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| Brand | Ekspla |
|---|---|
| Origin | Imported (Lithuania) |
| Model | PS1245CO |
| Cooling Capacity | 0.5–2 kW (selectable) |
| Max Coolant Flow Rate | 7 L/min |
| Max Operating Pressure | 3.5 bar |
| Coolant Temperature Range | 25–45°C (adjustable via 10-turn potentiometer) |
| Coolant Conductivity Requirement | 1–20 µS/cm (deionized/distilled water) |
| Cabinet Format | 19″ rack-mountable, 7U height |
| Integrated Functions | Real-time coolant temperature & level indication, overheat/low-pressure/low-level interlock protection, inline deionization & particulate filtration |
| Brand | Ekspla |
|---|---|
| Origin | Imported (Lithuania) |
| Manufacturer Type | Authorized Distributor |
| Model | PS5050 NL300D |
| Output Power | Up to 3.2 kJ/s (at 10 Hz) |
| Max. Peak Charge Rate | < 6.8 kJ/s |
| Charging Voltage Options | 1000 V / 1400 V / 1800 V |
| Pulse Repetition Rate | Up to 150 Hz |
| Output Voltage Regulation | ±0.1 % |
| Pulse-to-Pulse Stability | 0.1 % |
| Load Regulation | 0.1 % |
| Linearity | 0.2 % |
| Voltage Resolution | 1 V |
| Ignition Pulse Voltage | 16 kV (optional up to 30 kV) |
| Ignition Pulse Duration | > 1000 ns |
| Simmer Current | 0.6 A |
| Simmer Voltage | < 300 V |
| Striking Voltage | < 900 V |
| Max. Capacitance Supported (CPFN) | < 240 µF |
| Input Mains | Single-phase 230 V (−10%, +5%) or three-phase 380 V (−10%, +5%) |
| Power Consumption (avg./peak) | < 4 kW / < 6 kW |
| Operating Temperature | 0–40 °C |
| Humidity | 10–90 % RH (non-condensing) |
| Compliance | EN 61010-1, EN 55011 |
| Remote Interfaces | RS-232, CAN |
| Housing | 19" rack-mountable (standard 4U) |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | OEM Manufacturer (not distributor) |
| Product Type | Imported |
| Model | PT200 |
| Core Architecture | Diode-Pumped Solid-State (DPSS) Pump Laser + Integrated Picosecond Optical Parametric Oscillator (OPO) |
| Tuning Range | 690–3400 nm (standard), optional UV extension via SHG |
| Pulse Duration | 5 ps (PT257/PT259), 70 ps (PT277) |
| Repetition Rate | 1 MHz (PT259), 88 MHz (PT257/PT277) |
| Peak Power | Up to 5 kW |
| Beam Quality | M² ≤ 1.3 (nearly diffraction-limited) |
| Linewidth | <0.3 cm⁻¹ (FT-limited, PT277) |
| Output Monitoring | Optional integrated wavelength meter |
| Control Interface | USB (standard), RS232 (optional), LabVIEW™ drivers included |
| Compliance | CE-marked, RoHS-compliant, designed for GLP/GMP-adjacent research environments |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | OEM Manufacturer |
| Product Category | Imported Instrument |
| Model | PT277-XIR |
| Core Technology | Synchronously Pumped Optical Parametric Oscillator (OPO) with Diode-Pumped Solid-State (DPSS) Pump Laser |
| Tuning Range | 1405–2020 nm (signal), 2250–4400 nm (idler), 5000–16000 nm (mid-IR) |
| Spectral Linewidth | < 5 cm⁻¹ (full tuning range) |
| Pulse Repetition Rate | 87 MHz |
| Pulse Duration (pump) | ~8 ps |
| Output Power | >100 mW @ 2200–4000 nm |
| Beam Diameter (1/e²) | ~3 mm |
| Beam Divergence (full angle, FWHM) | < 5 mrad (signal) |
| Wavelength Tuning Resolution | 0.1 nm (signal), 1 nm (idler/mid-IR) |
| Control Interfaces | USB (virtual COM), RS232, LAN, optional WLAN |
| Remote Control Protocol | REST API compliant |
| Cooling | Active water-to-air chiller required |
| Operating Ambient | 22 ± 2 °C, ±1 °C stability, 20–80% RH (non-condensing) |
| Power Supply | 100–240 VAC, 50/60 Hz, <1 kVA |
