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| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | Gemini |
| Price Range | USD $65,000 – $130,000 |
| Instrument Type | Multi-Axis Nanomechanical Testing System |
| Maximum Indentation Depth | 50 µm |
| Effective Load Range | 50 mN |
| Load Resolution | 3 nN |
| Displacement Range | 50 µm |
| Displacement Resolution | 4 nm |
| Maximum Friction Force | 50 mN |
| Indenter Tip Material | Single-Crystal Diamond |
| Brand | FemtoTools |
|---|---|
| Origin | Switzerland |
| Model | FT-G Series Nanotweezers (FT-G30, FT-G60, FT-G100) |
| Compatible Systems | FT-GS1000 Micro-Nano Assembler, FT-GS5000 Nano Assembly System |
| Controller | FT-GC01 Nanotweezer Controller |
| Operating Environments | Ambient air, liquid, and high vacuum (SEM-compatible) |
| Force Feedback | Integrated capacitive force sensor (FT-G30 & FT-G100) |
| Displacement Resolution | <1 nm |
| Force Resolution | <100 pN |
| Brand | FRT |
|---|---|
| Origin | Germany |
| Model | MicroProf MHU |
| Wafer Handling | Semi-Automatic with Material Handling Unit (MHU) |
| Throughput | Up to 220 wafers/hour |
| Wafer Diameter Support | 2″ to 8″ |
| Cassette Capacity | Up to 4 open FOUPs/SMIF pods |
| Integrated Options | Pre-aligner, OCR reader |
| Application Focus | Semiconductor, MEMS, Sapphire, LED wafer manufacturing |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | iNano |
| Maximum Force | 50 mN |
| Force Resolution | 3 nN |
| Force Noise | <200 nN (RMS) |
| Time Constant | 20 µs |
| Maximum Indentation Depth | 50 µm |
| Displacement Noise | <0.1 nm |
| Digital Displacement Resolution | 0.02 nm |
| Drift Rate | <0.05 nm/s |
| Dynamic Frequency Range | 0.1 Hz – 1 kHz |
| Z-Stage Travel | 25 mm |
| X-Stage Travel | 100 mm |
| Y-Stage Travel | 150 mm |
| Load Frame Stiffness | >1,000,000 N/m |
| Scratch Max Normal Load | 50 mN |
| Scratch Max Distance | 2.5 mm |
| Scratch Max Speed | 500 µm/s |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | InSEM HT |
| Instrument Type | High-Temperature In-Situ Nanoindentation and Mechanical Testing System for SEM/FIB Integration |
| Maximum Indentation Depth | 50 µm |
| Effective Load Range | 50 mN |
| Load Resolution | 3 nN |
| Displacement Range (X/Y) | 20 mm, (Z): 25 mm |
| Displacement Resolution | 4 nm |
| Maximum Friction Force | 0.05 N |
| Indenter Type | Diamond Berkovich / Cube-Corner / Spherical |
| Thermal Drift | < 0.05 nm at 800 °C |
| Operating Temperature Range | RT to 800 °C under vacuum |
| Compatibility | Integrated with SEM, FIB, or standalone high-vacuum chamber |
| Standards Compliance | ISO 14577-1/2/3, ASTM E2546, applicable to GLP/GMP-relevant mechanical property validation workflows |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | iMicro |
| Maximum Load Capacity | 1 N |
| Force Resolution | 6 nN |
| Force Noise Floor | <200 nN |
| Indentation Depth Range | up to 80 µm |
| Depth Resolution | 0.04 nm |
| Depth Drift Rate | <0.05 nm/s |
| Time Constant | 20 µs |
| Scratch Option | up to 50 mN load, 2.5 mm lateral displacement, 500 µm/s max speed |
| Stage Travel (X/Y/Z) | 100 mm × 150 mm × 25 mm |
| Load Stiffness | >3,500,000 N/m |
| Tip Calibration | Integrated TiP-Calibration system |
| Software Platform | InView (scriptable experiment design), optional NanoBlitz 3D topography & tomography module |
| Origin | Greece |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | FR-pOrtable |
| Pricing | Upon Request |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | NanoFlip |
