Semiconductor Instruments
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| Brand | Pfeiffer Vacuum |
|---|---|
| Model | ADPC 302 |
| Origin | France |
| Type | In-line Dry Particle Counter for Semiconductor Front-Opening Unified Pod (FOUP) and Front-Opening Shipping Box (FOSB) |
| Measurement Range | 0.1 µm – 5.0 µm |
| Counting Principle | Laser Light Scattering (LLS) with Automated Surface Scanning |
| Cycle Time | ≤7 min per FOUP/FOSB |
| Throughput | Up to 8 carriers/hour |
| Compliance | SEMI S2/S8, ISO 14644-1 Class 1–ISO Class 3 environments |
| Interface | Ethernet/IP, SECS/GEM compatible |
| Operating Mode | Fully Automated, Unattended, Integrated into 300 mm Fab Automation |
| Brand | Photonic Lattice |
|---|---|
| Origin | Japan |
| Model | PA-300-XL |
| Measurement Wavelength | 520 nm |
| Birefringence Range | 0–130 nm |
| Minimum Resolution | 0.001 nm |
| Repeatability | <0.1 nm |
| Field of View (Standard) | 40×48 mm to 240×320 mm |
| Polarization Camera | 2056×2464 pixels |
| Output Parameters | Retardance [nm], Fast-Axis Orientation [°], Stress-Converted Value [MPa] (optional) |
| Optional Modules | Real-time Analysis Software, Lens Aberration Analysis Software, External Control Interface, Interchangeable Lens Kits |
| Brand | Picosun |
|---|---|
| Origin | Finland |
| Model | P-300B |
| Substrate Size | 8-inch (200 mm) |
| Process Temperature | Up to 500 °C |
| Precursor Channels | 8 |
| System Weight | 150 kg |
| Thickness Uniformity | ±1.5% (1σ, across 8″ wafer or batch load) |
| Origin | Finland |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | R-Series |
| Price Range | USD 135,000 – 270,000 (FOB Helsinki) |
| Substrate Size | 50–200 mm (2″–8″, 8″ available on request) |
| Process Temperature | Up to 500 °C |
| Precursor Channels | 2–6 (gas, vaporized liquid, or solid-source compatible) |
| Weight | 200 kg |
| Dimensions (W × H × D) | 70 × 105 × 92.5 cm |
| Uniformity | < ±1% across 200 mm wafers (typical, SiO₂ on Si) |
| Brand | Picosun |
|---|---|
| Origin | Finland |
| Model | R-Series |
| Substrate Size | 200 mm (8-inch) |
| Process Temperature | Up to 500 °C |
| Precursor Channels | 6 |
| Weight | 350 kg |
| Dimensions (W × H × D) | 146 cm × 146 cm × 84 cm |
| Thickness Uniformity | ±1% |
| Reactor Materials | 316 Stainless Steel, Titanium, Nickel, Aluminum, Quartz |
| Precursor States | Gas, Liquid, Solid |
| Load Lock | Picoloader™ Manual Transfer System with Pre-Vacuum Chamber and Gate Valve |
| Vacuum Pump Capacity | 30–80 m³/h |
| Carrier Gas | ≥99.999% N₂ or Ar, min. 2 slm |
| Power Supply | 100–240 V, 50/60 Hz, 1- or 3-phase, 3.7 kW |
| Cooling | Air-cooled (no external water required) |
| Exhaust | Dedicated for pump and precursor cabinets |
| Brand | AYAO Instruments |
|---|---|
| Origin | South Korea |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | LithoMaskless |
| Exposure Mode | Projection-Based |
| Resolution | 0.5 µm |
| Light Source | UV LED |
| Wavelength Options | 365 nm / 385 nm / 405 nm |
| Maximum Exposure Area | 100 mm × 100 mm |
| DMD Chip Size | 0.65-inch |
| Compatibility | Broad photoresist & substrate support (Si, SiO₂, glass, quartz, flexible polymers) |
| Alignment Method | Integrated high-magnification optical alignment with real-time feedback |
| Brand | Plasma-Therm |
|---|---|
| Origin | USA |
| Equipment Type | Imported Semiconductor CVD System |
| Model | PECVD Series |
| Heating Method | Hot-Wall |
| Application Domain | Semiconductor Fabrication, MEMS, III-V & Wide-Bandgap Devices (GaAs, SiC, CPV), LED, SOI, TSV |
