Optical Instruments
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| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | CryoView4000 |
| Z-positioning noise | <0.2 nm |
| Sample diameter | <100 mm |
| Sample thickness | <30 mm |
| Sample stage travel range | 80 µm × 80 µm × 70 µm |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView 2500 |
| Instrument Type | Hybrid SNOM/AFM System |
| Detection Noise (Positional) | 0.2 nm |
| Sample Size Capacity | 6 mm diameter |
| XYZ Scan Range per Stage | >80 µm |
| Dual-Stage Architecture | Probe Stage + Sample Stage |
| Feedback Mechanism | Tuning Fork (TF)-Based AFM |
| Optical Compatibility | Mid-IR to THz spectral range |
| Illumination/Collection Flexibility | Top-, Side-, and Bottom-Optical Access |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView1000 |
| Instrument Type | Material-Focused AFM |
| Positional Noise | XY < 20 nm |
| Max Sample Diameter | < 100 mm |
| Max Sample Thickness | < 15 mm |
| Stage Travel Range | 85 µm × 85 µm |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView2000 |
| Instrument Type | Materials-Focused AFM/NSOM Hybrid System |
| Scan Mode | Tip Scanning |
| XY Resolution | <5 nm |
| Z Resolution | <1 nm |
| XY Scan Range | 70 µm (standard), optional 30 µm and 10 µm scanners |
| Z Scan Range | 70–120 µm |
| XY Step Size | <1 nm (70 µm scanner), <0.1 nm (10 µm scanner) |
| Scanner Thickness | 7 mm |
| Scanner Mass | 75 g |
| Max Sample Radius | 16 mm (customizable) |
| Probe Compatibility | Full commercial SPM probe interoperability including NSOM, conductive AFM, hollow probes, insulated nanowire sensors, dual-wire glass-insulated probes, low-k modulus probes, and deep-trench AFM probes |
| Operational Modes | NSOM reflection/transmission/collection/near-field fluorescence/PL |
| Controller | Nanonics Analog Controller with NT software (Windows 95/98/XP compatible) |
| Environmental Capabilities | Cryogenic operation down to 4 K (liquid helium), UHV compatibility, integrated gas/liquid delivery, in situ reaction chamber, co-located optical microscopy and micro-Raman coupling |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView4000 |
| Instrument Type | Material-Focused AFM |
| Positioning Noise | XY < 20 nm |
| Sample Dimensions | Ø < 100 mm |
| Stage Travel Range | 170 µm × 170 µm |
| XY Resolution | < 5 nm |
| Z Resolution | < 1 nm |
| Scan Range (Combined Piezo + Sample Scanner) | up to 160 µm (XY) |
| Minimum Step Size | < 0.1 nm (10 µm scanner) |
| Scanner Thickness | 7 mm |
| Mass | 75 g |
| Probe Compatibility | Commercial SPM, NSOM, conductive, hollow, insulated glass nanowire, dual-wire, low-k AFM, deep-trench AFM probes |
| Operating Modes | NSOM reflection/transmission/collection/fluorescence/PL |
| Brand | Nanonics |
|---|---|
| Model | MV1000 / MV2000 / MV4000 |
| Instrument Type | AFM-Integrated Scanning Electrochemical Microscope |
| Z-Positioning Noise | 0.2 nm |
| Sample Diameter | < 6 mm |
| XYZ Scan Range | 80 µm × 80 µm × 80 µm |
| Probe | Hollow glass nanopipette with Pt nanowire electrode (50–100 nm tip diameter) |
| Electrochemical Control | Bipotentiostat (±10 V, ±0.25 A), current sensitivity: 10⁻¹²–0.1 A/V |
| Compatible Electrodes | Up to four side-mounted or back-contacted reference/counter electrodes (e.g., Ag/AgCl) |
| Liquid Cell Material | PEEK |
| Optical Access | Fully open top and bottom optical pathways |
| Environmental Options | Optional inert-gas chamber (N₂/Ar) |
| Software Compliance | Supports audit trail, user access control, and data integrity per FDA 21 CFR Part 11 requirements |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Manufacturer Type | OEM Manufacturer |
