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| Brand | Kaufman |
|---|---|
| Origin | USA |
| Model | RFICP 220 |
| Anode Power | 2 kW @ 2 MHz |
| Max Beam Current | >1000 mA |
| Ion Energy Range | 100–1200 eV |
| Beam Diameter | 22 cm |
| Gas Compatibility | Ar, O₂, N₂, others |
| Gas Flow | 5–50 sccm |
| Operating Pressure | <0.5 mTorr |
| Grid Material | Molybdenum |
| Ion Optics | OptiBeam™ self-aligning electrostatic lens system |
| Neutralizer | LFN 2000 or MHC 1000 |
| Flange | 10" CF |
| Dimensions (H × D) | 30 cm × 41 cm |
| Compliance | Designed for UHV integration and compatible with ISO-KF/CF vacuum standards |
| Brand | Europlasma |
|---|---|
| Origin | Belgium |
| Model | CD 1000 |
| Coating Thickness | 50–500 nm (single-layer), 1–3 µm (multi-layer) |
| Waterproof Rating | IPX2–IPX8 |
| Cycle Time | 10–30 min (standard), 3–4 h (multi-layer) |
| Substrate Compatibility | Nonwovens, polymer films, meshes, nanofiber webs, PCBs, electronic assemblies, 3D components |
| Compliance | ISO 10993-5 (cytotoxicity), ISO 10993-10 (irritation/sensitization), halogen-free formulation |
| Operating Environment | Low-pressure plasma chamber, vacuum-based surface polymerization & atomic layer deposition (ALD)-compatible process |
| Brand | Kaufman & Robinson, Inc. (KRI) |
|---|---|
| Origin | USA |
| Model | eHL400-2 / eHL400-3 / eHL400-4 / eHL400-5 |
| Anode Configuration | Standard or Grooved |
| Cathode/Neutralizer | Filamentless |
| Beam Divergence (HWHM) | >45° |
| Operating Gases | Ar, Xe, Kr, O₂, N₂, and organic precursors |
| Discharge Voltage/Current | 50–300 eV / up to 5 A |
| Module Dimensions (per eH400 unit) | Ø94 mm × H76 mm |
| Total Source Length | Up to 1000 mm (modular assembly) |
| Orientation | Vertical or Horizontal |
| Power Supply | eH Plasma Power Pack (eHL-30010A), DC magnetic confinement, 40–200 VDC |
| Mounting | Movable base or quick-connect flange |
| Compliance | Designed for integration into UHV and HV vacuum systems per ISO 3529-3, ASTM F1180, and SEMI E10 standards |
| Brand | Kaufman & Robinson, Inc. (KRI) |
|---|---|
| Origin | USA |
| Model | RFICP 40 |
| Discharge Chamber Anode | RF-coupled |
| Ion Beam Current | >100 mA |
| Ion Kinetic Energy | 100–1200 eV |
| Grid Diameter | 4 cm |
| Beam Modes | Focused, Parallel, Divergent |
| Process Gas Flow | 3–10 sccm |
| Compatible Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Operating Pressure | < 0.5 mTorr |
| Dimensions (L × Ø) | 12.7 cm × 13.5 cm |
| Neutralizer | LFN-2000 |
| Brand | Kaufman & Robinson, Inc. (KRI) |
|---|---|
| Origin | USA |
| Model | Gridless eH Series |
| Anode Voltage Range | 50–300 V (varies by model) |
| Beam Current | 5–20 A |
| Beam Divergence Angle | >45° |
| Gas Flow Rate | 2–100 sccm (model-dependent) |
| Physical Dimensions | 3.0″–9.7″ diameter, 3.0″–6.0″ height |
| Cooling | Optional water cooling (standard on eH2000 and above) |
| Neutralizer Options | Filament (F) or Hollow Cathode (HC) |
| Brand | Kaufman |
|---|---|
| Origin | USA |
| Model | eH3000 |
| Discharge Voltage/Current | 50–300 V / up to 20 A |
| Beam Diameter | ~7 cm |