| Brand | Plasma-Therm |
|---|---|
| Origin | USA |
| Model | Takachi |
| Etch Principle | Inductively Coupled Plasma (ICP) |
| Etch Rate | SiO₂ ≥ 1500 Å/min |
| Selectivity | SiO₂ to Photoresist = 1.0–1.5:1 |
| Si₃N₄ to Photoresist = 1.0–1.2 | 1 |
| Uniformity | ≤ ±2% |
| Application Scope | Dielectrics (SiO₂, Si₃N₄, metal oxides), Polymers (photoresists, polyimides, BCB, SU-8), Semiconductors (Si, Ge, III–V compounds including GaAs, AlGaAs, GaN, InP), SiC |
| Brand | Axic |
|---|---|
| Origin | France |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | SSDR400 |
| Heating Method | Hot-Wall |
| Application Field | Semiconductor & Advanced Materials |
| Deposition Rate | 1 µm/h (typical for diamond) |
| Base Pressure | 1×10⁻⁶ mbar |
| Operating Pressure Range | 2–200 mbar |
| Chamber Internal Diameter | 6 inch (Ø152 mm) |
| Substrate Stage | Ø158 mm, Z-axis motorized translation |
| Plasma Source | 915 MHz, up to 36 kW microwave generator |
| Process Duration Capability | Up to 500 h continuous operation |
| Brand | Axic |
|---|---|
| Origin | France |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SSDR400 |
| Heating Method | Hot-Wall |
| Application Field | Semiconductor & Advanced Materials |
| Deposition Rate | 1 µm/h (typical for diamond) |
| Base Vacuum | 1×10⁻⁶ mbar |
| Operating Pressure | 2–200 mbar |
| Chamber Internal Diameter | 6 inch (Ø152 mm) |
| Substrate Stage | Ø158 mm with Z-axis motion |
| Microwave Frequency | 915 MHz |
| Max Microwave Power | 36 kW |
| Process Duration Capability | Up to 500 h (continuous) |
| Brand | Axic |
|---|---|
| Origin | France |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SSDR150 |
| Heating Method | Hot-Wall |
| Application Field | Semiconductor |
| Deposition Rate | 1 nm/s (typical for diamond) |
| Base Vacuum | 1×10⁻⁶ mbar |
| Operating Pressure Range | 20–400 mbar |
| Chamber Internal Diameter | 6 inch (Ø152 mm) |
| Microwave Power | 6 kW @ 2.45 GHz |
| Substrate Stage | Ø60 mm with Z-axis motion |
| Max. Continuous Process Duration | ≥3 weeks |
| Temperature Control | Precision ±1°C over full operating range |
| Brand | Axic |
|---|---|
| Origin | France |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SSDR150 |
| Heating Method | Hot-Wall |
| Application Domain | Semiconductor |
| Deposition Rate | 1 nm/s (typical for diamond growth) |
| Base Vacuum | 1×10⁻⁶ mbar |
| Operating Pressure Range | 20–400 mbar |
| Chamber Internal Diameter | 6 inch (Ø152 mm) |
| Microwave Power | 6 kW @ 2.45 GHz |
| Substrate Stage | Ø60 mm with Z-axis translation |
| Temperature Control | Up to 1200 °C (±2 °C stability) |
| Brand | SPS-POLOS |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Category | Imported Instrument |
| Model | BEAM |
| Resolution | 0.8 µm (CD) |
| Light Source | Laser Galvanometer + 405 nm Laser Diode |
| Exposure Field | 150 mm × 150 mm |
| Substrate Compatibility | 4″–6″ wafers |
| Focus Actuation | Piezoelectric auto-focus with closed-loop optics (<1 s settling time) |
| Alignment | Semi-automatic multi-layer collimation (completed in minutes) |
| Compatible Resist | AZ5214E |
| Software Interface | GDSII-native GUI with wafer-level navigation, layer overlay, and CNC-style motion control |
| Brand | PolyPico |
|---|---|
| Origin | Denmark |
| Model | UniA6 |
| Imprint Methods | Thermal, UV (365 nm), Vacuum-assisted |
| Max Substrate/Stamp Diameter | 210 mm (8″) |
| Chamber Height | 20 mm |
| Max Imprint Pressure | 11 bar |
| Thermal Range | Up to 200 °C (optional 250 °C module) |
| UV Wavelengths | 365 nm (standard), 405 nm (optional) |
