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| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-MLM-001 |
| Resolution | 0.3 µm |
| Light Source Wavelength | 405 nm |
| Maximum Optical Power | 300 mW |
| Alignment Accuracy (Frontside) | ±0.1 µm (within 1 mm) |
| Alignment Accuracy (Backside) | ±1 µm (within 2.5 mm) |
| Writing Speed | 3–150 mm²/min |
| Substrate Compatibility | 2″–8″ wafers, glass, flexible substrates |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-MLM-002 |
| Light Source | High-intensity Hg lamp / 365 nm i-line / Optional 405 nm UV LED |
| Illumination Uniformity | ≥90% |
| Intensity Stability | ±2% |
| Intensity Density | ≥50 mW/cm² (at wafer plane) |
| Optical Resolution | ≤2 µm (contact mode), ≤5 µm (proximity mode) |
| Exposure Area | 25 mm × 25 mm (customizable) |
| Exposure Time Range | 0.01–60 s (0.01 s step) |
| Alignment Accuracy | ≤2 µm |
| Stage Repeatability | ≤1 µm |
| Substrate Compatibility | 2″–6″ Si, glass, quartz, flexible substrates |
| Power Supply | AC 220 V / 50 Hz / ≤300 W |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Model | ABN-COA-001 |
| Rotation Accuracy | ±1 RPM |
| Max Adjustable Acceleration | 500–3000 RPM/s |
| Speed Range | 500–8000 RPM |
| Time Setting | 1–999 s |
| Max Substrate Size | 400 mm × 400 mm (customizable) |
| Power Supply | 220 V ±10%, 50/60 Hz |
| Power Consumption | ~100 W |
| Dimensions | 300 mm × 300 mm × 200 mm |
| Weight | ~10 kg |
| Vacuum Chuck | Standard |
| Liquid Dispense Control | Microliter-scale precision (µL-level) |
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