Hitachi
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| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | GL Sciences Inc. & Hitachi High-Tech Corporation |
| Column Type | Reversed-Phase C18, C8, NH₂ |
| Packing Material | Fully Porous Silica-Based Particles (1.9–5 µm) |
| Endcapped | Yes |
| Pore Size | 100 Å (standard), 120 Å (wide-pore variants available) |
| Surface Area | ~300 m²/g |
| Carbon Load | 12–18% (C18), 8–12% (C8), 4–6% (NH₂) |
| pH Stability | 1.5–10.0 (C18/C8), 2.0–8.5 (NH₂) |
| Max. Pressure | 600 bar |
| Temperature Range | 5–60 °C |
| Dimensions | 50–250 mm × 2.1–4.6 mm ID |
| Particle Size Options | 1.9, 3, and 5 µm |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Model | LaChromUltra |
| Maximum Pressure | 60 MPa |
| Flow Rate Range | 0.001–5.000 mL/min |
| Gradient Capability | Dual-pump binary gradient system |
| Injection Volume | 0.1–20 µL |
| Column Oven Temperature Range | 1–65 °C (1 °C increment) |
| UV Detector Response Time | 0.01 s |
| Detection Wavelength Calibration | D₂ lamp + Hg lamp |
| Software Platform | Empower™ 2 / EZChrom Elite™ |
| Operating System | Windows® XP |
| Instrument Age | 3–4 years |
| Warranty | 6 months |
| Compliance | Designed for GLP/GMP environments with audit-ready data handling |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Product Type | Imported Instrument |
| Model | STA300 |
| Temperature Range | Ambient to 1500 °C |
| Temperature Accuracy | ±0.2 K |
| Temperature Precision | ±0.07 °C |
| Heating/Cooling Rate | 0.01–150 K/min |
| Maximum Sample Mass | 0.2 g |
| Brand | Hitachi |
|---|---|
| Origin | Imported |
| Manufacturer | Hitachi High-Tech Corporation |
| Instrument Type | Dynamic Mechanical Analyzer (DMA/DMTA) |
| Temperature Range | −150 °C to 600 °C |
| Frequency Range | Sinusoidal mode: 0.01–200 Hz |
| Composite waveform mode | simultaneous 5 frequencies |
| Compliance | ASTM D4065, ISO 6721, ISO 11357-4, USP <1031>, FDA 21 CFR Part 11 ready (with optional audit trail module) |
| Brand | Hitachi |
|---|---|
| Model | DSC600 / DSC200 |
| Instrument Type | Differential Scanning Calorimeter (DSC) |
| Sample Throughput | Multi-sample simultaneous measurement |
| Origin | Imported |
| Manufacturer Status | Original Equipment Manufacturer (OEM) |
| Application Scope | Polymer, Pharmaceutical, Chemical, Petrochemical, Food, and Metallic Materials Characterization |
| RealView® Imaging System | Integrated 20-MP camera with 50× digital zoom and 1.2 µm pixel resolution |
| Polarized Light Capability | Optional polarized optical module for birefringence and crystalline orientation analysis |
| Data Export Formats | CSV, Excel (.xlsx), plain text |
| Barcode Integration | Supported for automated method and sample metadata ingestion |
| Software Compliance | Audit-trail enabled |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Imported Instrument |
| Model | NX5000 |
| Pricing | Available Upon Request |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Imported Instrument |
| Model | NX9000 |
| Pricing | Available Upon Request |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Type | Conventional HPLC System |
| Flow Rate Range | 0.001–9.999 mL/min |
| Maximum Pressure | 39.2 MPa |
| Flow Accuracy | ≤0.075% RSD |
| Injection Volume Range | 0.1–50 µL |
| Sample Tray Capacity | 200 positions |
