Thin Film Growth Equipment
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| Brand | Shenyang K.Y. |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | PVD400 |
| Instrument Type | Magnetron Sputtering Coater |
| Application Field | Microelectronics |
| Substrate Size | Ø100 mm (1 × 4-inch wafer) |
| Targets | Three Ø50.8 mm (2-inch) Permanent-Magnet DC/RF Sputtering Targets |
| Maximum Substrate Temperature | 800 °C |
| Thickness Uniformity (within wafer) | ≤ ±3% |
| Base Vacuum | ≤ 6.6 × 10⁻⁵ Pa |
| Origin | USA |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SMART NanoFab |
| Pricing | Upon Request |
| Source Capacity | 4 or 8 effusion cells / e-beam sources |
| Integrated In-situ Monitors | RHEED, QCM, Linear Beam Flux Monitor |
| Growth Modes | Thermal Evaporation, E-beam Evaporation, RF Plasma, Pulsed Laser Deposition (PLD), Sputtering, Gas-Phase Precursor Delivery |
| Compatible Materials | III–V (e.g., GaAs, InP), II–VI (e.g., CdTe, ZnSe), II–Oxides (e.g., ZnO), III–Nitrides (e.g., GaN, AlN), and other compound semiconductors |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Model | Glove Box Integrated |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C (customizable) |
| Precursor Channels | Up to 6 (solid & liquid sources supported, customizable) |
| Reactant Gas Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Channels | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5×10⁻³ Torr |
| Vacuum Pump | Standard oil-sealed rotary vane pump |
| Control System | 19″ industrial touch display, embedded IPC running Windows 7, PLC-based real-time control with fieldbus support |
| Source Bottle Heater | RT–200 °C |
| Glove Box Integration | Dual-glove, single-station configuration (customizable) |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PA Series |
| Process Temperature Range | RT to 450°C |
| Precursor Channels | Up to 4 (customizable), supporting solid & liquid precursors |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Monitoring | Triple corrosion-resistant capacitance manometers, 0.005–1000 Torr |
| Base Vacuum | <5×10⁻³ Torr |
| Heating Zone Temperature Range | RT to 150°C |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | PEALD E200SP |
| Substrate Size | 200 mm (8 inch) diameter (customizable) |
| Process Temperature Range | Room Temperature to 500 °C (customizable) |
| Precursor Channels | Up to 6 independent precursor lines (solid & liquid sources, customizable) |
| Reactant Gas Lines | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Plasma Gas Lines | 4 (customizable) |
| RF Power | 0–1000 W |
| Pressure Measurement | Dual corrosion-resistant capacitance manometers (0.005–1000 Torr) |
| Base Vacuum | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touch-enabled HMI, embedded IPC, Windows 7 OS, PLC-based real-time control |
| Source Bottle Heating | RT–200 °C (independent modules) |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | Thermal-ALD E300S |
| Substrate Size | 300 mm (12 inch) diameter (customizable) |
| Process Temperature Range | RT to 500 °C |
| Temperature Uniformity | ±1 °C (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid & liquid precursors with heated source bottles |
| Reactant Channels | 2 (customizable) |
| Carrier Gas | N₂ with MFC flow control (customizable) |
| Pressure Range | 0.005–1000 Torr (dual corrosion-resistant capacitance manometers) |
| Base Pressure | <5 × 10⁻³ Torr |
| Vacuum System | Standard oil-sealed rotary vane pump |
| Control System | 19-inch industrial touchscreen HMI, embedded IPC running Windows 7, PLC-based real-time logic control with fieldbus support |
| Brand | SUPERALD |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | UHV ALD |
| Quotation | Upon Request |
| Substrate Diameter | 100 mm (4 inch), customizable |
| Process Temperature Range | RT to 400 °C, ±1 °C accuracy (customizable) |
| Precursor Channels | Up to 6 independent, supporting solid and liquid precursors with dedicated heated source bottles |
| Reactant Channels | 2 standard (customizable) |
| Carrier Gas | N₂ with MFC-controlled flow (customizable) |
