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| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-MLM-002 |
| Light Source | High-intensity Hg lamp / 365 nm i-line / Optional 405 nm UV LED |
| Illumination Uniformity | ≥90% |
| Intensity Stability | ±2% |
| Intensity Density | ≥50 mW/cm² (at wafer plane) |
| Optical Resolution | ≤2 µm (contact mode), ≤5 µm (proximity mode) |
| Exposure Area | 25 mm × 25 mm (customizable) |
| Exposure Time Range | 0.01–60 s (0.01 s step) |
| Alignment Accuracy | ≤2 µm |
| Stage Repeatability | ≤1 µm |
| Substrate Compatibility | 2″–6″ Si, glass, quartz, flexible substrates |
| Power Supply | AC 220 V / 50 Hz / ≤300 W |
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