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| Brand | KLA |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Candela 8420 |
| Pricing | Available Upon Request |
| Instrument Category | Optical Non-Patterned Wafer Defect Inspection System |
| Primary Application | Surface Defect Detection on Unpatterned Wafers |
| Wafer Diameter | 2–8 inches |
| Throughput | 30 WPH |
| Resolution | 83 nm |
| Brand | KLA |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | CS20 |
| Quotation | Upon Request |
| Instrument Category | Optical Non-Patterned Wafer Defect Inspection System |
| Primary Application | Bare (Non-Patterned) Silicon Wafer Surface Defect Detection |
| Throughput | 30 WPH for 150 mm (6″) wafers, 27 WPH for 200 mm (8″) wafers |
| Resolution | 83 nm |
| Substrate Diameter Range | 50.8 mm – 200 mm (2″ – 8″) |
| Thickness Range | 350 µm – 1,100 µm |
| Minimum Detectable Defect Size | 0.3 µm (PSL sphere equivalent, ≥95% capture rate on bare Si) |
| Defect Types | Particles, scratches (≥100 µm × 0.1 µm × 50 Å), pits (≥20 µm Ø × 50 Å depth), stains (≥20 µm Ø × 10 Å thickness), bumps |
| Detection Threshold | Signal amplitude > 3× peak-to-valley background noise |
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