| Vacuum System | High-performance turbomolecular pump suite for ultra-high vacuum (UHV) base pressure <5×10⁻⁸ mbar |
| Heating Capability | Source bottles and reactor zone heated up to 150 °C |
| Control System | Industrial embedded IPC with 19″ capacitive touchscreen, Windows 7 OS, real-time PLC-based logic control via Ethernet |
| Transfer System | Manual magnetic wand loading with dedicated load-lock chamber, gate valves, and integrated vacuum interlocks |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | PLD-Workstation |
| Price Range | USD 650,000 – 13.5 million |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | Laser MBE |
| Vacuum Class | Ultra-High Vacuum (UHV) |
| Base Pressure | ≤5×10⁻¹⁰ mbar (typical) |
| Substrate Heater | Resistive, 100–1000 °C (±0.5 °C stability) |
| Target Capacity | Up to 5 × 1-inch targets on rotating carousel |
| Laser Integration | Nd:YAG or excimer laser compatible (193–266 nm, pulse energy up to 500 mJ, repetition rate 1–10 Hz) |
| Load-Lock Capacity | 5 substrates + 2 target carousels |
| In-situ Diagnostics Ports | RHEED, OES, FTIR, QMS (CF-63/CF-100 flanges) |
| Automation Level | Fully programmable deposition sequence with real-time parameter logging and audit trail |
| Compliance | Designed for GLP/GMP-aligned lab environments |
| Brand | SurfaceTech |
|---|---|
| Origin | Germany |
| Model | PLD-Workstation |
| Excimer Laser | Coherent COMPexPro 201F or 205F (248 nm) |
| Laser Gas | 20 L premixed KrF gas + 10 L He |
| Process Gases | 2× Mass Flow Controllers (MFC) |
| Substrate Heater | 2" up to 850 °C or 1"/3" up to 1000 °C |
| Substrate Rotation | 0–50 RPM |
| Target Carousel | 4×2" targets, rotation 0–50 RPM |
| Vacuum Chamber | Modular flanged design with multiple CF/NW ports |
| Control System | PC-based LabVIEW software with integrated TFT display |
| Dimensions | ~2200 × 850 × 1600 mm |
| Power Supply | 3×400 VAC/50 Hz or 3×208 VAC/60 Hz |
| Cooling | Integrated chiller unit |
| Compliance | CE-marked, Class 1 laser enclosure per IEC 60825-1 |
| Origin | USA |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | 35V14 |
| Pricing | Available Upon Request |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | 35-V-100 |
| Substrate Size | 4-inch |
| Source Capacity | Up to 10 effusion cells |
| Se Source Options | Point sources (200–2000 cm³), Linear source (8000 cm³) |
| Substrate Heater | High-temperature, uniform, programmable up to 700 °C |
| Vacuum System | Multi-pump configuration with integrated Se trap |
| Chamber Architecture | Modular design |
| In-situ Monitoring | Integrated quartz crystal microbalance (QCM) and optical emission spectroscopy (OES) |
| Compliance | Designed for GLP-compliant R&D environments |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | AccuFlux |
| Application | Real-time, non-invasive atomic beam flux monitoring in molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD) systems |
| Simultaneous Channels | 4 elements |
| Minimum Detectable Growth Rate | <0.002 nm/s |
| Light Source Type | Element-specific hollow-cathode lamps |
| Optical Architecture | Self-referencing, self-aligning optical path |
| Source Compatibility | Solid-source effusion cells and gas-phase precursors |
| Environmental Robustness | Operable under high partial pressure conditions (e.g., As₂, PH₃, O₂) |
| Control Interface | Optional remote I/O module with real-time shutter and source feedback for closed-loop process control |
| Regulatory Alignment | Designed to support GLP-compliant data integrity and ASTM F1526-22 compliant thin-film process validation |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | IS4000 / IS6000 |
| Temperature Range (Pyrometer) | 450 °C – 1,300 °C |
| Temperature Range (Bandgap Module) | Room Temperature – 700 °C |
| Spectral Bands (Pyrometer) | 950 nm & 850 nm |
| Spectral Bands (Reflectometer) | 950 nm & 470 nm |
| NETD (Pyrometer) | < 0.5 °C |
| NETD (Thickness) | < 1 nm @ film > 100 nm |
| Spot Size | Ø2.75″ CF flange (optional Ø4.5″ CF with edge mount) |
| Dimensions | 100 × 140 × 130 mm |
| Minimum Target Distance | > 7 mm |