| Cleanroom Class | ISO Class 9 or better |
| Brand | Ekspla |
|---|---|
| Origin | Imported |
| Model | PT403 |
| Output Wavelength Range | 210–2300 nm |
| Repetition Rate | 1 kHz |
| Pulse Width | 15 ps (typ.) |
| Linewidth | <8 cm⁻¹ |
| Beam Divergence | <2 mrad |
| Tuning Step (SH/Signal/Idler) | 0.05/0.1/1 nm |
| Compliance | CE, RoHS, IEC 60825-1 Class 4 Laser Product |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Scientific Laser System |
| Model | SL212 |
| Pulse Duration | <150 ps |
| Wavelength | 1064 nm (fundamental), with optional harmonic generation (532 nm, 355 nm, 266 nm) |
| Pulse Energy | Up to 250 mJ @ 1064 nm |
| Pumping Scheme | Diode-pumped Q-switched oscillator + flashlamp-pumped power amplifier |
| Pulse Contrast Ratio | High pre-pulse suppression (>10⁸:1 typical) |
| Thermal Stabilization | Active temperature control for harmonic generators |
| Control Interface | PC-based via USB/Ethernet, LabVIEW™ drivers included, front-panel keypad for remote operation |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported High-Energy Picosecond Laser System |
| Model | SL230 |
| Pulse Duration | 100 ps |
| Central Wavelength | 1064 nm (fundamental), with optional 532 nm, 355 nm, and 266 nm harmonics |
| Maximum Pulse Energy | 250 mJ @ 1064 nm |
| Repetition Rate | Up to 50 Hz |
| Pulse-to-Pulse Jitter (External Trigger) | < 0.2 ns RMS |
| Sync Pulse Jitter (Pre-trigger) | < 100 ps RMS |
| Harmonic Generation | Thermo-stabilized KD*P/KDP crystal-based, angle-tuned, with wavelength-separated output ports |
| Cooling | Water/Water heat exchanger integrated in 19″ rack-mount unit |
| Control Interface | USB-connected Windows® PC application + backlit remote keypad |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported High-Energy Picosecond Laser System |
| Model | SL330 |
| Pulse Energy | Up to 500 mJ @ 1064 nm |
| Pulse Duration | 150 ps (standard), tunable down to 170 ps or up to 1500 ps with optional -VPx module |
| Pre-pulse Contrast Ratio | >10:1 |
| Timing Jitter | <100 ps (rms) relative to Q-switch trigger |
| Output Wavelengths | 1064 nm (fundamental), with optional harmonics generation at 532 nm, 355 nm, and 266 nm via temperature-controlled KD*P/KDP crystals |
| Control Interface | RS232 + LabVIEW™ drivers |
| Cooling | Integrated closed-loop chiller system |
| Form Factor | Compact laser head + 19″ rack-mounted power supply & thermal management unit |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | SYLOS 2A |
| Core Technology | Optical Parametric Chirped-Pulse Amplification (OPCPA) |
| Pulse Duration | <7 fs |
| Repetition Rate | 1 kHz |
| Peak Power | >5 TW |
| Average Power | >35 W |
| Pulse Energy | >35 mJ |
| Central Wavelength | 880 nm |
| CEP Stability | <220 mrad (rms, >24 h) |
| ASE Suppression | Passively CEP-stabilized, ASE-free output |
| Form Factor | Table-top ultrafast laser system |
| Compliance | Designed for ELI-ALPS specifications, compatible with GLP-aligned lab infrastructure |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Laser Type | Diode-Pumped Solid-State (DPSS) Q-Switched UV Laser |
| Wavelength | 355 nm |
| Average Output Power | Up to 3.5 W |
| Pulse Duration | <15 ns (typ.) |
| Repetition Rate | Up to 100 kHz |
| Beam Quality (M²) | <1.3 |
| Cooling | Air-Cooled |
| Compliance | CE, RoHS, IEC 60825-1:2014 Class 4 Laser Product |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | UltraFlux FT2101 |
| Core Technology | OPCPA-based Solid-State + Fiber Frontend |