| Beam Divergence (HWHM) | >45° |
| Cooling | Water-cooled front plate |
| Compatible Gases | Ar, Xe, Kr, O₂, N₂, organic precursors |
| Mounting Flange | Quick-connect or movable base |
| Height | 4.0 in |
| Diameter | 5.7 in |
| Anode Type | Modular, standard or grooved |
| Cathode Options | Filament, Sidewinder filament, or hollow cathode |
| Gas Control | Up to 4 independent gas channels |
| Installation Distance | 16–45 in |
| Application Scope | Ion-assisted deposition (IAD), ion beam sputtering (IBS), ion beam assisted deposition (IBAD), surface activation, direct ion beam deposition (DD), optical coating, thin-film densification |
| Brand | Kaufman (KRI) |
|---|---|
| Origin | USA |
| Model | RFICP-380 |
| Discharge Power | 2 kW @ 1.8 MHz |
| RF Auto-Matching | Yes |
| Max Anode Power | >1 kW |
| Max Ion Beam Current | >1000 mA |
| Ion Beam Energy | 100–1200 eV |
| Grid Diameter | 38 cm (Φ) |
| Grid Material | Molybdenum |
| Beam Optics | OptiBeam™ Self-Aligning Ion Optics |
| Beam Profiles | Collimated, Focused, or Divergent |
| Neutralizer | LFN-2000 |
| Operating Gases | Ar, O₂, N₂, and other process gases |
| Gas Flow Rate | 5–50 sccm |
| Chamber Pressure | < 0.5 mTorr |
| Mounting Flange | 12″ CF |
| Height | 38.1 cm |
| Diameter | 58.2 cm |
| Applications | Ion Beam Etching (IBE), Sputter Deposition, Surface Cleaning, Ion Assisted Deposition (IAD) |
| Brand | Syskey |
|---|---|
| Origin | Taiwan |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China (Taiwan Region) |
| Model | Sputter 16 |
| Vacuum Base Pressure | ≤2×10⁻¹⁰ Torr |
| Pumping System | Pfeiffer HiPace 800/1000 Molecular Pumps + KRI KDC-300 Ion Source |
| Sputtering Cathodes | 4 (Independent RF/DC configurable) |
| Substrate Manipulator | 4-Axis (Rotation + XYZ Translation) |
| Heater | SiC Radiant Heater (up to 800 °C) |
| Gas Flow Control | Precision MFCs with Throughput Regulation |
| Compliance | ISO 27001-certified distribution & GLP-aligned installation support |
| Brand | KRI (Kimball Physics / Kaufman) |
|---|---|
| Origin | USA |
| Model | KDC 40 |
| Ion Beam Diameter | 4 cm |
| Ion Energy Range | 100–1200 eV |
| Max Ion Current | >120 mA |
| Discharge Power Supply | DC, magnetic confinement |
| Cathode | Tungsten or LFN-1000 filament |
| Anode Voltage | 0–100 V DC |
| Neutralizer | Integrated thermionic cathode (Sidewinder or LFN-1000 compatible) |
| Beam Collimation | Parallel, low-divergence |
| Gas Compatibility | Ar, O₂, N₂, Xe, mixtures |
| Mounting | Conflat CF-63 (2.5") or CF-100 (4") flange |
| Operating Distance | 15–45 cm (6–18 in) |
| Optional Features | Motorized tilt stage, multi-gas manifold (up to 4 gases), third-grid auto-alignment capability |
| Compliance | Designed for UHV-compatible vacuum systems (≤1×10⁻⁷ Torr base pressure) |
| Brand | KRI (Kimball Physics / Kaufman) |
|---|---|
| Origin | USA |
| Model | KDC 100 |
| Ion Energy Range | 100–1200 eV |
| Max. Ion Current | >400 mA |
| Grid Diameter | 12 cm |
| Cathode Configuration | Dual Filament |
| Confinement | DC Magnetic |
| Anode Voltage | 0–100 V DC |