| Origin Category | Imported |
| Model | MV2000 |
| Instrument Type | Materials-Focused Hybrid SPM Platform |
| Positional Detection Noise | 0.2 nm (RMS) |
| Maximum Sample Size | 6 mm (standard) |
| Sample Stage Scan Range | 80 µm × 80 µm × 80 µm (XYZ) |
| Z-Direction Resolution | < 0.05 nm (RMS) |
| XY Lateral Resolution (AFM) | < 0.15 nm |
| Near-Field Optical Resolution | ≤ 50 nm (aperture-limited) |
| Far-Field Optical Resolution | ~500 nm (non-confocal), ~200 nm (confocal) |
| Thermal Imaging Resolution | ≥ 100 nm |
| Electrical Resistance Mapping Resolution | ≥ 25 nm |
| Operating Temperature Range (Thermal Probes) | Up to 300 °C |
| Feedback Mechanism | Tuning Fork (standard), Laser Reflectance (optional) |
| Probe Compatibility | Glass fiber NSOM probes (patented bent-cantilever design), commercial Si/SiN AFM probes, custom multi-functional probes (optical/thermal/electrical/Raman-enhancing) |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MV4000 |
| Instrument Type | Material-Focused Hybrid Correlative Microscope |
| Positional Detection Noise | 0.2 nm |
| Maximum Sample Diameter | <100 mm |
| Maximum Sample Thickness | <15 mm |
| Sample Stage Travel Range | 85 × 85 × 85 µm |
| Brand | Nanonics |
|---|---|
| Origin | Imported (Non-Chinese) |
| Model | NSOM |
| Instrument Type | Materials-Focused SPM Platform |
| Core Function | Scanning Near-Field Optical Microscopy (SNOM/NSOM) with Integrated AFM, Thermal, Electrical, and Raman Capabilities |
| Optical Resolution | ≤50 nm (near-field), 200 nm (confocal), diffraction-limited (far-field) |
| Scan Range | Up to 160 µm (XYZ, dual-probe configuration) |
| Z-Resolution | < 0.02 nm (XY), < 0.05 nm (Z, RMS) |
| Probe Types | Patented glass-fiber probes (metal-coated, hollow, TERS-optimized), compatible with commercial Si cantilevers |
| Feedback | Tuning fork (standard), laser reflection (optional) |
| Detector Compatibility | APD, PMT, InGaAs, CCD, spectrometers |
| Laser Range | Deep UV to NIR |
| Thermal Sensitivity | 0.01 °C |
| Electrical Resolution | < 25 nm (resistive imaging) |
| Max Z-Depth | 140 µm |
| Multi-Probe Support | Up to 4 independently controlled probes |
| Compliance | Designed for GLP/GMP-aligned workflows |
| Brand | Nanosensors (distributed by SHNTI) |
|---|---|
| Origin | Switzerland |
| Probe Type | Tapping Mode AFM Cantilevers |
| Substrate Material | Boron-Doped Silicon (5×10²⁰/cm³) |
| Substrate Dimensions | 1.6 mm × 3.6 mm × 0.4 mm |
| Reflective Coating | Au (3× reflectivity vs. uncoated) |
| Tip Radius | ≤10 nm (SEM-verified, S-series option available) |
| Tip Height | 10–15 µm |
| Cantilevers per Chip | 2 rectangular beams |
| Aspect Ratio | 3:1 |
| Half-Angle | ≤22° |
| Conductive Coating Options | TiN, W₂C, Pt, Au |
| Compatibility | Universal SPM platforms (Bruker, Keysight, Park Systems, NT-MDT, etc.) |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | FLEX-AFM |
| Instrument Type | Atomic Force Microscope |
| XY Positioning Noise | ≤ 0.15 nm (RMS, in air & liquid) |
| Sample Dimensions | Ø ≤ 100 mm, Thickness ≤ 5 mm |
| Sample Stage Travel Range | 300 mm × 300 mm |
| Scan Range | 100 µm × 100 µm × 10 µm (XY × Z) |
| XY Drive Resolution | 0.152 nm |
| Z Drive Resolution | 0.046 nm |
| Minimum Z Noise Floor | 0.15 nm (RMS, closed-loop) |
| Compatible Environments | Ambient air, liquid, controlled atmosphere (e.g., inert gas, low-oxygen), temperature-controlled stages |
| Controller | C3000 (24-bit, dual-channel lock-in amplifiers, digital feedback) |