| Substrate Compatibility | Si, GaAs, InP, Sapphire, STO, GaSb, MCT, ZnO, GaN, ZnTe, SiC, CIGS |
| Interface | RS-232 serial |
| OS Requirement | Windows XP or later |
| Compliance | Designed for GLP/GMP-aligned process environments |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | ALD-05 |
| Pricing | Upon Request |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | CL/HL/HT Series |
| Temperature Range | 0 °C to 1,400 °C |
| Power | 600 W or 1 kW |
| Temperature Stability | ±0.1 °C |
| Temperature Repeatability | ±0.1 °C |
| Thermocouple | Type C (Type D optional) |
| Crucible Capacity | 16–80 cm³ |
| Standard Flange | 2.75″ or 4.5″ OD-CF |
| Standard Length | 12″ (305 mm) |
| Filament | Amphenol annular filament |
| Thermocouple Connector | Omega subminiature |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVT-35 Series (e.g., 35-6, 35-N, 35-G-4, SM-6, S-8, 35-D, SVT-V, NanoFab, UVD-02, PLD-02, 35V14, 26-O-V) |
| Base Vacuum | < 1×10⁻¹⁰ Torr |
| Substrate Size Options | 2″, 3″, 4″, 6″, 8″, or multiple small wafers (up to 14″ in 35V14) |
| Source Capacity | Up to 10 effusion cells (standard), plus optional RF plasma sources, cracking cells, e-beam evaporators, or liquid-source injectors |
| Chamber Architecture | Modular UHV system with load-lock, prep/analysis chamber, and main growth chamber |
| Compliance | Designed for ASTM F1529, ISO 14644-1 Class 4 cleanroom integration, and GLP/GMP-aligned process documentation workflows |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | PLD-01 / PLD-02 |
| Chamber Diameter | 12" (305 mm) |
| Base Pressure | ≤5×10⁻⁸ Torr (with 250 L/s turbomolecular pump) |
| Target Mount | 6×1" (25 mm) rotating and Z-adjustable |
| Substrate Holder | 1" (25 mm), heated to 800 °C (1000 °C optional), rotation & Z-motion enabled |
| In-situ Monitoring | Quartz Crystal Microbalance (QCM) deposition rate monitor |
| Optional Add-ons | RHEED, differential pumping, laser beam scanning, RF plasma source (O₂/N₂), load-lock integration, L-MBE upgrade |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model Options | 2.75", 4.5", 6.0" CF Flange |
| RF Power Range | 200–600 W |
| Gas Flow Range | 0.1–10 SCCM (N₂, O₂, H₂) |
| Plasma Chamber Materials | Pyrolytic Boron Nitride (PBN), Alumina, Quartz |
| Cooling | Water, 0.17 GPM (0.227 m³/hr) |
| Plasma Viewing Window | Integrated |
| Aperture & Cavity Geometry | Customizable |
| RF Matching | Manual (Auto-tuning optional) |
| Plasma Beam Composition | Predominantly neutral atomic species, negligible ion energy (<5 eV) |
| Typical Growth Rate | >4 µm/hr for nitride/oxide films |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | RHEED |
| Electron Beam Energy | 10 keV |
| Filament Current | 3 A |
| Emission Current | 5 A |
| Spot Size | 1.0 mm at 17″ (432 mm) working distance |
| Maximum Bakeout Temperature | 230 °C |
| Flange Options | 2.75″ and 4″ CF |
| Detector | High-Resolution CCD or Scientific CMOS Camera |
| Software | Real-Time RHEED Image Analysis Suite (2D/3D intensity profiling, oscillation tracking, growth rate calculation) |
| Magnetic Shielding | Integrated mu-metal housing for electron optics |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVT-AH |
| Heating Principle | Electron-beam heated tungsten/molybdenum filament |
| Max Filament Temperature | 2873 K |
| Emission Current | Up to 100 mA |
| Power Supply Requirement | 300 W |
| Filament Current | 15 A |
| Vacuum Interface | 2.75″ (70 mm) CF flange |
| Compatible With | Standard MBE Systems via Adaptable Flange Kits |
| Recommended Power Supply | SVTA-H1-PS (Triply Integrated: High-Voltage Bias, High-Current Filament, and Emission Control with Beam Current Monitoring & Display) |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVT-DF |
| Interface | 4.5″ or larger Conflat (CF) flange |
| Temperature Range | 0 °C to 1,400 °C |
| Power Rating | 600 W / 1 kW |
| Temperature Stability | ±0.1 °C |
| Temperature Reproducibility | ±0.1 °C |
| Thermocouple Type | Type C (Type D optional) |
| Crucible Capacities | 16 cc, 20 cc, 22 cc, 40 cc, 60 cc, 85 cc, 150 cc |
| Standard Length | 12″ (304.8 mm) |
| Flange Options | 2.75″ or 4.5″ OD CF |