| Pulse Energy | 0.35 mJ |
| Tuning Range | 680–960 nm |
| Pulse Duration | 30–50 fs (10 fs optional) |
| Repetition Rate | 1 kHz |
| Pulse Stability | < 1 % rms |
| Footprint | 1.2 × 0.75 m |
| CEP-Stabilized Option | Available |
| Harmonic Outputs | 2ω (345–475 nm), 3ω (235–315 nm), Idler (1200–2200 nm), Supercontinuum (1 μJ, 10 fs, 680–960 nm) |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | UltraFlux HE |
| Core Architecture | Solid-State Laser System Based on Optical Parametric Chirped Pulse Amplification (OPCPA) |
| Max Pulse Energy | 1 J @ 5 Hz |
| Min Pulse Duration | ≤10 fs |
| Repetition Rate | Single Shot to 100 Hz |
| Output Wavelength Tuning Range (Signal) | 750–960 nm |
| Harmonic Outputs | SH (375–480 nm), TH (250–320 nm), FH (210–230 nm) |
| Pulse Energy Stability | ≤1 % RMS |
| Long-Term Power Stability | ≤1.5 % RMS (8 h) |
| Temporal Contrast (APFC) | 10¹⁰ : 1 |
| Beam Profile | Super-Gaussian (6th–11th order) |
| Cooling Requirement | Water-cooled (up to 14 L/min, 2 bar, ≤20 °C) |
| Compliance | ISO Class 7 Cleanroom Environment Required |
| Optional Features | CEP Stabilization (≤400 mrad), Deformable Mirror (Strehl >0.9), Air-Water Hybrid Cooling, Dazzler-based Dispersion Control |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Scientific Laser System |
| Model | UltraFlux HR |
| Core Technology | Optical Parametric Chirped Pulse Amplification (OPCPA) |
| Tuning Ranges | 750–960 nm (signal), 375–480 nm (SH), 250–320 nm (TH), 210–230 nm (FH) |
| Max Pulse Energy | 14 mJ @ 1 kHz |
| Pulse Duration | 40 ± 20 fs |
| Pulse Energy Stability | ≤1 % RMS |
| Long-Term Power Stability | ≤1.5 % RMS (8 h) |
| Temporal Contrast (APFC) | >10¹⁰:1 (±50 ps) |
| Beam Profile | Gaussian / Super-Gaussian (6th–11th order) |
| Beam Pointing Stability | ≤30 µrad (RMS) |
| Optical Jitter (with PLL option) | ≤2 ps |
| Harmonic Outputs | Optional, non-simultaneous SH/TH/FH modules |
| Cooling | Air-cooled or Air-Water hybrid (no external chiller required) |
| Compliance | CE-marked, RoHS-compliant, designed for GLP/GMP-adjacent research environments |
| Brand | El.En. |
|---|---|
| Model | BLADE RF177G |
| Wavelength | 9.3 µm |
| Output Power | 150 W (CW) |
| Laser Type | Sealed RF-excited CO₂ gas laser |
| Beam Mode | TEM₀₀ (typical) |
| Cooling | Water-cooled |
| Power Supply | Integrated RF generator |
| Enclosure Option | OEM bare-platform version available |
| Electrical Efficiency | >12% (typical) |
| Beam Diameter (1/e²) | ~3.5 mm |
| Beam Divergence (full angle) | <1.5 mrad |
| Polarization | Linear, vertical |
| Warm-up Time | <5 min to stable output |
| MTBF | >20,000 hours |
| Brand | ELAS |
|---|---|
| Origin | Imported (Non-Chinese) |
| Manufacturer Type | Authorized Distributor |
| Model | FemtoLAB (Laboratory Systems) |
| Core Components | Industrial-Grade Femtosecond Laser Source (PHAROS), Galvanometric Beam Steering, Nanopositioning XYZ Stages, SCA Control Software |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Software | SCA v4.x with hardware-integrated real-time control and GLP-compliant audit trail logging |
| Physical Footprint | ≤1.0 m × 2.5 m (fully assembled on optical table) |
| Laser Source | PHAROS femtosecond laser (1030 nm, up to 20 W avg. power, <290 fs pulse width, repetition rate 1–200 kHz) |
| Harmonic Generation | SHG (515 nm), THG (343 nm), FHG (257 nm) modules integrated |
| Positioning Accuracy | ±20 nm (closed-loop piezo-driven XYZ stages) |
