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| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Instrument Type | Flame and Graphite Furnace AAS |
| Optical System | Dual-Beam |
| Monochromator | Custom High-Resolution Grating (Motor-Driven for ZA4800) |
| Detector | Photomultiplier Tube (Dual-Detector Configuration) |
| Background Correction | Polarized Zeeman Correction (Full-Wavelength, Real-Time) |
| Baseline Stability | ≤ 0.0004 Abs / 30 min |
| Element Simultaneity | Up to 12 Elements in Sequential Mode (ZA4800) |
| Compliance | ASTM E1756, ISO 8289, USP <731>, FDA 21 CFR Part 11 (Audit Trail & Electronic Signature Ready), GLP/GMP-Ready Software Architecture |
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