| Column Oven Temperature Range | (Ambient −15 °C) to 65 °C |
| UV-Vis Wavelength Range | 190–900 nm |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | SU3800 |
| Electron Source | Tungsten Filament |
| Secondary Electron Resolution | 3.0 nm at 30 kV |
| Magnification Range | 5–300,000× (low mode), 7–800,000× (high mode) |
| Accelerating Voltage | 0.3–30 kV (standard mode) |
| Backscattered Electron Resolution | 4.0 nm at 30 kV (low-vacuum mode) |
| Maximum Sample Diameter | 200 mm |
| Maximum Sample Height | 80 mm |
| Maximum Sample Weight | 2 kg |
| Navigation System | SEM MAP |
| Automated Imaging | Multi Zigzag Stitching |
| Filament Monitoring | Intelligent Filament Technology (IFT) |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Product Type | Imported |
| Model | SU3900 |
| Electron Source | Tungsten Filament |
| Secondary Electron Resolution | 3.0 nm |
| Magnification Range | ×5–300,000 (standard mode), ×7–800,000 (high-magnification mode) |
| Accelerating Voltage | 0.3–30 kV |
| Backscattered Electron Resolution | 4.0 nm @ 30 kV (low-vacuum mode) |
| Maximum Sample Diameter | 300 mm |
| Maximum Sample Height | 130 mm |
| Maximum Sample Weight | 5 kg |
| Navigation Field of View | up to Ø200 mm |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Imported |
| Model | SU3900/SU3800 SE Series |
| Instrument Type | Floor-Standing Conventional SEM |
| Electron Source | Thermal Field-Emission Gun |
| Secondary Electron Resolution | 0.9 nm @ 30 kV, 2.5 nm @ 1 kV, 1.6 nm @ 1 kV (Deceleration Mode) |
| Magnification Range | ×5 to ×600,000 (Film Equivalent) |
| Accelerating Voltage | 0.5 kV to 30 kV |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Product Type | Imported Instrument |
| Model | SU7000 |
| Electron Gun | Cold Field-Emission (CFEG) |
| Secondary Electron (SE) Resolution | 0.8 nm @ 15 kV, 0.9 nm @ 1 kV |
| Magnification Range | 20× to 2,000,000× |
| Accelerating Voltage | 0.1–30 kV |
| Backscattered Electron (BSE) Resolution | Not Specified |
| Detector Channels | Simultaneous 6-channel signal acquisition and display |
| Maximum Image Resolution | 10240 × 7680 pixels |
| Sample Chamber | Ultra-large chamber with 18 accessory ports |
| Vacuum Mode | High vacuum and low vacuum (down to 300 Pa, optional) |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Floor-standing FE-SEM |
| Electron Source | Cold Field-Emission Gun |
| Secondary Electron Resolution | 0.6 nm @ 15 kV |
| Magnification Range | 20× – 2,000,000× |
| Accelerating Voltage | 0.5–30 kV (standard mode) |
| Backscattered Electron Resolution | Not specified |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Model | SU8600 Series |
| Instrument Type | Floor-Standing SEM |
| Electron Gun | Cold Field Emission |
| Secondary Electron Resolution | 0.6 nm @ 15 kV |
| Magnification Range | 20× to 2,000,000× |
| Accelerating Voltage | 0.5–30 kV |
| Landing Voltage | 0.01–20 kV |
| Maximum Sample Diameter | φ150 mm |
| Detector Options | UD (with ExB energy filter), LD, TD (with energy filter), IMD, PD-BSED, OCD, CLD, STEM Detector |
| Stage | 5-Axis Motorized (X: 0–110 mm, Y: 0–110 mm, Z: 1.5–40 mm, Tilt: −5° to +70°, Rotation: 360°) |
| Software | EM Flow Creator, HD Capture (up to 40,960 × 30,720 px) |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Floor-standing SEM |