| Beam Steering | Dual-axis galvo-scanners (±15° mechanical scan angle, <50 µrad pointing stability) |
| Autofocus | Motorized objective Z-stage + CMOS machine vision feedback loop |
| Optional Modules | SLM-based beam shaping, harmonic mirror turrets, 4F relay optics, polarization rotators, WATT PILOT attenuators |
| Brand | ELAS |
|---|---|
| Model | MASTER Series |
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Core Components | Semiconductor-based Ultrafast Laser System (Picosecond & Femtosecond) |
| Laser Types | Pulsed IR/Vis/UV (1064 nm, 532 nm, 355 nm, 1028 nm) |
| Positioning Accuracy | ±1 µm (XY/Z), Repeatability: ≤0.10 µm |
| Max XY Travel | 200 mm |
| Max Z Travel | 100 mm |
| Max XY Speed | 2000 mm/s |
| Max Acceleration | 30 m/s² |
| Spot Size | Down to 3 µm |
| Pulse Duration | <10 ps (ps-Master), <200 fs (fs-Master) |
| Repetition Rate | Single-shot to 500 kHz |
| Beam Quality | M² < 1.5 (ps), M² < 1.2 (fs) |
| Platform | Vibration-isolated Granite Base |
| Safety Class | Integrated Class 1 Enclosure |
| Software | SCA – Windows-based Laser Process Control & Pattern Design Suite |
| Power Requirement | Up to 4500 W |
| Dimensions (W×D×H) | ~1300 × 1200 × 1700 mm |
| Brand | ELAS |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | Mini MASTER GN532 |
| Core Component | Diode-Pumped Solid-State (DPSS) Green Laser System (532 nm) |
| Application | Ultrafast Laser Micromachining for Photovoltaic Edge Isolation |
| Laser Class | Class 1 Enclosed Workstation |
| Automation Level | Semi-Automated with Integrated Galvo-Scanning & Sliding Door Interface |
| Compliance | Designed to meet IEC 60825-1:2014 (Laser Safety), ISO 13857 (Safety of Machinery), and supports GLP/GMP-aligned process documentation workflows |
| Software | Proprietary GUI with real-time pulse parameter control, job logging, and audit-trail-ready operation history |
| Brand | ELAS |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | Mini MASTER |
| Core Component | Semiconductor-Based Ultrafast Laser System |
| Laser Types | Nanosecond, Picosecond, and Custom Wavelength Options (1064 nm / 532 nm / 355 nm) |
| Scanning Field | 100 × 100 mm |
| f-Theta Lens Focal Length | 160 mm |
| Max Marking Speed | 3.5 m/s |
| Max Positioning Speed | 15.0 m/s |
| Minimum Achievable Spot Size | ≤ 3 µm |
| Laser Pulse Synchronization | Yes |
| Beam Quality (M²) | < 1.3 (ns), < 1.5 (ps) |
| Power Requirement | Up to 2000 W |
| Dimensions (W×D×H) | 1110 × 760 × 1440 mm |
| Safety Class | IEC 60825-1 Class 1 Enclosed System |
| Software Platform | SCA Laser Micro Machining Suite (Windows OS) |
| Brand | ELAS |
|---|---|
| Model | PicoLAB Laboratory Systems |
| Type | Picosecond DPSS Laser Micro-Machining Workstation |
| Laser Source | Nd:YVO₄ (1064 nm / 355 nm) |
| Pulse Duration | < 10 ps |
| Avg. Power | 16 W @ 1064 nm / 4 W @ 355 nm |
| Repetition Rate | Single Shot to 500 kHz |
| Beam Quality (M²) | < 1.5 |
| Spatial Mode | TEM₀₀ |
| Positioning Stages | X/Y Travel 600 mm × 400 mm |
| Stage Accuracy | ±4.5 µm |
| Repeatability | ±0.5 µm |
| Resolution | 0.1 µm |
| Galvo-Scanner | Dual-Axis, Synchronized with Stages |
| Safety Class | IEC 60825-1 Class 1 Enclosed System |
| Vision System | High-Resolution Machine Vision with Sample Recognition |
| Operating Temp. | 18–27°C (±1°C stability) |
| Power Supply | 240 VAC, 50–60 Hz, < 3 kW |
| Brand | ELAS |
|---|---|
| Model | Ventu FNP1064 |
| Laser Type | MOPFA Q-switched Yb-doped fiber laser |
| Wavelength | 1064 nm (nominal, 1060–1070 nm range) |
