |
| Overall Dimensions | 305 mm × 365 mm × 325 mm (W × D × H) |
| Sealing | Ceramic high-voltage feedthroughs + vacuum-grade rubber edge seal |
| Brand | VPI |
|---|---|
| Model | ETD-2000C |
| Target Material | Au or Pt |
| Target Diameter | 50 mm |
| Control Mode | Manual |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage Diameter | 50–70 mm |
| Sputtering Gas | Multiple inert gases (Ar, N₂, etc.) |
| Sputtering Voltage | 0–1600 V DC |
| Sputtering Current | 0–50 mA |
| Sputtering Timer | 0–360 s |
| Carbon Evaporation Current | 0–100 A AC |
| Carbon Evaporation Voltage | 0–30 V AC |
| Evaporation Time | 0–1 s |
| Chamber Material | Borosilicate glass |
| Vacuum Pump | VRD-8 rotary vane pump (2 L/min) |
| Input Power | 220 V / 50 Hz (optional 110 V) |
| Brand | VPI |
|---|---|
| Model | ETD-800 |
| Target Material | Au (standard), optional Pt, Ag, Cr, Al, Cu |
| Target Diameter | 50 mm |
| Chamber Dimensions | Ø100 mm × 100 mm (H) |
| Sample Stage Diameter | 50 mm |
| Sputtering Gas | Air (ambient air used as sputtering medium) |
| Control Mode | Fully Automatic |
| Vacuum System | Integrated single-stage rotary vane pump (1 L/s) |
| Maximum DC Bias Voltage | −1200 V |
| Timer Range | 0–3600 s (digital, ±1 s resolution) |
| Chamber Material | Borosilicate glass |
| Power Supply | 220 V AC, 50 Hz (optional 110 V configuration available) |
| Unit Dimensions | 310 mm × 260 mm × 115 mm (W × D × H) |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-2000Ⅲ |
| Target Materials | Au, Pt, Ag (Ø50 mm) |
| Control Mode | Automatic sample stage rotation synchronized with selected target |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage | Ø50–70 mm, vertically adjustable |
| Sputtering Gases | Ar, N₂, and other process gases |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-3000 |
| Target Material (Standard) | Au (50 mm × 0.1 mm thickness) |
| Optional Targets | Ag, Pt, Ir, Cu |
| Sputtering Gases | Ar, N₂, and other inert/reactive gases |
| Chamber Dimensions | Ø150 mm × 120 mm (H) |
| Sample Stage Diameter | 50 mm |
| Maximum Sputtering Voltage | –2800 V DC |
| Max Sputtering Current | 50 mA |
| Ultimate Vacuum | ≤ 4 × 10⁻² mbar |
| Timer Range | 1–360 s |
| Vacuum Pump | VRD-8 rotary vane pump (2 L/s) |
| Control Method | Manual analog interface with CPU-assisted timing and interlock logic |
| Compliance | Designed for GLP-aligned sample prep workflows in SEM labs |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-800C |
| Target Material | Carbon Fiber |
| Target Diameter | 5 mm |
| Chamber Dimensions (ID) | 170 mm × 130 mm (D × H) |
| Sample Stage Diameter | 70 mm |
| Operating Vacuum | 4 × 10⁻² mbar |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Current | 0–100 A |
| Deposition Time Range | 0–1 s |
| Vacuum Pump | 2 L/min Two-Stage Rotary Vane Pump (Feiyue VRD-8) |
| Chamber Material | Borosilicate Glass |
| Power Supply | AC, 220 V, 50 Hz |
| External Dimensions | 340 mm × 390 mm × 300 mm (W × D × H) |
| Control Mode | Manual |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900 |
| Target Materials | Au, Pt, Ag |
| Target Diameter | 50 mm |
| Control Method | Microprocessor-Based Electronic Control |
| Chamber Dimensions | Ø160 mm × 120 mm (H) |
| Sample Stage Diameter | 50–70 mm (customizable) |
| Sputtering Gases | Ar, N₂, Air |
| Vacuum Gauge Range | 1 × 10⁻³ to 1 × 10³ mbar |
| Max DC Voltage | −1600 V |
| Max Sputtering Current | 50 mA |
| Current Stability | ±0.1 mA |
| Timer Range | 0–999 s |
| Base Pump | 2 L/s VRD-8 Rotary Vane Pump |
| Chamber Material | Borosilicate Glass |
| Power Supply | 220 V AC, 50 Hz (110 V optional) |
| Weight | ~35 kg |
| Dimensions (W×D×H) | 300 × 360 × 380 mm |
| Brand | VPI (BoYuan Micro-Nano) |
|---|---|
| Origin | Beijing, China |
| Model | SD-900C |
| Sputtering Target Materials | Au, Ag, Pt, Cr, Al, Cu |
| Target Dimensions | Ø50 mm × 0.12 mm |
| Sputtering Voltage Range | 0–1600 V DC |
| Sputtering Current Range | 0–50 mA |
| Sputtering Time Control | 0–360 s |
| Carbon Evaporation Current | 0–100 A AC |
| Evaporation Voltage | 0–30 V AC |
| Evaporation Time | 0–1 s |
| Chamber Material | Borosilicate Glass |
| Chamber Dimensions | 160 mm × 110 mm (D × H) |
| Sample Stage Diameter Range | Ø50–70 mm |
| Sputtering Gases | Ar, N₂, O₂ |
| Vacuum System | VRD-8 Rotary Vane Pump (2 L/min) |
| Input Power | 220 V / 50 Hz (optional 110 V configuration) |
| Brand | VPI |
|---|---|
| Model | SD-980 |
| Type | Thermal Evaporation Coater |
| Origin | Beijing, China |
| Target Material | Carbon Fiber Rope |
| Target Diameter | 30 mm |
| Chamber Dimensions (W×D×H) | 340 × 390 × 300 mm |
| Sample Stage Diameter | 70 mm |
| Vacuum Chamber (D×H) | 160 × 110 mm (Borosilicate Glass) |
| Ultimate Vacuum | 5 Pa |
| Evaporation Current Range | 50–80 A |
| Pulse Count Setting | 0–9 pulses |
| Control Interface | Touchscreen HMI |
| Power Supply | 220 V AC, 50 Hz, Grounded |
| Pump | VRD-8 Rotary Vane Pump (2 L/min) |
| Weight | ~50 kg |
| Max. Power Consumption | 1.6 kW |
| Sputtering Gas Required | None |
| Brand | VPI |
|---|---|
| Origin | Beijing, China |
| Model | SD-981M |
| Target Material | Gold (Au), 50 mm diameter |
| Target Thickness | 0.1 mm |
| Control Mode | Automatic & Manual |
| Chamber Dimensions | 180 mm (Ø) × 130 mm (H) |
| Sample Stage Diameter | 70 mm |
| Sputtering Gases | Multiple configurable (Ar, Au/Ar mix, etc.) |
| Vacuum Range | Adjustable 2–15 Pa (base vacuum ≤1 Pa) |
| Sputtering Current | 0–50 mA (adjustable) |
| Timer Range | 0–600 s (digital) |
| Deposition Rate | 0–60 nm/min |
| Pumping System | VRD-8 rotary vane pump |
| Power Supply | 220 V, 50 Hz |
| Rated Power | 100 W |
| Vacuum Gauge | Pirani sensor |
| Touchscreen Interface | 4-inch VPI HMI |