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| Brand | SPELS |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | LSS-3 |
| Pricing | Upon Request |
| Brand | Truth Instruments Company Limited |
|---|---|
| Origin | Shandong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | MCT 500 |
| Pricing | Available Upon Request |
| Brand | Spin-ION |
|---|---|
| Origin | France |
| Model | Helium-S® |
| Ion Species | He⁺ (also capable of H⁺ generation) |
| Implantation Energy Range | 1–30 keV |
| Energy Resolution | <50 eV |
| Beam Current Range | 1–50 μA (energy-dependent) |
| Typical Ion Flux | 1×10¹⁵ ions/cm²/min at 10 μA |
| Uniform Irradiation Area | 25 mm × 25 mm |
| Beam Uniformity | Intensity ±1%, Angular ±3° |
| Beam Purity | ≥99.99% (1:10⁴ contaminant ratio) |
| Vacuum Base Pressure | ≤1×10⁻⁷ mbar |
| Ion Source | Electron Cyclotron Resonance (ECR) |
| Beam Filtering | Wien Filter |
| Scanning | X-Y electrostatic deflection |
| Sample Holder | 25 mm diameter wafers/disks |
| Optional Accessories | In-situ heating stage (up to 500 °C), angular tilt module, load-lock rapid transfer chamber |
| Compliance | Designed for integration into UHV systems |
| Brand | Sindin |
|---|---|
| Model | ST-2100MW |
| Origin | Guangdong, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Regional Classification | Domestic (PRC) |
| Pricing | Available Upon Request |
| Brand | MicroChem |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported |
| Model | SU-8 2000 and 3000 Series |
| Pricing | Available Upon Request |
| Brand | SUHWOO |
|---|---|
| Origin | South Korea |
| Model | Suhwoo STRIP GRINDER SG-2000X |
| Strip Width Range | 62–95 mm |
| Strip Length Capacity | up to 259 mm |
| Height Detection Repeatability | ±3 µm |
| Tool Change Time | <30 minutes |
| Spindle Type | Custom High-Precision Air-Bearing Spindle |
| Cleaning & Drying | Integrated Automated Rinse and Spin-Dry Module |
| Compliance | Designed for ISO 14644-1 Class 5 Cleanroom Integration |
| Control Interface | Touchscreen HMI with Recipe Management and Audit Trail Logging |
| Brand | Sumitomo |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SAW-20US |
| Price Range | USD 1,050,000 – 1,210,000 |
| Brand | SUNJUNE |
|---|---|
| Origin | Guangdong, China |
| Manufacturer | SUNJUNE Technology Co., Ltd. |
| Model | VP-RS15 |
| Etching Principle | Capacitively Coupled Plasma (CCP) |
| RF Power | 500 W |
| RF Frequency | 13.56 MHz |
| Etch Rate | High |
| Selectivity | PR/GaAs ≥ 4:1 |
| SiO₂/InP > 10 | 1 |
| Etch Profile | Isotropic |
| Residue Byproduct | CO₂ |
| Uniformity | <5% (across 4-inch wafer) |
| Aspect Ratio | ≥5:1 |
| Chamber Material | 304 Stainless Steel |
| Max. Operating Temperature | ≤45°C after 3 min full-power operation |
| Gas Inlets | 2 independent mass-flow-controlled ports |
| Vacuum Display | Digital real-time readout |
| Control Interface | 7-inch capacitive touchscreen with embedded control software (Software Copyright No.: 2021SR1026389) |
| Safety Features | Automatic door interlock, pressure-sensing lid detection, post-process venting sequence |
| Warranty | 24 months parts and labor |
| Brand | SUNJUNE |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Domestic |
| Model | VP-RS6 |
| Price Range | USD 7,000 – 14,000 |
| RF Power | 500 W |
| RF Frequency | 13.56 MHz |
| Chamber Material | 304 Stainless Steel |
| Max Operating Temperature (Chamber Wall) | ≤45 °C at Full Power (3 min) |
| Vacuum Display | Digital Pressure Readout |
| Gas Inlets | Dual Mass-Flow Controlled Ports |
| Control Interface | 7-inch Capacitive Touchscreen |
| Software Certification | China Copyright Registration No. 2021SR1026389 |
| Warranty | 24 Months Limited Hardware Warranty |
| Brand | SUNJUNE |
|---|---|
| Model | VS-Q Series |
| Origin | Guangdong, China |
| Manufacturer | SUNJUNE Technology Co., Ltd. |
| Construction | Stainless Steel Monolithic Enclosure |
| Vacuum Performance | ≤5 Pa (Mechanical Pump Only) / ≤1×10⁻⁵ Pa (MPU-90i Molecular Pump Unit) |
| Ultimate Vacuum (MPU-90i) | ≤1×10⁻⁶ Pa |
| Quartz Tube Dimensions Supported | OD 5–50 mm, Length 80–1500 mm |
| Rotation Speed | Adjustable |
| Vacuum Pumping Rate | Adjustable |