| Vacuum Level | ≤ 0.1 mbar |
| Control | Fully automated via laptop-based software |
| Form Factor | Benchtop, modular, plug-and-play |
| Brand | Pri-eco |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | QCL2 500 |
| Pricing | Available Upon Request |
| Current Noise Density | ≤928 nA<sub>p-p</sub> (0.1–10 Hz) |
| RMS Noise | 36.7 nA/√Hz (1 Hz–100 kHz) |
| Output Current Range | 0–500 mA |
| Short-Term Stability | 310 ppm (after 1 h warm-up) |
| Long-Term Stability | 820 ppm (24 h after 1 h warm-up) |
| Temperature Coefficient | 6–15 ppm/°C |
| Output Voltage Compliance | ±24 VDC |
| Rise/Fall Time | 3.6 µs / 2.6 µs (RL = 36 Ω, 10%–90%) |
| Slew Rate | 160 A/ms |
| Leakage Current | ≤500 µA |
| Supply Voltage | ±18 to ±25 VDC |
| Dimensions | 78 × 108 × 40 mm |
| Weight | 0.13 kg |
| Brand | ZENO |
|---|---|
| Origin | Shanghai, China |
| Model | PULSAR L-Series & PULSAR H-Series |
| Category | Semiconductor Wafer Defect Detection Instrument |
| Manufacturer Type | Authorized Distributor |
| Regional Classification | Domestic (China) |
| Pricing | Upon Request |
| Brand | PULUODY |
|---|---|
| Model | PMT-2 |
| Detection Principle | Dual-Laser Narrow-Beam Light Scattering |
| Measurement Range | 0.03–3000 µm (configurable sensor modules) |
| Calibration Standards | ISO 21501-4, USP <788>, EP 2.9.19, ChP 2015/2020, GB 8368 |
| Flow Control | Precision Piston Pump + Electromagnetic Flow Regulation |
| Accuracy | ±3% typical |
| Counting Resolution | Customizable channels (e.g., 1–100 µm, 4–70 µm(c), 0.1 µm(c)) |
| Coincidence Limit | ≤2.5% error at 1000 particles/mL |
| Sampling Precision | <±1% |
| Output | 4–20 mA analog signal |
| Alarm | Configurable particle concentration threshold alert |
| Data Interface | iPad-compatible wireless acquisition |
| Software | PULUODY V8.3 Integrated Analysis & Calibration Suite (PC & touchscreen) |
| Compliance | Supports 21 CFR Part 11 audit trail (optional configuration), GLP/GMP traceability mode |
| Power Input | 100–265 VAC, 50–60 Hz |
| Application Mode | Online continuous monitoring & offline portable/fixed sampling |
| Brand | PULUODY |
|---|---|
| Origin | Shaanxi, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | PMT-2 |
| Price | USD 72,800 (FOB) |
| Detection Principle | Dual-Laser Narrow-Beam Light Scattering |
| Sensor Generation | 8th-Generation Dual-Laser Optical Sensor |
| Flow Control | Precision Plunger Pump + Electromagnetic Flow Regulation |
| Calibration Standards | ISO 21501-4, USP <788>, EP 2.9.19, ChP 2020 Vol. IV, GB 8368 |
| Measurement Range | 0.1–1.0 µm (standard), customizable 1–100 µm or 4–70 µm(c), down to 0.1 µm(c) |
| Sampling Accuracy | <±1% |
| Counting Accuracy | ±3% typical |
| Coincidence Limit | 1000 particles/mL (2.5% coincidence error) |
| Output Interface | 4–20 mA analog output,超标 alarm relay (customizable) |
| Data Output | iPad-compatible wireless acquisition, touchscreen GUI + optional PC software (V8.3 Integrated Edition) |
| Power Supply | 100–265 VAC, 50–60 Hz |
| Compliance Architecture | Separated analytical testing & metrological calibration modules |
| Regulatory Alignment | Supports FDA 21 CFR Part 11 audit trail configuration (via optional software license), GLP/GMP-compliant reporting templates |
| Brand | PULUODY |
|---|---|
| Model | PMT-2 |
| Sensor Technology | 8th-Generation Dual-Laser Narrow-Beam Detection |
| Detection Range | 0.03–3000 µm (configurable sub-ranges: 1–100 µm, 4–70 µm(c), or 0.1 µm(c)) |
| Accuracy | ±3% typical |
| Sampling Precision | <±1% |