| Neutralizer Options | Sidewinder Filament, LFN 2000, or KSC 1212 |
| Beam Collimation | Parallel, Low-Divergence |
| Mounting | Quick-Release or Movable Flange |
| Operating Distance | 20–91 cm (8–36 in) |
| Gas Compatibility | Inert (Ar, Xe), Reactive (O₂, N₂, CF₄), or Mixed Gases |
| Control Interface | Analog + Digital (4-gas MFC support) |
| Optional | Motorized Tilt Mount |
| Brand | Kaufman (KRI) |
|---|---|
| Origin | USA |
| Model | RFICP 100 |
| Discharge Anode | RF |
| Ion Beam Current | >350 mA |
| Ion Energy Range | 100–1200 eV |
| Grid Diameter | 10 cm |
| Beam Optics | Focused, Parallel, or Divergent Configurations |
| Process Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Operating Pressure | <0.5 mTorr |
| Length | 23.5 cm |
| Outer Diameter | 19.1 cm |
| Neutralizer | LFN-2000 |
| Flange | 10" CF |
| Brand | KRI (Kaufman) |
|---|---|
| Origin | USA |
| Model | eH 200 |
| Configuration | Cylindrical & Linear Ion Gun Architecture |
| Neutralizer | Integrated Thermionic Cathode |
| Anode Module | Yes |
| Compatible Process Gases | Ar, O₂, N₂, Xe, CH₄, CF₄, and other inert, reactive, or organic gases |
| Power Supply | eH Plasma Power Pack (Compact, Rack-Mountable, Programmable DC/RF Hybrid Control) |
| Operating Pressure Range | 1×10⁻⁵ to 5×10⁻³ Torr |
| Beam Energy Range | 50–2000 eV (adjustable in 1 eV increments) |
| Beam Current Density | Up to 1.2 mA/cm² (at 1000 eV, Ar) |
| Extraction Aperture | 200 mm diameter |
| Beam Divergence | <±3° full angle |
| Cooling | Water-cooled anode and cathode assembly |
| Vacuum Interface | Conflat (CF) 200 or ISO-K 200 flange |
| Compliance | CE-marked, RoHS-compliant, compatible with ISO 9001-certified vacuum system integration |
| Brand | KRI (Kimball Physics / Kaufman) |
|---|---|
| Origin | USA |
| Model | KDC 75 |
| Beam Diameter | 14 cm |
| Flange Interface | 8" Conflat (CF) |
| Cathodes | Dual filament (1 active + 1 redundant) |
| Ion Energy Range | 100–1200 eV |
| Max Ion Current | >250 mA |
| Grid Diameter | 7.5 cm |
| Magnetic Confinement | DC |
| Neutralizer Options | Filament, Sidewinder Filament, or LFN-2000 |
| Mounting | Movable or Quick-Release Flange |
| Height | 7.9 in (201 mm) |
| Diameter | 5.5 in (140 mm) |
| Beam Profile | Parallel or Divergent |
| Compatible Gases | Inert (Ar, Xe), Reactive (O₂, N₂, Cl₂), or Mixed |
| Working Distance | 6–24 in (152–610 mm) |
| Gas Control | Up to 4 independent gas channels (optional auto-control) |
| Brand | KRI (Kimball Physics / Kaufman) |
|---|---|
| Origin | USA |
| Model | KDC 160 |
| Beam Diameter | 16 cm |
| Ion Energy Range | 100–1200 eV |
| Max Ion Current | >800 mA (up to >1000 mA under optimized conditions) |
| Cathode Configuration | Dual Filament (Sidewinder or LFN-2000 compatible) |
| Anode Voltage | 0–100 V DC |
| Magnetic Confinement | DC |
| Neutralizer | Integrated thermionic filament (KSC-1212 controller compatible) |
| Mounting | Quick-release or movable flange |
| Height | 9.92 in (252 mm) |
| Diameter | 9.1 in (231 mm) |
| Beam Collimation | Parallel or divergent |
| Compatible Gases | Inert (Ar, Xe), reactive (O₂, N₂, CF₄), and gas mixtures |