| Optical Integration | Fully compatible with inverted optical microscopes |
| Modular Add-ons | ECS 204 electrochemical stage, ATS 204 automated translation stage, Isostage active vibration isolation, acoustic enclosure, glovebox integration kit |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | FlexAFM |
| Instrument Type | Material-Focused AFM |
| Position Detection Noise | <35 pm |
| Maximum Sample Diameter | ≤120 mm |
| Control Electronics | C3000i (24-bit), upgradeable to CX (28-bit) |
| Software | Nanosurf Software Suite |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments, supports GLP/GMP audit trails via optional software modules |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | Naio STM |
| Position Detection Noise | 0.15 nm |
| Sample Area | 500 nm × 500 nm |
| XY Scan Range | 500 nm × 500 nm |
| XY Resolution | 7.6 pm |
| Z Scan Range | 200 nm |
| Z Resolution | 3 pm |
| Maximum Tunneling Current | 100 nA |
| Sample Stage Diameter | 10 mm |
| Max Sample Thickness | 3 mm |
| Imaging Modes | Constant-Current & Constant-Height |
| Spectroscopy Modes | I–V, I–z |
| Max Image Pixels | 2048 × 2048 |
| Max Spectral Points | 32768 |
| XY Tilt Compensation | Hardware-based |
| Interface | USB 2.0 |
| Dimensions | 204 mm × 204 mm × 104 mm |
| Weight | 3.45 kg |
| Brand | Narishige |
|---|---|
| Origin | Japan |
| Model | DS-Fi1 |
| Sensor Type | CCD |
| Resolution | 2560 × 1290 (≈5.0 MP) |
| Frame Rate | Real-time (optimized for live microscopy imaging) |
| Color Fidelity | Enhanced via proprietary Nikon imaging pipeline and IR-cut filter |
| Noise Reduction | Integrated circuit-level noise suppression |
| Controller Compatibility | DS-L2 or DS-U2 digital camera controllers |
| Application Domain | Brightfield, Phase Contrast, DIC, Darkfield, Color Fluorescence, Archival Imaging, Publication-Grade Documentation |
| Brand | Narishige |
|---|---|
| Origin | Japan |
| Model | DS-Ri1 |
| Sensor Type | Interline Transfer CCD |
| Resolution | 4080 × 3072 (12.5 MP) |
| Pixel Size | 7.4 µm × 7.4 µm |
| Cooling | Peltier-cooled to −10°C below ambient |
| Interface | USB 2.0 via DS-L2 or DS-U2 controller |
| Frame Rate | up to 19 fps (full resolution), higher in ROI or binning modes |
| Bit Depth | 12-bit per channel (36-bit RGB raw) |
| Optical Compatibility | Supports 14 Nikon digital imaging interfaces |
| Software Control | Fully integrated with NIS-Elements v5.x or later |
| Compliance | Designed for GLP/GMP-aligned laboratory documentation workflows, supports audit-trail-capable acquisition metadata logging per FDA 21 CFR Part 11 guidelines where configured with validated NIS-Elements deployment |
| Brand | NARISHIGE |
|---|---|
| Origin | Japan |
| Model | EMM2 |
| Minimum Step Resolution | 5 nm |
| Zero-Point Programmability | Yes (User-Defined Coordinate Origin) |
| Fourth Axis (T-Axis) Integration | Yes (Angular Positioning & T-Direction Coordinate Display) |
| Stored Position Memory | 3 Positions |
| Return-to-Position Functionality | Yes |
| Component Category | Optical Instrument Component |
| Regulatory Origin | Imported |
| Brand | NARISHIGE |
|---|---|
| Origin | Japan |
| Model | GJ-1 |
| Magnet Type | NdFeB (Grade N52) |
| Max Holding Force | >50 N |
| Base Compatibility | Ferromagnetic Iron Plate (IP-series, sold separately) |
| Rotation | 360° continuous |
| Mounting Rod Diameter | Ø10 mm |
| Stand Dimensions (W×D×H) | 50 × 65 × 55 mm |
| Weight | 1.5 kg |
| Material | 304 Stainless Steel housing with Ni-plated magnet surface |
| Operating Environment | Lab-grade humid/corrosive conditions |
| Brand | NARISHIGE |