| Protective Gas Inlet Flow | Adjustable |
| Crystal Growth Capability | Black Phosphorus Crystals |
| Single-Crystal Growth Duration per Cycle | 12 h |
| Silicon Single-Crystal Constant-Diameter Length | 6 mm |
| Grown Crystal Diameter Range | 2–5 mm |
| Compliance | ASTM E29, ISO/IEC 17025 (for lab process validation), GLP-compliant operation mode supported |
| Control Interface | Touchscreen with IL Intelligent Logic Control Software |
| Operating Modes | Manual (independent mechanical pump control) & Automatic (interlocked mechanical + molecular pump sequencing) |
| Brand | SUNJUNE |
|---|---|
| Origin | Guangdong, China |
| Manufacturer | SUNJUNE Technology Co., Ltd. |
| Model | VS-Q1 |
| Crystal Type | Single Crystal |
| Max. Crystal Diameter | 2–5 mm |
| Isometric Growth Length (Si) | 6 mm |
| Typical Growth Cycle per Run | 10 h |
| Quartz Tube OD Range | 5–50 mm |
| Quartz Tube Length Range | 80–1500 mm |
| Base Pressure (Mechanical Pump) | < 5 Pa |
| Base Pressure (MPU-90i Molecular Pump Unit) | < 1×10⁻⁵ Pa |
| Ultimate Vacuum (MPU-90i w/ Full-Range Gauge) | ≤ 1×10⁻⁶ Pa |
| Rotational Speed | Adjustable |
| Vacuum Pumping Rate | Adjustable |
| Backfill Gas Flow | Adjustable |
| Compliance | CE-marked components, GLP-aligned operational logging capability |
| Brand | SUNJUNE |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | VS-Q2 |
| Crystal Growth Capability | Single Crystal |
| Typical Growth Cycle per Run | 12 h |
| Diameter Control Precision (for Si single crystal) | ±0.05 mm over 6 mm isometric section |
| Usable Crystal Diameter Range | 2–5 mm |
| Quartz Tube Compatibility | OD 5–50 mm, Length 80–1500 mm |
| Base Vacuum (Mechanical Pump Only) | <5 Pa |
| Ultimate Vacuum (MPU-90i Molecular Pump Unit) | ≤1×10⁻⁶ Pa |
| Rotational Speed Control | Adjustable (0–30 rpm) |
| Vacuum Pumping Rate | Adjustable |
| Backfill Gas Flow Control | Programmable |
| Control Interface | Touchscreen with IL Intelligent Logic (IL) software |
| Operating Modes | Manual (independent pump control) & Auto (interlocked mechanical + molecular pump sequencing) |
| Compliance | Designed for GLP-compliant lab environments |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Model | Glove Box Integrated |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C (customizable) |
| Precursor Channels | Up to 6 (solid & liquid sources supported, customizable) |
| Reactant Gas Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Channels | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5×10⁻³ Torr |
| Vacuum Pump | Standard oil-sealed rotary vane pump |
| Control System | 19″ industrial touch display, embedded IPC running Windows 7, PLC-based real-time control with fieldbus support |
| Source Bottle Heater | RT–200 °C |
| Glove Box Integration | Dual-glove, single-station configuration (customizable) |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PA Series |
| Process Temperature Range | RT to 450°C |
| Precursor Channels | Up to 4 (customizable), supporting solid & liquid precursors |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Monitoring | Triple corrosion-resistant capacitance manometers, 0.005–1000 Torr |
| Base Vacuum | <5×10⁻³ Torr |
| Heating Zone Temperature Range | RT to 150°C |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PEALD E200SP |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | Room Temperature to 500 °C (customizable) |
| Precursor Channels | Up to 6 independent precursor lines (solid & liquid sources, customizable) |
| Reactant Gas Lines | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Lines | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touch-enabled HMI, embedded IPC, Windows 7 OS, PLC-based real-time control |
| Source Bottle Heating | RT–200 °C (independent modules) |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Thermal-ALD E300S |
| Substrate Size | 300 mm (12 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C |
| Temperature Uniformity | ±1 °C (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid & liquid precursors with heated source bottles |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Range | 0.005–1000 Torr (dual corrosion-resistant capacitance manometers) |
