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| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-PRO-001 |
| Operation Type | Fully Automatic |
| Platform Size | 60 cm × 60 cm |
| XY Travel Range | 50 mm × 50 mm |
| Z Travel | 200 mm |
| Max Sample Size | 65 mm × 65 mm |
| Max Sample Weight | 4 kg |
| CCD Magnification Options | 5×, 10×, 20×, 50× (long-working-distance objective) |
| Vertical Speed Range | 0.02–4 mm/s |
| Rotation | 360° motorized |
| Illumination | Coaxial ring + transmitted backlight |
| Control Interface | Integrated touchscreen (780 mm × 600 mm display), software-driven with manual override capability |
| Environmental Operating Range | 0–40 °C, ≤80% RH |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-MPS-001 |
| Type | Temperature-Controlled Manual Probe Station |
| Operation | Manual |
| XY Travel Range | 70 mm × 70 mm (with 360° rotation) |
| Z-Axis Stroke | 65 mm |
| Sample Stage Dimensions | 600 mm × 600 mm × 200 mm |
| Max Load Capacity | 10 kg |
| Microscope Compatibility | Stereo or Metallurgical Microscope with C-mount interface |
| Eyepiece Magnification | 20× |
| Working Distance | 18.9–33.61 mm |
| Optical Magnification Options | 5×/10×/20×/50×/100× |
| Imaging Resolution | ≤1.2 µm |
| CCD Camera | 640×480 resolution |
| Vertical Lift Range | 0–50 mm (motorized, speed 0.02–4 mm/s) |
| Electrical Rating | 220 V AC, max 1 A |
| Max Bias Voltage Support | ±1500 V |
| Control PC | Intel i7-7500T, 16 GB DDR4, 256 GB SSD, Windows 10 OS |
| Display | 1920×1080 Full HD |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-MLM-001 |
| Resolution | 0.3 µm |
| Light Source Wavelength | 405 nm |
| Maximum Optical Power | 300 mW |
| Alignment Accuracy (Frontside) | ±0.1 µm (within 1 mm) |
| Alignment Accuracy (Backside) | ±1 µm (within 2.5 mm) |
| Writing Speed | 3–150 mm²/min |
| Substrate Compatibility | 2″–8″ wafers, glass, flexible substrates |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-MLM-002 |
| Light Source | High-intensity Hg lamp / 365 nm i-line / Optional 405 nm UV LED |
| Illumination Uniformity | ≥90% |
| Intensity Stability | ±2% |
| Intensity Density | ≥50 mW/cm² (at wafer plane) |
| Optical Resolution | ≤2 µm (contact mode), ≤5 µm (proximity mode) |
| Exposure Area | 25 mm × 25 mm (customizable) |
| Exposure Time Range | 0.01–60 s (0.01 s step) |
| Alignment Accuracy | ≤2 µm |
| Stage Repeatability | ≤1 µm |
| Substrate Compatibility | 2″–6″ Si, glass, quartz, flexible substrates |
| Power Supply | AC 220 V / 50 Hz / ≤300 W |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-PRO-002 |
| Operation Type | Fully Automatic |
| Probe Positioning Resolution | 1 µm |
| Integrated Vacuum Pump | Yes |
| Display | 27-inch 2K Full HD Monitor |
| Motorized Axes | X-Y-Z with Sample Stage Heating & Vacuum Chuck Control |
| Optical Imaging | Nikon CCD Camera (Visible to Near-IR) |
| RF Connectivity | Supported with Multiple RF Connector Types (SMA, K, V) |
| Probe Compatibility | GGB (USA), Korean OEM, and Domestic Probes |
| External Instrument Integration | Picosecond/Femtosecond Lasers, Raman, SHG, Photoconductivity Systems |
| Brand | Abner |
|---|---|
| Model | ABN-VPS-001 |
| Temperature Range | −190 °C to +300 °C |
| Environment Options | Ambient, Vacuum, Inert Gas (N₂/Ar) |
| Operation Mode | Fully Automatic |
| Probe Station Type | Vacuum-Compatible Thermal Probe Station |
| Motion System | Precision XYZ Motorized Stage with Thermal Drift Compensation |
| Microscope Compatibility | Stereo and Metallurgical Microscope Mounting Interface |
| Safety Features | Dual-Stage Over-Temperature Protection, Interlocked Vacuum & Cooling System |
| Compliance | Designed for GLP-compliant lab environments |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-COA-001 |
| Rotation Accuracy | ±1 RPM |
| Max Adjustable Acceleration | 500–3000 RPM/s |
| Speed Range | 500–8000 RPM |
| Time Setting | 1–999 s |
| Max Substrate Size | 400 mm × 400 mm (customizable) |
| Power Supply | 220 V ±10%, 50/60 Hz |
| Power Consumption | ~100 W |
| Dimensions | 300 mm × 300 mm × 200 mm |
| Weight | ~10 kg |
| Vacuum Chuck | Standard |
| Liquid Dispense Control | Microliter-scale precision (µL-level) |
| Brand | Oxford Instruments |
|---|---|
| Model | Plasmalab 133 |
| Maximum Wafer Size | 300 mm (330 mm chuck) |
| RF Power | 600 W, 13.56 MHz |
| Electrode Temperature Control | 10 °C – 80 °C (water-cooled) |
| Endpoint Detection | Verity Optical Emission Spectroscopy (OES), 200–800 nm |
| Gas Delivery | 8-line manifold with 7 Mass Flow Controllers (MFCs): Ar (100 sccm), Cl₂ (100 sccm), BCl₃ (100 sccm), N₂O (200 sccm), CHF₃ (200 sccm), NH₃ (100 sccm), CH₄ (50 sccm) |
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