| Coincidence Limit | ≤2.5% at 1000 particles/mL |
| Calibration Standards | JJG 1061, ISO 21501-2, NIST-traceable latex spheres |
| Output | 4–20 mA analog interface with customizable alarm thresholds |
| Data Reporting | Particles per mL & ISO 4406 / NAS 1638 contamination codes |
| Power Input | 100–265 VAC, 50–60 Hz |
| Software | PULUODY V8.3 Analysis & Calibration Suite (PC + integrated touchscreen UI) |
| Compliance | Designed for GLP/GMP-aligned environments |
| Brand | PULUODY |
|---|---|
| Model | PMT-2-C |
| Detection Principle | Dual-Laser Narrow-Beam Light Scattering |
| Sensor Generation | 8th-Generation Dual-Laser Optical Sensor |
| Measuring Range | 0.05–0.2 µm, 0.1–0.5 µm (standard) |
| Sampling Method | Precision Metering Piston Pump + Electromagnetic Flow Control |
| Sampling Accuracy | < ±1% |
| Counting Accuracy | < ±3% (typical) |
| Coincidence Limit | 1000 particles/mL (2.5% coincidence error) |
| Output Interface | 4–20 mA analog output |
| Alarm Function | Configurable particle concentration threshold alert |
| Data Reporting | Particles per mL & ISO 4406 / NAS 1638 contamination code |
| Compliance Standards | JJG 1061, ISO 21501-4, USP <788>, EP 2.9.19 |
| Software Platform | V8.3 Integrated Analysis & Calibration Software (PC + touchscreen UI) |
| Power Input | 100–265 VAC, 50–60 Hz |
| Display | Color LCD touchscreen + optional wireless keyboard/mouse |
| Brand | PULUODY |
|---|---|
| Model | PMT-2801 |
| Detection Principle | Dual-laser light scattering (narrow-beam, 8th-generation) |
| Particle Size Range | 0.1–0.5 µm (standard) |
| Accuracy | ±3% typical |
| Sampling Precision | <±1% |
| Coincidence Limit | ≤2.5% at 1000 particles/mL |
| Flow Control | Precision piston pump + electromagnetic flow regulation |
| Compliance | USP <788>, EP 2.9.19, BP, ChP 2015/2020, GB 8368, ISO 21501-4, JJG 1061 |
| Data Output | 4–20 mA analog interface |
| Power Input | 100–265 VAC, 50–60 Hz |
| Software | PULUODY V8.3 Integrated Analysis & Calibration Suite (PC + touchscreen GUI) |
| Operating Interface | Color LCD touch screen + optional wireless keyboard/mouse |
| Brand | PULUODY |
|---|---|
| Model | PMT-2CCS |
| Detection Threshold | 100 nm |
| Sensor Technology | 8th-Generation Dual-Laser Narrow-Beam Optical Sensor |
| Measurement Range | 0.1–0.5 µm (with customizable ranges: 1–100 µm or 4–70 µm(c), down to 0.1 µm(c)) |
| Sampling Accuracy | < ±1% |
| Counting Accuracy | < ±3% (typical) |
| Coincidence Limit | 1000 particles/mL (2.5% coincidence error) |
| Flow Control | Precision Piston Pump + Electromagnetic Flow Regulation |
| Calibration Standards | JJG 1061, ISO 21501, Polystyrene Latex (PSL) Spheres |
| Output Interface | 4–20 mA Analog Signal |
| Alarm Function | Configurable Particle Exceedance Alert |
| Power Input | 100–265 VAC, 50–60 Hz |
| Compliance | Designed for ISO 14644-1/2, SEMI F57, ASTM D6978, USP <788> & <789>, and GLP/GMP-aligned data integrity workflows |
| Brand | PULUODY |
|---|---|
| Origin | Sichuan, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | PMT-2DN |
| Price | USD 75,000 (FOB) |
| Detection Principle | Dual-Laser Narrow-Beam Light Scattering |
| Sensor Generation | 8th-Generation Dual-Laser Optical Sensor |
| Flow Control | Precision Plunger Pump + Electromagnetic Flow Regulation |
| Calibration Standards | JJG 1061, ISO 21501-4, Polystyrene Latex (PSL) Reference Standards |
| Detection Range | 0.1–0.5 µm (standard) |
| Customizable | 1–100 µm or 4–70 µm (c) |
| Minimum Detectable Size | 0.1 µm (c) |
| Sampling Accuracy | < ±1% |