| Base Pressure | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touchscreen HMI, embedded IPC running Windows 7, PLC-based real-time logic control with fieldbus support |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | UHV ALD |
| Quotation | Upon Request |
| Substrate Diameter | 100 mm (4 inch), customizable |
| Process Temperature Range | RT to 400 °C, ±1 °C accuracy (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid and liquid precursors with dedicated heated source bottles |
| Reactant Channels | 2 standard (customizable) |
| Carrier Gas | N₂ with MFC-controlled flow (customizable) |
| Vacuum System | High-performance turbomolecular pump suite for ultra-high vacuum (UHV) base pressure <5×10⁻⁸ mbar |
| Heating Capability | Source bottles and reactor zone heated up to 150 °C |
| Control System | Industrial embedded IPC with 19″ capacitive touchscreen, Windows 7 OS, real-time PLC-based logic control via Ethernet |
| Transfer System | Manual magnetic wand loading with dedicated load-lock chamber, gate valves, and integrated vacuum interlocks |
| Brand | SuPro Instruments |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Direct Manufacturer |
| Product Origin | Domestic (China) |
| Model | FST 5000 |
| Price | USD 84,000 (approx.) |
| Stress Measurement Range | 1–10,000 MPa (tensile or compressive) |
| Measurement Technology | Dual-Wavelength Laser Scanning |
| Operating Temperature | Ambient (20–25 °C) |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | PLD-Workstation |
| Price Range | USD 650,000 – 13.5 million |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | Laser MBE |
| Vacuum Class | Ultra-High Vacuum (UHV) |
| Base Pressure | ≤5×10⁻¹⁰ mbar (typical) |
| Substrate Heater | Resistive, 100–1000 °C (±0.5 °C stability) |
| Target Capacity | Up to 5 × 1-inch targets on rotating carousel |
| Laser Integration | Nd:YAG or excimer laser compatible (193–266 nm, pulse energy up to 500 mJ, repetition rate 1–10 Hz) |
| Load-Lock Capacity | 5 substrates + 2 target carousels |
| In-situ Diagnostics Ports | RHEED, OES, FTIR, QMS (CF-63/CF-100 flanges) |
| Automation Level | Fully programmable deposition sequence with real-time parameter logging and audit trail |
| Compliance | Designed for GLP/GMP-aligned lab environments |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | PLD-Workstation |
| Excimer Laser | Coherent COMPexPro 201F or 205F (248 nm) |
| Laser Gas | 20 L premixed KrF gas + 10 L He |
| Process Gases | 2× Mass Flow Controllers (MFC) |
| Substrate Heater | 2" up to 850 °C or 1"/3" up to 1000 °C |
| Substrate Rotation | 0–50 RPM |
| Target Carousel | 4×2" targets, rotation 0–50 RPM |
| Vacuum Chamber | Modular flanged design with multiple CF/NW ports |
| Control System | PC-based LabVIEW software with integrated TFT display |
| Dimensions | ~2200 × 850 × 1600 mm |
| Power Supply | 3×400 VAC/50 Hz or 3×208 VAC/60 Hz |
| Cooling | Integrated chiller unit |
| Compliance | CE-marked, Class 1 laser enclosure per IEC 60825-1 |
| Brand | SUSS |
|---|---|
| Origin | Germany |
| Model | DSC300 Gen3 |
| Wafer Size Support | 300 mm (optional 200 mm) |
| Resolution | 2 µm (line/space) |
| Overlay Accuracy | ≤1.0 µm |
| Depth of Focus (DOF) | High (NA-tunable) |
| Substrate Compatibility | Si, glass, SiC |
| Max. Warp Tolerance | 2 mm bow |
| Optical System | Wynne-Dyson broadband imaging optics |
| Exposure Source | Broadband UV (g-, h-, i-line compatible) |
| Operation Mode | Full-field projection + continuous scanning |
| Automation Level | Fully automated platform |
| Brand | SUSS MicroTec |
|---|---|
| Origin | Germany |
| Model | DSM8/200 Gen2 |
| Measurement Principle | Dual-microscope optical alignment metrology with TIS-compensated image registration |
| Accuracy | ≤ 0.2 µm (after TIS compensation) |
| Configuration Options | Manual loading (DSM8 Gen2) / Robotic handling with custom chuck (DSM200 Gen2) |
| Illumination Options | Visible + optional IR illumination (for through-silicon feature imaging) |
| Software Platform | Cognex PatMax®-powered automated image analysis with recipe-driven operation |
| Compliance Context | Designed for GLP/GMP-aligned semiconductor process development and high-reliability packaging workflows |