| Filament Connector | Amphenol ring-type |
| Thermocouple Connector | Omega subminiature |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVT-Excel |
| Temperature Range | 0–600 °C |
| Power Rating | 600–1000 W |
| Temperature Stability | ±0.1 °C |
| Temperature Repeatability | ±0.1 °C |
| Thermocouple Type | K-type |
| Crucible Capacities | 16, 20, 22, 40, 60, and 150 cm³ (including conical-walled and PBN crucibles) |
| Standard Length | 12 in (304.8 mm) |
| Flange Options | 2.75 in or 4.5 in OD ConFlat (CF) |
| Filament | Amphenol annular heater |
| Thermocouple Connector | Omega subminiature |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVTA-APH3-GCS |
| Operating Temperature Range | 150 °C to 1300 °C |
| Heating Configuration | Single Filament with Dual-Gas-Tube Furnace |
| Cracking Zone Materials | High-Purity Pyrolytic Boron Nitride (PBN) and Tantalum |
| Aperture Plate System | Modular, User-Selectable |
| Gas Delivery | High-Pressure Compatible, MFC-Integrated |
| Beam Uniformity Optimization | Customizable Source Length |
| Control Interface | Automated Beam Flux Regulation via Mass Flow Controllers (MFCs) |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVTA-CBR4 |
| Type | High-Purity Solid-Source Effusion Cell for p-Type Doping in III–V MBE |
| Operating Principle | Thermally Controlled Effusion of CBr₄ Vapor |
| Temperature Range | 120–220 °C (adjustable, material-dependent) |
| Vapor Pressure Control | Precision Needle Valve + Heated Capillary Line + PID Temperature Regulation |
| Gas Delivery Interface | Dual-Stainless-Steel Conflat (CF) Flange |
| Optional Vacuum Monitoring | Cold Cathode Ion Gauge with Controller |
| Bakeout Capability | Integrated Resistive Heating for Full Gas Path Conditioning |
| Compliance | Designed for UHV-Compatible MBE Systems (≤1×10⁻¹⁰ Torr base pressure) |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SVTA-CL |
| Pricing | Upon Request |
| Spectral Range | 200–900 nm |
| Optical Resolution | 0.5 nm |
| Detector Quantum Efficiency | 25% |
| Detector Output | 10 V/nW |
| Noise-Equivalent Voltage | <250 V |
| Viewport | 2.75'' ConFlat (CF) |
| External Dimensions | 9.0'' × 25.5'' × 10.1'' (22 cm × 65 cm × 26 cm) |
| Internal Chamber Clearance | 1.25'' × 13.1'' (3.2 cm × 34 cm) |
| Linear Translation Stroke | 8'' (20.3 cm) |
| Target-to-Detector Distance | 2'' (5.1 cm) |
| OS Compatibility | Windows 9x/2000/XP |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVTA-CLM-6, SVTA-CLM-4 |
| Maximum Substrate Size | 200 mm (SVTA-CLM-6), 125 mm (SVTA-CLM-4) |
| Port Configuration | Six 305 mm (12″) CF flanges + one 152 mm (6″) CF viewport + one 70 mm (2.75″) CF ion gauge port (SVTA-CLM-6) |
| Vacuum Compatibility | UHV-capable (≤1×10⁻⁹ Torr base pressure with appropriate pumping) |
| Structural Material | 304 or 316 stainless steel, electropolished interior |
| Flange Standard | ConFlat (CF), ISO-K and ISO-F variants available upon request |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVTA-LBFM |
| Vacuum Compatibility | Ultra-High Vacuum (UHV) |
| Filament Positioning | Front-of-source mountable |
| Bakeout Temperature | 230 °C (max), 200 °C (standard operational) |
| Flange Options | 2.75″ CF or 4.5″ CF |
| Optional Isolation Valve | Yes |
| Beam Voltage | 10 kV |
| Filament Current | 3 A |
| Emission Current | 5 A |
| Optical Path Clearance | 4.5″ CF-compatible aperture |
| Beam Spot Diameter | 1.0 mm at 17″ (432 mm) working distance |
| Customizable Probe Length | Yes |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SVTA-LMBE |
| Pricing | Available Upon Request |
| Brand | SVT Associates |
|---|---|
| Origin | USA |
| Model | SVTA-MAN |
| Vacuum Compatibility | Ultra-High Vacuum (UHV) |
| Max Substrate Temperature | 1400 °C |
| X-Y Positioning Resolution | 1 µm |
| X-Y Repeatability | ±1 µm |
| X-Y Travel Range | ±0.5 inch |
| Z Travel Range | 4.0 inch |
| Z Resolution | 1 mm (or 1/32 inch) |
| Z Repeatability | ±1 mm (or ±1/32 inch) |
| Rotary Accuracy | ±1.25° |
| Rotary Hysteresis | <1° |
| Corrosion-Resistant Options | O₂-compatible, NH₃-compatible |
| Substrate Diameter Support | 1″ to 8″ |