| Electron Source | Schottky field-emission gun |
| Secondary Electron Resolution | 0.6 nm @ 15 kV, 0.8 nm @ 1 kV, 0.9 nm @ 0.3 kV |
| Magnification Range | 20× – 2,000,000× |
| Accelerating Voltage | 0.1–30 kV (standard mode) |
| Maximum Image Size (optional) | 40,960 × 30,720 pixels |
| Simultaneous Signal Channels | Up to 6 detectors |
| EDS Working Distance Optimization | Short WD configuration enabled via optimized chamber geometry |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Type | Floor-Standing SEM |
| Electron Source | Cold Field-Emission Gun (CFEG) |
| Resolution | 0.6 nm @ 1 kV, 0.4 nm @ 30 kV (Secondary Electron Imaging) |
| Magnification Range | 80× to 3,000,000× |
| Accelerating Voltage | 0.01–30 kV |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Model | TM4000II / TM4000PlusII |
| Accelerating Voltage | 5 kV / 10 kV / 15 kV (4-step current adjustment per voltage) |
| Magnification Range | 10× to 100,000× |
| Detector Configuration | Quad-segment backscattered electron detector (BSE) |
| Sample Chamber Dimensions | Ø80 mm × 50 mm (max. height) |
| Imaging Modes | Conductive mode (TM4000PlusII), Standard mode, Charge-free mode |
| Software Features | SEM-MAP navigation, report-generation export (PDF/HTML), real-time BSE + SE image overlay (TM4000PlusII) |
| Camera Resolution | 2560 × 1920 (CCD) |
| EDS Compatibility | Integrated EDX interface |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Instrument |
| Model | TM4000PlusIII / TM4000III |
| Instrument Type | Benchtop SEM |
| Electron Source | Tungsten Filament |
| Accelerating Voltage | 5 kV, 10 kV, 15 kV, 20 kV |
| Magnification Range | 10× – 100,000× (photographic magnification) |
| Maximum Sample Diameter | 80 mm |
| Maximum Sample Thickness | 50 mm |
| Stage Travel | X: 40 mm, Y: 35 mm |
| Vacuum Mode | Standard Low-Vacuum Operation |
| Automation Features | Auto-focus, Auto-brightness/contrast, Filament Usage Monitoring, Programmable Workflow Sequencing, Integrated Particle Analysis Support (with Oxford AZtecLiveLite) |
| Brand | Hitachi |
|---|---|
| Model | TMA7100 / TMA7300 |
| Temperature Range | TMA7100: −170 °C to 600 °C |
| TMA7300 | Ambient to 1500 °C |
| Displacement Range | ±5 mm |
| RMS Noise / Sensitivity | 0.005 μm / 0.01 μm |
| Load Range (Resolution) | ±5.8 N (9.8 μN) |
| Heating Rate | 0.01–100 °C/min |
| Sample Max Dimensions | Ø10 mm × 25 mm (TMA7100/TMA7300) |
| Probe Mounting | Cantilever-type |
| Atmosphere Control | Ambient air, inert gas, vacuum (~1.3 Pa) |
| Load Control Modes | Fixed load, constant-rate loading (9.8×10⁻²–9.8×10⁶ mN/min), frequency sweep (0.001–1 Hz), multi-step program (up to 40 steps) |
| Displacement Control Modes | Fixed displacement (±5000 μm), constant-rate displacement (0.01–10⁶ μm/min), frequency sweep (0.001–1 Hz), multi-step program (up to 40 steps) |
| Optional Accessories | Automated liquid nitrogen cooling system (−150 °C to 600 °C), electronic cooler (−60 °C to 450 °C), fan-assisted ambient cooling (RT to 600 °C or 1500 °C), LN₂ Dewar kit (−170 °C to 600 °C), mass flow controller, humidity control module, expansion/compression/penetration/tensile/bending probes (quartz or alumina), sapphire dilatometry fixture |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Model | TMA7100 / TMA7300 |
