- All
- Favorite
- Popular
- Most rated
| Brand | LEI-TECH |
|---|---|
| Origin | Tianjin, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Country of Manufacture | China |
| Model | LK-53P-S |
| Pricing | Available Upon Request |
| Key | Brand: LEI-TECH |
|---|---|
| Model | LK53P |
| Origin | Tianjin, China |
| Manufacturer Type | OEM Manufacturer |
| Optical System | Infinity-Corrected (UISC) |
| Total Magnification | 50×–500× |
| Eyepieces | PL10×/22 mm with reticle |
| Objectives | 5×, 10×, 20×, 50× (achromat, polarized-light optimized) |
| Illumination | Dual-mode (transmitted Köhler + reflected halogen, 12 V/50 W, pre-centered) |
| Polarization Components | Rotatable analyzer (0–360°, 2° scale, ±6′ accuracy), removable λ-plate (551 nm), λ/4-plate (147.3 nm), quartz wedge (I–IV order), built-in Bertrand lens |
| Stage | 360° rotatable metal stage with graphite coating |
| Condenser | Swing-out achromatic condenser (NA 1.2), integrated polarizer with 0°/90°/180°/270° indexing |
| Focus Mechanism | Coaxial coarse/fine focus with tension adjustment and upper limit stop |
| Camera Interface | C-mount, 20 MP sensor (5440 × 3648 effective pixels) |
| Software Features | Real-time Extended Focus Imaging (EFI), Multi-Field Image Assembly (MIA), quantitative measurement, image annotation & calibration |
| Compliance | Designed per ISO 8578 (microscope mechanical standards), compatible with GLP documentation workflows and ASTM E112 / E1181 for grain/phase analysis |
| Brand | LEI-TECH |
|---|---|
| Origin | Tianjin, China |
| Manufacturer Type | Direct Manufacturer |
| Model | LK53P-LRT600 |
| Optical System | Infinity-Corrected Universal Imaging System (UISC) |
| Total Magnification | 50×–500× (with 5×, 10×, 20×, 50× objectives) |
| Eyepieces | Widefield PL10×/22 mm (with micrometer scale) |
| Observation Modes | Brightfield, Polarized Light |
| Illumination | Dual-path (transmitted Köhler + reflected halogen, 12 V/100 W, pre-centered) |
| Condenser | Achromatic swing-out, NA 1.2, with rotatable polarizer (0°/90°/180°/270° positions) |
| Analyzer | Rotatable 360°, graduation 2°, accuracy ±6′, lockable |
| Compensators | λ plate (551 nm), λ/4 plate (147.3 nm), quartz wedge (I–IV order) |
| Stage | Precision XY mechanical stage (±6 mm each axis), 360° rotatable metal platform with graphite coating |
| Focus Mechanism | Coaxial coarse/fine focus, tension-adjustable, upper limit stop |
| Temperature Control Stage | Integrated cryo-heating stage (–196 °C to +600 °C), sample area Ø16 mm, optical aperture Ø2 mm, heating rate up to 50 °C/min, cooling rate down to –25 °C/min, temperature resolution 0.1 °C, control stability ±0.1 °C |
| Minimum Working Distance | 4.5 mm (objective), 11 mm (condenser) |
| Imaging System | 20 MP CMOS sensor (5440 × 3648), liquid-nitrogen-cooled for low-noise acquisition |
| Software Functions | Real-time Extended Focus Imaging (EFI), Multi-Image Alignment (MIA), quantitative birefringence measurement, grain orientation mapping, phase transition tracking |
| Brand | LEI-TECH |
|---|---|
| Origin | Tianjin, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | LK-530P-S |
| Pricing | Upon Request |
| Brand | LEI-TECH |
|---|---|
| Origin | Tianjin, China |
| Manufacturer Type | OEM Manufacturer |
| Model | LK-LRT-53P-600 |
| Optical System | Infinity-Corrected UISC (Universal Infinity Space Correction) |
| Total Magnification | 50×–500× |
| Eyepiece | PL10×/22 mm (with reticle) |
| Objective Turret | Quintuple, center-adjustable |
| Polarizer & Analyzer | Rotatable 360° (2° scale, ±6′ accuracy), lockable |
| Compensators | λ plate (551 nm), λ/4 plate (147.3 nm), quartz wedge (I–IV order) |
| Temperature Range | −196 °C to +600 °C (liquid nitrogen cooling optional) |
| Temp. Stability & Accuracy | ±0.05 °C |
| Max. Heating Rate | ≥60 °C/min |
| Max. Cooling Rate | 40 °C/min |
| Aperture Diameter | 2.4 mm |
| Imaging Sensor | 20 MP (5440 × 3648) |
| Illumination | Dual-path halogen (transmitted Köhler + reflected epi-illumination), LBD filter set, adjustable field & aperture diaphragms |
| Software Functions | Real-time thermal-video sync, multi-step programmable temperature profiling, EFI (Extended Focus Imaging), MIA (Multi-Image Alignment) stitching, quantitative measurement suite |
| Brand | LEI-TECH |
|---|---|
| Origin | Tianjin, China |
| Manufacturer Type | Direct Producer |
| Country of Origin | China |
| Model | SMBY |
| Price | USD 145 (FOB Tianjin) |
| Brand | LEI-TECH |
|---|---|
| Origin | Tianjin, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | LK-530P |
| Price | Upon Request |
| Optical System | Infinity-Corrected Dual-Achromatic (UISC) |
| Illumination | High-Stability White LED (CCT 3700–5000 K) |
| Total Magnification | 40×–400× (with 4×, 10×, 40×s objectives) |
| Eyepieces | Widefield Plan Eyepieces PL10×/20 |
| Tube | Trinocular, 30° Inclined, 360° Rotatable, Diopter Adjustment (±5), Interpupillary Distance 54–76 mm |
| Nosepiece | Internal-Positioning Quadruple Objective Turret with Centering Wrench |
| Stage | Precision Metal Rotary Stage (Ø160 mm), 360° Rotation (1° Graduation, ±6′ Accuracy), Lockable, Graphite-Coated Surface, Equipped with Mechanical Slide Holder & 0.01 mm Vernier Scale |
| Condenser | Stress-Free Abbe Condenser (NA 1.25), Center-Adjustable, Rack-and-Pinion Height Control |
| Focus Mechanism | Coaxial Coarse/Fine Drive, 28 mm Coarse Travel, 0.002 mm Fine Step Resolution, Upper Limit Stop, Tension Adjustment |
| Polarizing System | Rotatable Polarizer (0°/90°/180°/270° Indexed Stops with Lock), Bertrand Lens (Manual Lever-Actuated, Center & Focus Adjustable), Optional Full-Wave (551 nm), Quarter-Wave (147.3 nm), and Quartz Wedge Retardation Plates |
| Objectives | Strain-Free Plan Achromatic Objectives (4×, 10×, 40×s), Anti-Fungal Coating |
| Imaging Module | 20 MP CMOS Sensor (5440 × 3648 Effective Pixels) |
| Power Supply | Universal Input 100–240 V AC, 50/60 Hz |
Show next