| Price Range | USD 260,000–390,000 (est.) |
| Instrument Type | In-Situ Nanomechanical Testing System |
| Max Indentation Depth | 50 µm |
| Effective Load Range | 50 mN |
| Load Resolution | 3 nN |
| Displacement Range (X/Y) | 20 mm, (Z): 25 mm |
| Displacement Resolution | 4 nm |
| Max Friction Force | 0.05 N |
| Indenter Tip | Diamond Berkovich or Cube-Corner |
| Brand | PrimeNano |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | Scanwave Scanning Microwave Impedance Microscope |
| Pricing | Available Upon Request |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | Nano Indenter G200 |
| Force Range | 10 nN – 10 N (with modular transducers) |
| Displacement Resolution | < 0.01 nm |
| Maximum Indentation Depth | > 500 µm |
| Testing Speed | Up to 1 indentation point per second |
| Brand | Appo |
|---|---|
| Origin | Switzerland |
| Model | MTA03 |
| Load Range | ±200 mN |
| Load Resolution | 0.5 nN |
| Displacement Range | 0.1 nm to 29 mm |
| Displacement Resolution (short-range) | 0.1 nm |
| Displacement Resolution (long-range) | 1 nm |
| Microscope Working Distance | 95 mm |
| Camera | 3 MP CMOS USB |
| Optical Zoom | 7:1 motorized |
| Illumination Options | Coaxial lens, ring light, diffuse backlight |
| Probe Types | Multiple FT-S microforce sensing probes |
| Optional Modules | FT-G microtweezers for microassembly |
| Brand | SHNTI (Shanghai Naten Instruments) |
|---|---|
| Origin | Shanghai, China |
| Model | FalconWave®-S Series |
| Detection Frequency Range | 60–800 GHz |
| Spatial Resolution | 1 mm per pixel |
| Scan Speed | ~7 minutes per image (at 1 mm resolution) |
| Measurement Accuracy | <3% deviation (offline precise scanning) |
| Repeatability Error | <1% |
| Interface | Gigabit Ethernet (Plug-and-Play) |
| Power Consumption | Low (CMOS-based THz sensor architecture) |
| Compliance | CE-marked for laboratory use |
| Target Users | R&D laboratories, academic research groups, materials science institutes, QC/QA departments in advanced manufacturing |
| Brand | SHNTI (Distributor) |
|---|---|
| Origin | Switzerland |
| Model Series | FT-RS / FT-FS / FT-S / FT-G / FT-UMS1000 |
| Instrument Type | Nanoindentation and Scratch Tester |
| Maximum Indentation Depth | 1 µm |
| Effective Load Range | 5 nN – 10 mN |
| Load Resolution | 1 nN |
| Displacement Range | ±100 µm |
| Displacement Resolution | 5 nm |
| Maximum Friction Force | 1 mN |
| Indenter Tip Types | Berkovich, Cube-Corner, Flat Punch, Spherical (customizable) |
| Thermal Drift | <0.1 nm/s (at 25 °C, stabilized environment) |
| Brand | RION |
|---|---|
| Origin | Japan |
| Model | KE40B |
| Measurement Principle | Laser Light Scattering (830 nm Diode Laser, Class 1 per IEC 60825-1) |
| Detection Range | 0.15–0.5 µm (factory-configured 4-channel: 0.15 / 0.2 / 0.3 / 0.5 µm |
| Detection Efficiency | 50 ± 10% at 0.15 µm |
| Sample Flow Rate | 10 mL/min |
| Maximum Particle Concentration | 1,200 particles/mL (±5% accuracy for 0.15 µm particles) |
| Sample Pressure Limit | ≤300 kPa (gauge) |
| Wetted Materials | Quartz, PFA |
| Calibration Standard | PSL spheres (1.6 µm nominal) |
| Display Interface | Integrated resistive touch screen |
| Data Output | Built-in thermal printer + SD memory card storage |
| Communication | Direct interface with KE-40B1 controller (no external PC required) |
| Power Supply | DC 12 V (supplied by KE-40B1) |
| Operating Environment | 15–30 °C, ≤85% RH (non-condensing) |
| Dimensions (H×W×D) | 160 × 300 × 251 mm (excl. protrusions) |
| Weight | ~7.5 kg |
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