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| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Type | Full-Spectrum Simultaneous ICP-OES |
| Detection Limit (Zn at 213.856 nm) | 0.06 ppb |
| Precision (RSD) | ≤0.5% |
| Long-Term Stability (RSD, 4h) | ≤1.5% |
| Wavelength Range | 160–900 nm |
| Optical Resolution | 0.003 nm (at 200 nm) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported |
| Model | PlasmaQuant 9200 |
| Instrument Category | Full-Spectrum Simultaneous ICP-OES |
| Wavelength Range | 160–900 nm |
| Optical Resolution | 0.002 nm (at 200 nm) |
| Brand | Analytik Jena |
|---|---|
| Origin | Germany |
| Manufacturer | Analytik Jena AG |
| Product Type | Imported Instrument |
| Model | PlasmaQuant 9100 |
| Detection Principle | Full-Spectrum Direct-Reading ICP-OES |
| Optical Range | 160–900 nm |
| Optical Resolution | ≤3 pm |
| Wavelength Accuracy | <0.0004 nm |
| Observation Modes | Dual-View (Radial + Axial) with Four Simultaneous Viewing Configurations |
| Plasma System | High-Stability, High-Power RF Generator (27.12 MHz) |
| Detector | Back-Illuminated CCD with Deep-UV Sensitivity |
| Startup Time | <5 minutes |
| Gas Efficiency | Integrated Plasma Gas Recycling for Cooling & Purge Streams |
| Software | Aspect PQ with ABC and CSI Background Correction Algorithms |
| Compliance | Designed for GLP/GMP environments |
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