| Working Distance | 8–45 in (203–1143 mm) |
| Gas Control | Up to 4-channel automated mass flow control (optional) |
| Cooling | Air-cooled (no water cooling required) |
| Compliance | Designed for UHV-compatible vacuum systems (≤1×10⁻⁷ Torr base pressure) |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | KDC Series (KDC-10, KDC-40, KDC-75, KDC-100, KDC-160) |
| Beam Current | >10–650 mA |
| Beam Energy | 100–1200 V |
| Grid Diameter | 1–16 cm Φ |
| Operating Pressure | < 0.5 mTorr |
| Compatible Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Gas Flow Rate | 1–30 sccm |
| Length | 11.5–25.2 cm |
| Diameter | 4–23.2 cm |
| Neutralizer | Thermionic Filament Type |
| Brand | Kaufman & Robinson, Inc. |
|---|---|
| Origin | USA |
| Model | eH 2000 |
| Cooling | Water-cooled |
| Discharge Voltage Range | 50–300 V DC |
| Discharge Current | Up to 15 A |
| Beam Divergence (HWHM) | >45° |
| Anode Diameter | ~5 cm |
| Physical Dimensions | Ø5.7" × H5.5" |
| Compatible Gases | Ar, Xe, Kr, O₂, N₂, Organic Precursors |
| Mounting Interface | Conflat or Quick-Connect Flange |
| Operating Pressure Range | 1×10⁻⁴ – 1×10⁻² Torr |
| Power Supply | eHx-30010A DC Magnetic Confinement Controller |
| Optional Features | Adjustable-angle mount, Sidewinder filament cathode, Grooved anode, eH 2000L / eH 2000x02 / eH 2000 LEHO variants |
| Brand | Kaufman |
|---|---|
| Origin | USA |
| Model | eH 1000 |
| Discharge Voltage | 50–300 V DC |
| Discharge Current | up to 10 A |
| Beam Divergence (HWHM) | >45° |
| Anode Diameter | ~5 cm |
| Physical Dimensions | Ø5.7" × H5.5" |
| Compatible Gases | Ar, Xe, Kr, O₂, N₂, organic precursors |
| Mounting Options | flange-mounted (CF, ISO-K, or custom), no water cooling required |
| Operating Pressure Range | 1×10⁻⁴ – 5×10⁻³ Torr |
| Typical Applications | ion-assisted deposition (IAD), in-situ pre-cleaning, low-energy sputter etching, surface activation |
| Brand | Kaufman & Robinson (KRI) |
|---|---|
| Origin | USA |
| Model | RFICP Series |
| Discharge Type | RF Inductive Coupling |
| Beam Current Range | 100–1500 mA |
| Beam Energy Range | 100–1200 V |
| Grid Aperture Diameter | 4–30 cm |
| Operating Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Chamber Pressure | < 0.5 mTorr |
| System Components | Ion Source Body, RF Power Supply, Neutralizer (LFN-2000), Automated Control Unit |
| Compliance | Designed for integration into UHV and HV vacuum systems per ASTM F1716 and ISO 20000-1 standards |
| Brand | KRI (Kimball Physics / Kaufman) |
|---|---|
| Origin | USA |
| Model | KDC 10 |
| Ion Energy Range | 100–1200 eV |
| Max Ion Current | >10 mA |
| Grid Diameter | 1 cm |
| Magnetic Confinement | DC |
| Anode Voltage | 0–100 V DC |
| Gas Compatibility | Ar, O₂, N₂, Xe, or mixed inert/active gases |
| Mounting Flange | CF or ISO-K (customizable) |
| Beam Geometry | Broad, Collimated, Low-Divergence |
| Recommended Working Distance | 5–30 cm |
| Typical Applications | In-situ ion cleaning, IBAD, IBE, IBSD, surface activation, TEM/SEM sample preparation |
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