| Brand | SUSS MicroTec |
|---|---|
| Country of Origin | Germany |
| Model | MA/BA Gen4 |
| Type | Semi-Automated Mask Aligner & Thermal/Nanoimprint Lithography Platform |
| Application Scope | R&D, Pilot Production, High-Volume Prototyping |
| Compliance | ISO 9001 Certified Manufacturing, CE Marked, Compatible with ISO 14644-1 Class 5 Cleanroom Integration |
| Optical System | MO Exposure Optics® with Telecentric Illumination |
| Alignment Modes | Top-Side, Bottom-Side, IR Alignment |
| Optional Alignment Accuracy | ≤ 0.5 µm (with DirectAlign®) |
| Resolution | Down to 0.8 µm (hard/soft/vacuum contact mode) |
| Substrate Compatibility | 100–200 mm wafers, reticles, glass, quartz, SiC, GaAs, flexible substrates |
| Automation Level | Semi-Automated with SMILE™ Process Integration Framework |
| Software | LITHOGRAPH® v5.x with Audit Trail, User Role Management, Recipe Versioning, and GLP/GMP-Ready Data Logging |
| Brand | SUSS |
|---|---|
| Origin | Germany |
| Model | MA12 Gen3 |
| Type | Semi-Automatic Mask Aligner for Photolithography |
| Application Scope | Mask & Reticle Manufacturing, Wafer-Level Packaging, MEMS, R&D Prototyping |
| Alignment Accuracy | ≤ 1.0 µm (Optical, Off-Axis/IR Options Available) |
| Maximum Substrate Size | 200 mm |
| Max. Wafer Bow Tolerance | ±2 mm |
| Resolution | ≤ 2 µm (Line/Space, with Optimized Resist & Process) |
| Exposure Source | Broadband UV (i-line, g-line, h-line) |
| Numerical Aperture (NA) | Adjustable |
| DOF | Up to 150 µm (Configurable) |
| Software Compliance | Supports Audit Trail, User Access Levels, and Electronic Signature per FDA 21 CFR Part 11 Requirements |
| Brand | SUSS |
|---|---|
| Origin | Germany |
| Model | MA200 Gen3 |
| Substrate Compatibility | ≤200 mm wafers & square substrates |
| Alignment Accuracy (Top-Side) | ≤0.5 µm |
| Resolution (Vacuum Contact Mode) | <0.8 µm |
| Resolution (Proximity Mode) | ≥3.5 µm |
| Exposure Optics | MO Exposure Optics® with telecentric illumination, HR/LGO mode switching, customizable filters & reduction kits for smaller wafers |
| Automation Level | Fully automated batch processing |
| Compliance | Designed for ISO Class 5–7 cleanroom integration, compatible with SEMI S2/S8 safety standards and GLP/GMP-aligned process documentation workflows |
| Brand | SUSS MicroTec |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SUSS MA200 Gen3 |
| Pricing | Upon Request |
| Brand | SUSS MicroTec |
|---|---|
| Origin | Germany |
| Model | MA300 Gen3 |
| Wafer Size Support | 200 mm & 300 mm |
| Alignment Accuracy (Top-Side) | ±0.5 µm |
| Alignment Modes | Top-Side, Bottom-Side, Infrared (IR) |
| Exposure Method | Contact/Near-Contact Photolithography |
| Optical System | MO Exposure Optics® |
| Application Focus | Advanced Packaging (TSV, RDL, Bumping), MEMS, LED, Power Devices, WLP, Flip-Chip |
| Compliance | Designed for ISO Class 5–7 cleanroom integration |
| Automation Level | Full cassette-to-cassette robotic handling |
| Brand | SUSS |
|---|---|
| Origin | Germany |
| Model | MJB4 |
| Substrate Size | Up to 100 mm |
| Alignment Accuracy | Sub-micron |
| Resolution | ≤ 0.5 µm (hard contact) to 2 µm (soft contact) |
| Exposure Modes | Soft Contact, Hard Contact, Vacuum Contact |
| Optical System | MO® Exposure Optics with Telecentric Illumination |
| Uniformity | >95% across field |
| Compatible Substrates | Fragile, III-V, Compound Semiconductors, Glass, Si, SOI, Flexible Foils (thickness up to 4 mm) |
| Brand | Sutter |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | MN-151 Micromanipulator |
| Pricing | Available Upon Request |
| Material | Lightweight Aluminum Alloy |
| Mounting | Side-mount compatible with standard microscope stages |
| Operation | Ambidextrous (left- or right-hand configurable) |
| Coarse Motion Range (X/Y/Z) | 25 mm / 20 mm / 25 mm |
| Fine Motion Range (X) | 8 mm (MN-152 adds X-axis fine adjustment) |
| Z-axis Fine Control | Linear push-button actuator with 250 µm full stroke, 5 µm minimum incremental displacement |
| Dimensions (W×D×H) | 121 × 36 × 145 mm |
| Weight | 330 g |
| Compatible Accessories | B-8B Ball Joint, P-1A Height Adjustment Plate, H-7 Pipette Holder, Allen Wrench Set |