| Measurement Accuracy | < ±3% (typical) |
| Coincidence Limit | ≤2.5% at 1000 particles/mL |
| Output Interface | 4–20 mA analog output |
| Alarm Function | Configurable particle concentration threshold alert |
| Data Reporting | Particles per mL + ISO 4406 / NAS 1638 contamination code |
| Power Input | 100–265 VAC, 50–60 Hz |
| Display & Control | Color LCD touchscreen + optional wireless keyboard/mouse |
| Software | PULUODY V8.3 Analysis & Calibration Suite (PC & embedded) |
| Brand | PULUODY |
|---|---|
| Origin | Shaanxi, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | PMT-2GN |
| Pricing | Upon Request |
| Brand | PULUODY |
|---|---|
| Model | PMT-2LS |
| Detection Principle | Dual-Laser Narrow-Beam Light Scattering |
| Sensor Generation | 8th-Generation Dual-Laser Optical Sensor |
| Detection Range | 0.1–0.5 µm (standard) |
| Sampling Method | Precision Metering Piston Pump |
| Flow Control | Dual-Stage Electromagnetic + Precision Piston Pump |
| Accuracy | ±3% typical |
| Volume Accuracy | ±1% |
| Coincidence Limit | ≤2.5% error at 1000 particles/mL |
| Output | 4–20 mA analog interface with programmable contamination alarm |
| Reporting | Particles per mL & ISO 4406 / NAS 1638 / SAE AS4059 contamination codes |
| Calibration Standards | JJG 1061, ISO 21501-4, NIST-traceable latex spheres |
| Software | V8.3 Integrated Analysis & Calibration Software (PC + embedded touchscreen UI) |
| Display | Color LCD touch interface + optional wireless keyboard/mouse |
| Power Input | 100–265 VAC, 50–60 Hz |
| Compliance | Designed for ISO Class 1–5 cleanroom environments |
| Brand | PULUODY |
|---|---|
| Origin | Shaanxi, China |
| Manufacturer Type | Manufacturer |
| Country of Origin | China |
| Model | PS8011+ |
| Price Range | USD 135 – 525 |
| Material Options | PP, PE, PFA, PEEK, PFAD, High-Silica Borosilicate Glass |
| Volume Options | 50 mL to 1000 mL |
| Particle Cleanliness Level | RCL < 15 particles per 100 mL |
| Certified Cleanliness Classes | ISO Class 1–9 (per ISO 14644-1) |
| Particle Detection Thresholds | 0.1 µm, 0.3 µm, 0.5 µm, 1.0 µm, 2.0 µm, 5.0 µm |
| Average Outgoing Quality Limit (AOQL) | 0.5% |
| Compliance Standards | ISO 3722, ISO 14644-1, GB/T 17484, GB 50073-2001, JIS B9925:1997, JIS K0554:1995 |
| Brand | PVA TePla |
|---|---|
| Origin | USA |
| Model | 80 Plus |
| Plasma Source Options | RF (13.56 MHz) or Microwave (2.45 GHz) |
| Chamber Configuration | Electrode-equipped (RF) or Electrode-less (Microwave) |
| Operation Modes | Manual and Automated Integration Capable |
| Compliance | Designed for Semiconductor Cleanroom Environments (Class 100 / ISO Class 5 compatible) |
| Integration | Standalone or Inline Production Line Compatible |
| Software Interface | Intuitive GUI with Parameter Logging and Recipe Management |
| Brand | PVA TePla |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | SAM Premium |
| Pricing | Available Upon Request |
| Brand | PVD |
|---|---|
| Origin | United Kingdom |
| Manufacturer Status | Authorized Distributor |
| Import Status | Imported |
| Model | Q-One |
| Product Type | Low-Energy High-Current Ion Implanter |
| Application Domain | IC Ion Implantation |
| Implantation Energy | 25 kV Liquid Metal Ion Source (LMIS) |
| Implantation Dose Control | Deterministic Single-Ion Delivery |
| Wafer Size Support | 6-inch |
| Available Ion Species | >40 elements selectable via LMIS and mass-filtered column |
| Brand | PVD |
|---|---|
| Origin | USA |
| Distributor Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Standard Particles |
| Price | Upon Request |