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Beijing Liangtuo Technology Co., Ltd.

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BrandELLITOP
OriginBeijing, China
ModelESH
Spectral Range190–2500 nm (customizable)
Spot Size≤200 µm (customizable, down to 1 µm)
Angle of IncidenceMotorized auto-adjustment from 30° to 90°
manual fine-tuning range40°–90°
Single-Measurement Time3–5 s (full spectrum)
Sample CompatibilitySupports 150 mm (6″), 200 mm (8″), and 300 mm (12″) wafers
Measurement CapabilityNanoscale film thickness (sub-Å resolution), complex refractive index (n, k), dielectric function (ε₁, ε₂), bulk optical constants
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BrandELLITOP
OriginBeijing, China
ModelEP800
Spectral Range245–1000 nm (customizable)
Incident Angles60° or 65° (selectable)
Measurement Repeatability0.01 nm
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BrandELLITOP (Beijing Ellitop Technology Co., Ltd.)
OriginBeijing, China
ModelEH300
Wavelength Range380–800 nm
Thickness Measurement Range0.05 µm – 50 µm
Measurement Accuracy±2 nm or ±0.2% of reading (whichever is greater)
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BrandELLITOP
OriginBeijing, China
ModelES01-PV
Spectral Range245–1000 nm (UV-Vis-NIR)
Spot SizeManually adjustable, 1–4 mm diameter
Angle of IncidenceManually adjustable, 40°–90° in 5° increments, repeatability ±0.02°
Single Measurement Time5–10 s for full Ψ/Δ spectrum acquisition
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BrandELLITOP
OriginBeijing, China
ModelEGS01
Spectral Range190–25000 nm (expandable)
Single-Measurement Duration5–10 s (full spectrum), <5 s (fast mode)
Sample Size Compatibility4″, 6″, 8″, 12″ wafers (customizable)
Spectral Resolution0.5 nm (190–1000 nm), 3.5 nm (1000–2500 nm)
Thickness Measurement Accuracy≤ ±0.5 nm
Refractive Index Accuracy≤ ±0.005
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BrandELLITOP
OriginBeijing, China
ModelEMPro-PV
Spot Size<1 mm
Incident Angle Range40°–90° (manually adjustable in 5° increments)
Single-Measurement Time0.6 s (typical)
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BrandELLITOP
OriginBeijing, China
Manufacturer TypeAuthorized Distributor
ModelES01
Spectral Range190–25000 nm
Spot SizeManually adjustable from 1–5 mm
Angle of Incidence(A) Motorized variable: 30°–90°
(M) Manual variable40°–90°
Measurement Speed≤0.05 s per spectrum (fastest)
Single Measurement Time1–2 s
Sample CompatibilitySupports 4″, 6″, 8″, and 12″ wafers (custom substrates available)
Spectral Resolution≤0.45 nm (190–1000 nm), ≤3.5 nm (1000–1700 nm), ≤7 nm (1700–2500 nm)
Thickness Accuracy≤0.4 nm (measured on 100 nm SiO₂ on Si reference standard)
Thickness Repeatability±0.005 nm
Refractive Index Repeatability±0.0002
Direct Beam AccuracyΨ = 45° ±0.075°, Δ = 0° ±0.05° (10 s averaging, ≥95% of spectral range)
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BrandELLITOP
OriginBeijing, China
ModelET8100A
Measurement PrincipleSpectroscopic Ellipsometry (SE) + Spectral Reflectometry (SR)
Wafer Diameter Options100 mm, 150 mm, 200 mm, 300 mm
Substrate Thickness Range (measurable)up to 2000 µm
Film Thickness Range0.1 nm – 120 µm
Homogeneous Film Thickness Range (substrate = film material)0.3 µm – 30 µm
ComplianceASTM F1530, ISO/IEC 17025 (when configured per lab accreditation requirements), supports GLP/GMP data integrity workflows
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BrandELLITOP
OriginBeijing, China
ModelEMPro
Incidence Angle Range40°–90° (manual adjustment in 5° increments)
Single-Measurement Time≤0.6 s (typical)
Measurement PrincipleNull-ellipsometry with rotating analyzer (RA) configuration
Delta Range0°–360° continuous
SensitivitySub-angstrom thickness resolution for ultra-thin films
Alignment SystemIntegrated high-resolution video auto-collimation stage
Software ArchitectureWindows-based, compliant with FDA 21 CFR Part 11 audit trail requirements
ComplianceSupports ISO/IEC 17025-compliant calibration documentation and GLP/GMP traceable reporting
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BrandELLITOP
OriginBeijing, China
ModelEIS01
Spectral Range (Vis)370–1000 nm
Incident AngleMotorized variable from 30° to 90°
Single-Wavelength Measurement Time~15 s (configuration-dependent)
Thickness Repeatability±0.05 nm
Refractive Index Repeatability±0.001
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