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| Brand | TMC |
|---|---|
| Origin | USA |
| Model | TMC Active Vibration Isolation Systems |
| Vibration Isolation Frequency Range | 0.6–250 Hz |
| Isolation Efficiency | >90% above 2 Hz |
| Application Scope | Semiconductor Metrology, Electron Microscopy, AFM, Optical Interferometry, Nanofabrication Tools |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | CS10 / CS20 |
| Detection Sensitivity | 80 nm particles |
| Sample Size Support | 2–8 inch wafers (standard), customizable fixtures |
| Operation Modes | Manual (CS10) / Automated Transport (CS20) |
| Optical Channels | 4-channel detection (scattered light, reflected light, phase shift, Z-height) |
| Environmental Class | ISO Class 4 (10 cleanroom equivalent) |
| Compliance | Designed for semiconductor fab environments |
| Software | Integrated defect classification, statistical distribution mapping, root-cause traceability, and automated pass/fail reporting |
| Brand | Corial |
|---|---|
| Origin | France |
| Model | D250L |
| Heating Method | Hot-Wall |
| Deposition Rate | 520 nm/min |
| Process Gases | SiH₄, NH₃, N₂ |
| Deposited Films | SiO₂, Si₃N₄, SiOF, SiOCH, SiC |
| Base Vacuum | −300 to 50 mTorr |
| Operating Pressure | 0.2–2 Torr |
| Maximum Substrate Size | 200 mm (8-inch) wafers |
| Configuration | Load-Lock with Turbo-Molecular Pump (350 L/s) and Dry Scroll Pump (110 m³/h) |
| RF Power Supply | 300 W, 13.56 MHz |
| Integrated Controllers | TMP, Heater, HV/LV, Plasma Process Controller |
| Brand | Genmark |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Sort-Max Wafer Sorter |
| Pricing | Available Upon Request |
| Brand | Verity |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Verity EPD Spectrometer |
| Pricing | Upon Request |
| Brand | KLA |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | P7 |
| Price | USD 70,000 (FOB Shenzhen) |
| Brand | KLA |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Candela 8420 |
| Pricing | Available Upon Request |
| Instrument Category | Optical Non-Patterned Wafer Defect Inspection System |
| Primary Application | Surface Defect Detection on Unpatterned Wafers |
| Wafer Diameter | 2–8 inches |
| Throughput | 30 WPH |
| Resolution | 83 nm |
| Brand | Toho |
|---|---|
| Origin | Japan |
| Model | FLX-2320-S |
| Application | In-situ and ex-situ thin-film stress measurement on semiconductor wafers up to 8 inches (200 mm) |
| Temperature Control Range | −65 °C to +500 °C |
| Dual-Laser Source | Visible (e.g., 635 nm) and Near-Infrared (e.g., 785 nm) |
| Data Export | CSV, Excel (.xlsx), XML |
| Software Compliance | Audit trail-ready configuration supporting GLP/GMP-aligned documentation workflows |
| Brand | FRT |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | FRT Optical Surface Metrology System |
| Pricing | Available Upon Request |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Filmetrics R50 |
| Automation Level | Manual |
| Sheet Resistance Range | 1 mΩ/□ – 200 MΩ/□ |
| Sheet Resistance Accuracy | ±1% |
| Substrate Size Compatibility | 4-inch to 12-inch wafers |
| Software | RSMapper™ |
| Probe Compatibility | Fully compatible with KLA’s full suite of four-point probe sensors |
| XY Stage | 200 mm motorized |
| Z-Travel | 100 mm precision-controlled |
| Measurement Configurations | Customizable grid, linear, radial, and user-defined point patterns |
| Application Scope | Conductive & semiconducting thin films on Si, GaAs, SiC, sapphire, glass, and flexible substrates |
| Brand | Plasma-Therm |
|---|---|
| Origin | USA |
| Model | Takachi |
| Etch Principle | Inductively Coupled Plasma (ICP) |
| Etch Rate | SiO₂ ≥ 1500 Å/min |
| Selectivity | SiO₂ to Photoresist = 1.0–1.5:1 |
| Si₃N₄ to Photoresist = 1.0–1.2 | 1 |
| Uniformity | ≤ ±2% |
| Application Scope | Dielectrics (SiO₂, Si₃N₄, metal oxides), Polymers (photoresists, polyimides, BCB, SU-8), Semiconductors (Si, Ge, III–V compounds including GaAs, AlGaAs, GaN, InP), SiC |
| Brand | KLA |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | CS20 |
| Quotation | Upon Request |
| Instrument Category | Optical Non-Patterned Wafer Defect Inspection System |
| Primary Application | Bare (Non-Patterned) Silicon Wafer Surface Defect Detection |
| Throughput | 30 WPH for 150 mm (6″) wafers, 27 WPH for 200 mm (8″) wafers |
| Resolution | 83 nm |
| Substrate Diameter Range | 50.8 mm – 200 mm (2″ – 8″) |
| Thickness Range | 350 µm – 1,100 µm |
| Minimum Detectable Defect Size | 0.3 µm (PSL sphere equivalent, ≥95% capture rate on bare Si) |
| Defect Types | Particles, scratches (≥100 µm × 0.1 µm × 50 Å), pits (≥20 µm Ø × 50 Å depth), stains (≥20 µm Ø × 10 Å thickness), bumps |
| Detection Threshold | Signal amplitude > 3× peak-to-valley background noise |
| Brand | Scientech |
|---|---|
| Origin | Taiwan |
| Manufacturer Type | Authorized Distributor |
| Domestic Product Classification | Yes |
| Model | 12-inch |
| Pricing | Available Upon Request |
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