- All
- Favorite
- Popular
- Most rated
| Brand | Appo |
|---|---|
| Origin | Switzerland |
| Model | MTA03 |
| Load Range | ±200 mN |
| Load Resolution | 0.5 nN |
| Displacement Range | 0.1 nm to 29 mm |
| Displacement Resolution (short-range) | 0.1 nm |
| Displacement Resolution (long-range) | 1 nm |
| Microscope Working Distance | 95 mm |
| Camera | 3 MP CMOS USB |
| Optical Zoom | 7:1 motorized |
| Illumination Options | Coaxial lens, ring light, diffuse backlight |
| Probe Types | Multiple FT-S microforce sensing probes |
| Optional Modules | FT-G microtweezers for microassembly |
| Brand | Appo |
|---|---|
| Origin | United Kingdom |
| Model | SWIFT |
| Max Load Capacity | 10 kN |
| Temperature Range | –120 °C to +1000 °C |
| Stroke Range | 16–26 mm |
| Compatibility | SEM, TEM, Optical Microscope, Confocal Microscope, EBSD, Raman, XRD, AFM, Metallographic Microscope |
| Control Interface | Windows 10–compatible PC-based controller with drag-and-drop test sequencing software |
| Brand | SHNTI (Shanghai Naten Instruments) |
|---|---|
| Origin | Shanghai, China |
| Model | FalconWave®-S Series |
| Detection Frequency Range | 60–800 GHz |
| Spatial Resolution | 1 mm per pixel |
| Scan Speed | ~7 minutes per image (at 1 mm resolution) |
| Measurement Accuracy | <3% deviation (offline precise scanning) |
| Repeatability Error | <1% |
| Interface | Gigabit Ethernet (Plug-and-Play) |
| Power Consumption | Low (CMOS-based THz sensor architecture) |
| Compliance | CE-marked for laboratory use |
| Target Users | R&D laboratories, academic research groups, materials science institutes, QC/QA departments in advanced manufacturing |
| Brand | SHNTI (Distributor) |
|---|---|
| Origin | Switzerland |
| Model Series | FT-RS / FT-FS / FT-S / FT-G / FT-UMS1000 |
| Instrument Type | Nanoindentation and Scratch Tester |
| Maximum Indentation Depth | 1 µm |
| Effective Load Range | 5 nN – 10 mN |
| Load Resolution | 1 nN |
| Displacement Range | ±100 µm |
| Displacement Resolution | 5 nm |
| Maximum Friction Force | 1 mN |
| Indenter Tip Types | Berkovich, Cube-Corner, Flat Punch, Spherical (customizable) |
| Thermal Drift | <0.1 nm/s (at 25 °C, stabilized environment) |
| Brand | Appo |
|---|---|
| Origin | Shanghai, China |
| Model | NIL-100 |
| Imprint Area | 4-inch (100 mm) wafers/substrates |
| Max. Pressure | 8 bar (integrated air compressor), 20 bar (external cleanroom supply) |
| Temperature Range | Ambient to 250 °C |
| UV Source | 400 W high-pressure Hg lamp, dominant wavelength 365 nm |
| Vacuum Level | ≤10 Pa |
| Heating Method | Electromagnetic single-side heating |
| Automation | Motorized auto-demolding |
| Compatible imprint modes | Thermal embossing & UV-curable step-and-flash imprint lithography (S-FIL) |
| Optional consumables | Full suite of nanoimprint resists (thermal, UV-curable, lift-off, deep-etch), anti-sticking agents, adhesion promoters, and custom mold fabrication support (Ni, SFP®, Hybrid Mold®) |
| Resolution capability | ≤20 nm (with appropriate mold and process optimization) |
| Compliance | Designed for R&D and pilot-line use under GLP-aligned lab practices |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | PLD-Workstation |
| Price Range | USD 650,000 – 13.5 million |
| Brand | Biosensing Instrument |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Instrument Type | Surface Plasmon Resonance (SPR) |
| Model | SPRm 200 |
| Detection Range | 200 Da |
| Channel Configuration | 5 parallel microfluidic channels |
| Sample Throughput | 384 × 2 (dual-layer microarray format) |
| Injection Volume | 1–1500 µL (application-dependent) |
| Assay Duration | Millisecond to hour-scale (kinetically resolved) |
| Temperature Control Range | 15–40 °C |
| Detection Mode | Simultaneous SPR imaging + brightfield optical microscopy |
| Spatial Resolution | Pixel-level SPR signal mapping (< 2 µm pixel pitch) |
| Brand | RION |
|---|---|
| Origin | Japan |
| Model | KE40B |
| Measurement Principle | Laser Light Scattering (830 nm Diode Laser, Class 1 per IEC 60825-1) |
| Detection Range | 0.15–0.5 µm (factory-configured 4-channel: 0.15 / 0.2 / 0.3 / 0.5 µm |
| Detection Efficiency | 50 ± 10% at 0.15 µm |
| Sample Flow Rate | 10 mL/min |
| Maximum Particle Concentration | 1,200 particles/mL (±5% accuracy for 0.15 µm particles) |
| Sample Pressure Limit | ≤300 kPa (gauge) |
| Wetted Materials | Quartz, PFA |
| Calibration Standard | PSL spheres (1.6 µm nominal) |
| Display Interface | Integrated resistive touch screen |
| Data Output | Built-in thermal printer + SD memory card storage |
| Communication | Direct interface with KE-40B1 controller (no external PC required) |
| Power Supply | DC 12 V (supplied by KE-40B1) |
| Operating Environment | 15–30 °C, ≤85% RH (non-condensing) |
| Dimensions (H×W×D) | 160 × 300 × 251 mm (excl. protrusions) |
| Weight | ~7.5 kg |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | IMD MPCVD Diamond Growth System |
| Crystal Material | Synthetic Diamond |
| Maximum Crystal Diameter | 2.2 inches (55.9 mm) |
| Typical Crystal Length (Constant-Diameter Zone) | 2–3 cm |
| Process Capability | High-Purity Diamond CVD Deposition, In-situ Thermal Annealing, Homoepitaxial & Heteroepitaxial Growth |
Show next