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| Brand | Hiden |
|---|---|
| Origin | United Kingdom |
| Model | IMP |
| Pump Configuration | Integrated Differential Pumping Manifold |
| Mass Range | Up to 300 amu (Triple-Filtered Quadrupole) |
| Detector | Pulsed Ion Counting System |
| Energy Analyzer | Built-in with Ion Optics |
| Pressure Protection | Penning Gauge + Interlock Circuitry |
| Long-Term Stability | < ±0.5% peak height drift over 24 h |
| Communication Interfaces | RS232, RS485, Ethernet |
| Control Software | MASsoft with DDE support, Parallel Digital I/O |
| Compliance | Designed for integration into ISO/IEC 17025-compliant process monitoring environments |
| Application Scope | Real-time endpoint detection, target purity verification, residual gas analysis, leak detection, SPC-driven etch process control |
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