|---|---|
| Origin | Japan |
| Model | GJ-8 |
| Pillar Diameter | 14 mm |
| Pillar Length | 175 mm |
| Manipulator Mount Rod Diameter | 12 mm |
| Manipulator Mount Rod Length | 165 mm |
| Magnet Dimensions (W×D×H) | 50 × 80 × 55 mm |
| Total Height | 230 mm |
| Weight | 1.6 kg |
| Brand | NARISHIGE |
|---|---|
| Origin | Japan |
| Model | GJD-1 |
| Dimensions | 400 mm (W) × 90 mm (D) × 250 mm (H) |
| Weight | 3.5 kg |
| Material | Borosilicate glass |
| Accessories | Universal wrench |
| Distribution Type | Authorized distributor (imported) |
| Brand | Narishige |
|---|---|
| Origin | Japan |
| Model | JCM-7000 |
| Instrument Type | Desktop SEM |
| Magnification Range | 10×–100,000× (print output: 128 mm × 96 mm) |
| 24×–202,168× (on-screen display | 280 mm × 210 mm) |
| Accelerating Voltage | 5 kV, 10 kV, or 15 kV (software-selectable constant-voltage mode) |
| BSE Image Resolution | Not specified (system optimized for compositional and topographic contrast) |
| Specimen Dimensions | Ø80 mm × 50 mm (without stage夹具) |
| Detector Types | Everhart-Thornley secondary electron detector |
| Stage Motion | Motorized X/Y = ±40 mm each |
| Tilt | −15° to +45° |
| Rotation | 360° continuous |
| Vacuum Modes | High Vacuum (HV) and Low Vacuum (LV) |
| Operating System | Windows 10 |
| Data Formats | TIFF, BMP, JPEG, PNG (still) |
| Electron Source | Tungsten filament with integrated Wehnelt cap |
| Brand | Narishige |
|---|---|
| Origin | Japan |
| Model | MM-89 |
| Drive Mechanism | Stepper Motor + Ball Screw |
| Resolution | 0.1 µm |
| Repeatability | ±0.5 µm |
| Travel Range (Coarse) | X/Y/Z = 22 mm × 22 mm × 22 mm |
| Driving Speed (Coarse Mode) | 1.4 mm/s |
| Speed Adjustment Range | 0.1–0.7 mm/s (X/Y), 0.2–2.8 mm/s (Z) |
| Interface | RS232 / USB |
| Power Input | AC 100–240 V (±5%), 50/60 Hz |
| Power Consumption | ~15 W |
| Noise Level | <40 dB(A) |
| Construction | 304 Stainless Steel & Anodized Aluminum |
| Overload Protection | Integrated Soft-Stop & Thermal Cut-off |
| Mounting | 10 mm Standard Rod + Magnetic Base |
| Accessories | AC Power Cord, Allen Wrench |
| Brand | NARISHIGE |
|---|---|
| Origin | Japan |
| Model | MMO-202ND |
| Operating Principle | Hydraulic 3-Axis Manual Control |
| Motion Range (Fine) | X/Y/Z ±10 mm |
| Minimum Step Resolution | 2 µm |
| Coarse Adjustment Range (Joystick XY-plane) | ±2 mm |
| Control Unit Dimensions | 165 × 80 × 175 mm, 1.85 kg |
| Drive Unit Dimensions | 40 × 46 × 87 mm, 180 g |
| Hydraulic Tubing Length | 0.9 m |
| Accessories | IP Iron Plate UT-2, Universal Joint, Hex Wrench |
| Brand | NARISHIGE |
|---|---|
| Origin | Japan |
| Model | MMO-203 / MMO-4 / UMM-3FC |
| Component Type | Precision Optical Manipulation Assembly |
| Positioning Resolution | 1 µm (MMO-203), Continuous Fine/Coarse Dual-Stage Control (UMM-3FC) |
| Actuation Method | Manual Mechanical Drive with Ergonomic Knob or Joystick Interface |
| Sample Interaction Modes | Electrostatic Pickup, Pneumatic Aspiration/Dispensing, Mechanical Dissection & Retrieval |
| Brand | Narishige |
|---|---|
| Origin | Japan |
| Model | MMO-203 |
| Manipulator Travel (X/Y/Z) | 10 mm |
| Fine Adjustment Resolution | 2 µm |
| Coarse Travel (X/Y/Z) | 22 mm |
| Joystick Travel (X/Y) | 2 mm |
| Translation Speed Modes | High (1.4 mm/s), Max (0.7 mm/s), Low (0.1 mm/s) |
| Drive Type | Hydraulic Remote Control |
| Compatibility | Manual and Motorized Injectors |
| Brand | Narishige |
|---|---|
| Origin | Japan |
| Model | MMO-4 |
| Actuation Principle | Hydraulic lever + coaxial fine-thread micrometer drives |
| Max Travel per Axis (X/Y/Z) | 10 mm |