| Temperature Range | –170 °C to 600 °C (TMA7100) |
| Displacement Range | ±5 mm |
| Sensitivity (RMS Noise) | 0.005 µm / Resolution: 0.01 µm |
| Load Range | ±5.8 N (Resolution: 9.8 µN) |
| Heating Rate | 0.01–100 °C/min |
| Sample Max Dimensions | Ø10 mm × 25 mm (cylindrical) or 5 mm × 1 mm × 25 mm (film) |
| Probe Mounting | Cantilever-type |
| Atmosphere Control | Ambient, inert gas, vacuum (~1.3 Pa), optional humidity & swelling modules |
| Load/Displacement Control Modes | Constant force, constant rate, oscillatory (0.001–1 Hz), multi-step sequences (up to 40 steps) |
| Optional Cooling | Automated LN₂ cooling (–150 °C to 600 °C), electronic cooler (–60 °C to 450 °C), forced-air cooling (RT–600 °C), LN₂ Dewar kit (–170 °C to 600 °C) |
| Sample Tube Materials | Quartz (TMA7100), Alumina (TMA7300) |
| Probe Types | Expansion/compression quartz, penetration (standard & conical), tensile (quartz & metal), bending, sapphire dilatometry |
| Brand | Hitachi |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Transgenomic |
| Product Category | Chromatography |
| Operational Age | 4–5 years |
| Warranty Period | 6 months |
| Included Modules | L-2130 Pump, L-2200U Autosampler, L-2310T Column Oven, L-2400 UV Detector, Chromatography Workstation |
| Condition | Refurbished & Functionally Verified |
| Compliance | Fully Tested per ASTM E2688-21 (Standard Practice for Verification of HPLC Systems) |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | U-5100 |
| Optical System | Ratio-Beam Double-Beam |
| Detector | Photodiode Array |
| Wavelength Range | 190–1100 nm |
| Wavelength Accuracy | ±1 nm |
| Spectral Bandwidth | 5 nm |
| Wavelength Scanning Speed | 12,000 nm/min |
| Standard Sample Holder | Automatic 6-Cell Carousel (10 mm square cuvettes) |
| Light Source | Pulsed Xenon Lamp |
| Display | Backlit LED, 320 × 240 dots |
| Dimensions (W×D×H) | 355 × 425 × 235 mm |
| Weight | 13 kg |
| Power Supply | 100–240 V, 50/60 Hz, 60 VA |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Architecture | Dual-beam |
| Detector Type | Photomultiplier Tube (PMT) |
| Wavelength Range | 190–2600 nm |
| Wavelength Accuracy | ±0.1 nm |
| Spectral Bandwidth | 0.1 / 0.5 / 1 / 2 / 4 / 5 nm |
| Automation Level | Motorized Wavelength Scanning |
| Monochromator Configuration | UH3900S — Single Monochromator |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Instrument |
| Model | UH4150 |
| Optical Design | Double-Beam |
| Detector Type | Photomultiplier Tube (PMT) for UV-Vis |
| Wavelength Range | 175–3300 nm |
| Wavelength Accuracy | ±0.1 nm (UV-Vis) |
| Spectral Bandwidth | UV-Vis: Auto-adjustable up to 14.4 nm |
| NIR | Auto-adjustable up to 36 nm |
| Stray Light | ≤0.00008% at 220 nm (NaI) |
| Scan Speed | Up to 1200 nm/min (1 nm data interval) |
| Beam Geometry | Collimated Parallel Beam |
| Detector Switching | Seamless dual-detector transition with minimized absorbance discontinuity |
| Integrating Sphere Options | Multiple 60 mm spheres (BaSO₄ or Spectralon® coating), optional 150 mm sphere and goniometric absolute reflectance accessory |
| Brand | Hitachi |
|---|---|
| Origin | Imported |
| Manufacturer Type | Manufacturer |
| Model | UH4150AD+ |
| Optical Design | Double-beam |
| Detector | Photomultiplier Tube (PMT) for UV-Vis |
| Wavelength Range | 175–2000 nm |
