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| Origin | Jiangsu, China |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Regional Origin | Domestic (PRC) |
| Model | Custom Grating Fabrication |
| Pricing | Available Upon Technical Consultation |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Model | YPL-NIL-SI400 |
| Temperature Range | RT to 350 °C |
| Pressure Range | 0–20 psi (on 4″ wafer) |
| Vacuum Range | 101.3 kPa to 0.1 Pa |
| UV Exposure System | Integrated |
| Sample Holder Max Diameter | 100 mm (4″) |
| Cooling | Integrated Water-Cooled System |
| Control | PLC-based with Touchscreen HMI |
| Software | Proprietary SI400 Machine Control Suite |
| Loading Method | Manual Wafer/Template Handling |
| Sealing | Bellows-Sealed Vacuum Chamber |
| Compliance | Designed for Class 100–1000 cleanroom integration |
| Brand | SHNTI |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | VIL1000 |
| Light Source | Coherent Laser (UV/Deep-UV or Visible, Configurable) |
| Minimum Achievable Line Width | <50 nm |
| Grating Period Range | 240–1500 nm |
| Maximum Exposure Field | 200 mm × 200 mm (8-inch wafer compatible) |
| Pattern Reconfigurability | Real-time, maskless, via beam steering optics |
| Positioning Accuracy | Sub-10 nm (closed-loop piezo stage) |
| Origin | Hong Kong |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Mainland China Made |
| Model | Holimatrix |
| Price Range | USD 140,000 – 210,000 |
| Origin | Jiangsu, China |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic |
| Model Variants | Quartz / Silicon / Polymer Templates |
| Pricing | Available Upon Request |
| Template Materials | Fused Silica (Quartz), Single-Crystal Silicon, Silicon Nitride (SiNₓ), Silicon Carbide (SiC), Borosilicate Glass |
| Max Template Diameter | 100 mm (4″) |
| Minimum Feature Size | 50 nm (for ≤2″ area) |
| EBL Service Capability | Down to 30 nm feature size |
| Substrate Compatibility | Conductive (e.g., Si, GaAs, InP) and Non-Conductive (e.g., SiO₂/Si, quartz, polymer-coated wafers) substrates |
| Fabrication Scope | Micro- and nanoscale patterning on Si, III–V (GaAs, InP), II–VI (ZnS, CdTe), and polymer substrates |
| Brand | Appo |
|---|---|
| Origin | Shanghai, China |
| Model | NIL-100 |
| Imprint Area | 4-inch (100 mm) wafers/substrates |
| Max. Pressure | 8 bar (integrated air compressor), 20 bar (external cleanroom supply) |
| Temperature Range | Ambient to 250 °C |
| UV Source | 400 W high-pressure Hg lamp, dominant wavelength 365 nm |
| Vacuum Level | ≤10 Pa |
| Heating Method | Electromagnetic single-side heating |
| Automation | Motorized auto-demolding |
| Compatible imprint modes | Thermal embossing & UV-curable step-and-flash imprint lithography (S-FIL) |
| Optional consumables | Full suite of nanoimprint resists (thermal, UV-curable, lift-off, deep-etch), anti-sticking agents, adhesion promoters, and custom mold fabrication support (Ni, SFP®, Hybrid Mold®) |
| Resolution capability | ≤20 nm (with appropriate mold and process optimization) |
| Compliance | Designed for R&D and pilot-line use under GLP-aligned lab practices |
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