| Micrometer Resolution | 2 µm |
| Micrometer Full-Turn Displacement | 250 µm |
| Lever XY Range | 2 mm (adjustable gain) |
| Z-Axis Lever Control | Integrated rotary knob at base |
| Universal Joint | UT-10 with angular adjustment |
| Mounting | Magnetic base with height-adjustable slider |
| Ball Joint Fixation | V-groove + L-clamp mechanical locking |
| Compliance | Designed for ISO/IEC 17025-aligned electrophysiology & microinjection workflows |
| Software Interface | Standalone (no embedded controller) |
| Brand | NARISHIGE |
|---|---|
| Origin | Japan |
| Model | MTK-1 |
| Category | Optical Instrument Component |
| Actuation Type | Hydraulic |
| Axes | 4 (X, Y, Z, Rotation about Z-axis) |
| Mounting | Suspension-type rigid optical bench compatible |
| Compatibility | Standard 3.2 mm OD glass micropipettes |
| Drive Mechanism | Oil-hydraulic lever with fine-tuning knob for axial translation |
| Repeatability | ≤1 µm (typical under controlled lab conditions) |
| Material | Anodized aluminum alloy housing with stainless steel precision guides |
| Brand | PD-LD |
|---|---|
| Origin | USA |
| Model | NewOpto |
| Wavelength Options | 532 nm, 647 nm, 780 nm, 785 nm, 808 nm, 936 nm, 976 nm, 1064 nm |
| Linewidth | < 1 cm⁻¹ |
| Wavelength Accuracy | ±0.5 nm |
| Thermal Tuning Stability | < 8 pm/°C |
| Output Configurations | Free-space (C-mount, TO-3/9 mm, 14-pin Butterfly, Coaxial) and Fiber-coupled (Single-mode & Multimode) |
| Power Range | 10 mW – 2.5 W (wavelength-dependent) |
| Packaging Options | C-mount, 14-pin Butterfly, Coaxial, CS-bars |
| Brand | ZOLIX |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Model | NCC Series |
| Price Range | USD 700 – 1,400 (FOB) |
| Compatibility | Cylindrical Optics (Ø4–50 mm) |
| Mounting Interface | Standard Ø6 mm or M6 Rod Compatibility |
| Base Design | NCC50 with Counterbored Holes for Optical Table Integration |
| Clamping Mechanism | Slit-Type Spring-Loaded V-Groove with Three-Point Contact Geometry |
| Brand | NCS |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | FE-1050 Series |
| Instrument Form Factor | Floor-Standing |
| Electron Gun Type | Thermal Field Emission |
| Secondary Electron (SE) Resolution | 1.5 nm @ 1 kV, 0.9 nm @ 15 kV |
| Magnification Range | 10× to 1,000,000× |
| Accelerating Voltage | 0.02–30 kV |
| Backscattered Electron (BSE) Resolution | 2.5 nm @ 1 kV, 1.5 nm @ 15 kV |
| Sample Chamber Port Count | 27 |
| Stage Motion | 5-Axis Motorized (X = 140 mm, Y = 140 mm, Z = 60 mm, Rotation = 360°, Tilt = −10° to +80°) |
| Standard Detectors | In-Column SE Detector, Everhart-Thornley SE Detector, Optional Insertable BSE Detector, Optional STEM Detector, Triple-Channel IR CCD Chamber Monitoring System |
| Brand | SYNOPTICS |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | Nd:YAG |
| Price Range | USD 0 – 7,200 (FOB) |
| Wavelength Range | 500–3000 nm |
| Rod Length | 3–152.4 mm |
| Rod Diameter | 2–32 mm |
| Slab Max Size | 7 × 26 × 250 mm |
| Nd³⁺ Doping Concentration | 0.2–1.4 ± 0.1 at.% |
| Wavefront Distortion | <λ/4 per inch (λ = 632 nm), standard |
| Extinction Ratio | ≥25 dB |
| Surface Quality | 10–5 scratch-dig (MIL-O-13830A) |
| Endface Flatness | λ/10 |
| Endface Parallelism | ≤10 arc seconds |
| Endface Perpendicularity | ≤5 arc minutes |
| Edge Chamfer | 0.005" ± 0.003" × 45° |
| Finish Roughness | 55 ± 5 µin (ground finish) |
| AR Coating Reflectivity | <0.25% @ design wavelength(s) |
| Laser Damage Threshold | >10 J/cm² (1064 nm, 10 ns, 10 Hz) |
| Thermal Conductivity | ~11 W/m·K (25 °C) |
| Mechanical Hardness | ~8.5 Mohs |