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| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Imported |
| Model | SU3900/SU3800 SE Series |
| Instrument Type | Floor-Standing Conventional SEM |
| Electron Source | Thermal Field-Emission Gun |
| Secondary Electron Resolution | 0.9 nm @ 30 kV, 2.5 nm @ 1 kV, 1.6 nm @ 1 kV (Deceleration Mode) |
| Magnification Range | ×5 to ×600,000 (Film Equivalent) |
| Accelerating Voltage | 0.5 kV to 30 kV |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Floor-Standing SEM |
| Electron Source | Cold Field-Emission Gun (CFEG) |
| Resolution | 0.6 nm @ 1 kV, 0.4 nm @ 30 kV (Secondary Electron Imaging) |
| Magnification Range | 80× to 3,000,000× |
| Accelerating Voltage | 0.01–30 kV |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Product Type | Imported Instrument |
| Model | SU7000 |
| Electron Gun | Cold Field-Emission (CFEG) |
| Secondary Electron (SE) Resolution | 0.8 nm @ 15 kV, 0.9 nm @ 1 kV |
| Magnification Range | 20× to 2,000,000× |
| Accelerating Voltage | 0.1–30 kV |
| Backscattered Electron (BSE) Resolution | Not Specified |
| Detector Channels | Simultaneous 6-channel signal acquisition and display |
| Maximum Image Resolution | 10240 × 7680 pixels |
| Sample Chamber | Ultra-large chamber with 18 accessory ports |
| Vacuum Mode | High vacuum and low vacuum (down to 300 Pa, optional) |
| Brand | Hitachi High-Tech |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Technologies Corporation |
| Product Type | Imported Desktop SEM |
| Model | FlexSEM 1000 II |
| Electron Source | Tungsten Filament |
| Secondary Electron Resolution | 4.0 nm @ 20 kV (High Vacuum), 15.0 nm @ 1 kV (High Vacuum) |
| Backscattered Electron Resolution | 5.0 nm @ 20 kV (Low Vacuum) |
| Magnification Range | 6×–300,000× (Film Equivalent), 16×–800,000× (Display) |
| Accelerating Voltage | 0.3–20 kV |
| EDS Detector | 30 mm² Silicon Drift Detector (SDD), Nitrogen-free |
| Dimensions (Main Unit) | 450 mm (W) × 640 mm (D) |
| Power Interface | Standard IEC C13 Socket |
| System Architecture | Modular Main Unit + Detachable Power Supply Unit |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Floor-standing SEM |
| Electron Source | Schottky field-emission gun |
| Secondary Electron Resolution | 0.6 nm @ 15 kV, 0.8 nm @ 1 kV, 0.9 nm @ 0.3 kV |
| Magnification Range | 20× – 2,000,000× |
| Accelerating Voltage | 0.1–30 kV (standard mode) |
| Maximum Image Size (optional) | 40,960 × 30,720 pixels |
| Simultaneous Signal Channels | Up to 6 detectors |
| EDS Working Distance Optimization | Short WD configuration enabled via optimized chamber geometry |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Floor-standing FE-SEM |
| Electron Source | Cold Field-Emission Gun |
| Secondary Electron Resolution | 0.6 nm @ 15 kV |
| Magnification Range | 20× – 2,000,000× |
| Accelerating Voltage | 0.5–30 kV (standard mode) |
| Backscattered Electron Resolution | Not specified |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Instrument |
| Model | TM4000PlusIII / TM4000III |
| Instrument Type | Benchtop SEM |
| Electron Source | Tungsten Filament |
| Accelerating Voltage | 5 kV, 10 kV, 15 kV, 20 kV |
| Magnification Range | 10× – 100,000× (photographic magnification) |
| Maximum Sample Diameter | 80 mm |
| Maximum Sample Thickness | 50 mm |
| Stage Travel | X: 40 mm, Y: 35 mm |
| Vacuum Mode | Standard Low-Vacuum Operation |
| Automation Features | Auto-focus, Auto-brightness/contrast, Filament Usage Monitoring, Programmable Workflow Sequencing, Integrated Particle Analysis Support (with Oxford AZtecLiveLite) |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Product Type | Imported |
| Model | SU3900 |
| Electron Source | Tungsten Filament |
| Secondary Electron Resolution | 3.0 nm |
| Magnification Range | ×5–300,000 (standard mode), ×7–800,000 (high-magnification mode) |
| Accelerating Voltage | 0.3–30 kV |
| Backscattered Electron Resolution | 4.0 nm @ 30 kV (low-vacuum mode) |
| Maximum Sample Diameter | 300 mm |
| Maximum Sample Height | 130 mm |
| Maximum Sample Weight | 5 kg |
| Navigation Field of View | up to Ø200 mm |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | SU3800 |
| Electron Source | Tungsten Filament |
| Secondary Electron Resolution | 3.0 nm at 30 kV |
| Magnification Range | 5–300,000× (low mode), 7–800,000× (high mode) |
| Accelerating Voltage | 0.3–30 kV (standard mode) |
| Backscattered Electron Resolution | 4.0 nm at 30 kV (low-vacuum mode) |
| Maximum Sample Diameter | 200 mm |
| Maximum Sample Height | 80 mm |
| Maximum Sample Weight | 2 kg |
| Navigation System | SEM MAP |
| Automated Imaging | Multi Zigzag Stitching |
| Filament Monitoring | Intelligent Filament Technology (IFT) |
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