| Wavelength Accuracy | ±0.2 nm (UV-Vis), ±1.0 nm (NIR) |
| Wavelength Repeatability | ±0.1 nm (UV-Vis) |
| Spectral Bandwidth | UV-Vis: auto-adjustable up to 14.4 nm, manually selectable from 0.01–8 nm |
| NIR | auto-adjustable up to 36 nm, manually selectable from 0.1–20 nm |
| Stray Light | ≤0.00005% at 220 nm (NaI), ≤0.00004% at 370 nm (NaNO₂) |
| Photometric Range | 8 Abs (UV-Vis), 7 Abs (NIR) |
| Data Mode | Optical Density (O.D.) |
| Multi-scan Capability | Wavelength-range-dependent scan speed & neutral density filter selection |
| Resolution Modes | Four-step high-resolution processing (High/Medium/Standard/Low) |
| ND Filter Wheel | Automatic insertion of five calibrated neutral density filters |
| Detector Calibration | Full 0%T baseline acquisition across measurement range |
| High-Absorbance Calibration | Dual-mode correction (negative transmittance compensation & offset adjustment) |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Architecture | Dual-Beam |
| Detector Type | Photodiode Array (PDA) |
| Wavelength Range | 190–1100 nm |
| Wavelength Scanning Mode | Automatic |
| Spectral Bandwidth | 1.5 nm |
| Wavelength Accuracy | ±0.3 nm |
| Wavelength Repeatability | ±0.1 nm |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Architecture | Dual-Beam |
| Detector Type | Photodiode Array (PDA) |
| Wavelength Range | 190–1100 nm |
| Wavelength Accuracy | ±0.3 nm |
| Wavelength Repeatability | ±0.1 nm |
| Spectral Bandwidth | 1.5 nm |
| Wavelength Scanning Mode | Motorized Auto-Scanning |
| Compliance | ISO/IEC 17025-compatible optical validation protocols, ASTM E275 and E387 spectral performance standards |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Instrument Configuration | Dual-Beam |
| Detector Type | Photodiode Array (PDA) |
| Wavelength Range | 190–1100 nm |
| Wavelength Accuracy | ±0.3 nm |
| Spectral Bandwidth | 1 nm |
| Automation Level | Automatic Wavelength Scanning |
| Standard Sample Changer | Integrated 6-Position Auto-Cuvette Holder |
| Light Source | Long-Life Pulsed Xenon Lamp (7-Year Limited Warranty, Subject to Usage Conditions) |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Corporation |
| Instrument Type | Dual-beam |
| Detector | Photomultiplier Tube (PMT) |
| Wavelength Range | 190–3300 nm |
| Wavelength Accuracy | ±0.05 nm (UV-Vis), ±0.2 nm (NIR) |
| Spectral Bandwidth | UV-Vis: 0.1, 0.2, 0.5, 1, 2, 5, 10 nm |
| NIR | 0.25, 0.5 nm |
| Wavelength Scanning Mode | Automatic |
| Slit Control | Motorized continuous variable slit |
| Optical System | Etched holographic diffraction grating, high-flux monochromator |
| Software | UV Solutions Plus with customizable reporting, data table view, instrument performance verification module |
| Brand | Hitachi |
|---|---|
| Origin | Japan |
| Manufacturer | Hitachi High-Tech Science Corporation |
| Product Type | Non-contact 3D Optical Profilometer / Surface Roughness Analyzer |
| Operating Principle | White-Light Interferometry |
| Model | VS1800 |
| Compliance | ISO 25178-2:2012, ISO 25178-601:2013, ISO 25178-602:2013 |
| Vertical Resolution | ≤ 0.01 nm (Phase-Shifting Mode) |
| Repeatability | < 0.1% (Z-height) |
| Field of View | Up to 6.4 mm × 6.4 mm (single-shot) |
| Measurement Speed | As fast as 5 seconds per acquisition (typical) |
| Optional Module | Large-Inclination Angle Measurement Kit |