| Avg. Output Power | 20 W |
| Pulse Duration | 120 ns |
| Repetition Rate | 20–100 kHz |
| Beam Diameter | ~6 mm |
| Beam Quality (M²) | < 1.6 |
| Positioning System | 3-phase ironless linear motor stage |
| Travel Range | 300 × 300 mm |
| Bidirectional Repeatability | 0.7 µm |
| On-Axis Accuracy | 5 µm |
| Max Speed | 500 mm/s |
| Max Acceleration (no load) | 20 mm/s² |
| Dimensions | 1500 × 1500 × 900 mm |
| Weight | ~350 kg |
| Input Voltage | 220 V AC |
| Max Power Consumption | < 3 kW |
| Operating Temp | 18–27 °C |
| RH | 10–80 % (non-condensing) |
| Brand | ElectroOptic |
|---|---|
| Origin | Belarus |
| Model | Abris-M 2000 |
| Spectral Range | 350–2000 nm |
| Resolution | 60 lp/mm |
| Field of View | 40° |
| Magnification | 1× |
| Lens | F1.4 / 26 mm, uncoated |
| Focus Range | 0.15 m to ∞ |
| Power Supply | 1.5 V AAA battery (35 h runtime) or DC 3 V, ≤20 mA |
| Weight | 0.38 kg |
| Dimensions | 155 × 78 × 55 mm |
| Operating Temperature | −10 °C to +40 °C |
| Compliance | CE-marked optical safety device for laser alignment and IR visualization |
| [Brand | ElectroOptic |
|---|---|
| Origin | Belarus |
| Model | ABRIS-M Series |
| Spectral Range | 350–2000 nm |
| Detector Type | Linear Infrared Photodetector Array |
| Cooling | Uncooled Operation |
| Operating Temperature | −10 °C to +40 °C |
| Angular Resolution (Center) | 20° field of view, 60 lp/mm |
| Output Wavelength | 550 nm (green phosphor) |
| Magnification | 2× |
| Objective Lens | F1.8/50 mm with iris |
| Focus Range | 0.25 m to infinity |
| Power Supply | 1.5 V AAA battery (35 h runtime) or external DC 3 V, ≤20 mA |
| Weight | 0.42 kg |
| Dimensions | 158 × 78 × 50 mm |
| Minimum Detectable Irradiance | 20 µW/cm² @ 1064 nm, 10 mW/cm² @ 1550 nm, up to 3 W/cm² @ 2000 nm] |
| Brand | ElectroOptic |
|---|---|
| Origin | Russia |
| Model | CONTOUR |
| Spectral Range | 350–1700 nm (UV–NIR) |
| Integrated Display | TFT-LCD |
| Imaging Sensor Type | Enhanced CCD with IR Conversion Device |
| Supply Type | Imported |
| Distributor Status | Authorized Distributor |
| Brand | ElectroOptic |
|---|---|
| Origin | Russia |
| Model | CONTOUR-IR digit |
| Interface | USB 2.0 (480 Mbps nominal, up to 400 MB/s sustained) |
| Sensor Type | High-sensitivity CMOS with microlens array and enhanced pixel cascade amplification |
| Spectral Range | 400–1700 nm |
| Bit Depth | 8-bit luminance output |
| Frame Rate | Real-time digital video output (dependent on resolution and host system bandwidth) |
| Software Compatibility | WDM driver architecture |
| Power Supply | Bus-powered via USB 2.0 |
| Brand | ElectroOptic |
|---|---|
| Origin | Belarus |
| Model | CONTOUR-IR digital |
| Effective Pixels | 1280 × 1024 |
| Pixel Size | 3.75 µm × 3.75 µm |
| Spectral Range | 400–1700 nm |
| Lens | F1.4/26 mm, C-mount |
| FOV | 25° |
| SNR | 48 dB |
| Interface | USB 2.0 (480 Mbps) |
| Frame Rates | 15 Hz (1280×1024), 60 Hz (640×480) |
| Bit Depth | 8-bit |
| Power | USB bus-powered |
| Operating Temperature | 5–40 °C |
| Weight | 0.3 kg |
| Dimensions | 56 × 110 mm |
| Brand | ElectroOptic |
|---|---|
| Origin | Belarus |
| Model | CONTOUR-IR |
| Spectral Range | 400–1700 nm |
| Sensor Type | CCD (1/3″, 582 × 752) |
| Lens | F1.4 / 26 mm, C-mount |
| FOV | 20° |
| SNR | 48 dB |
| Frame Rate | 25 fps (CCIR standard) |
| Resolution | 570 TV lines |
| Video Output | Composite video (RCA, 1 Vp-p, 75 Ω) |
| Power Supply | DC 10–14 V, 150 mA |
| Operating Temperature | 5–40 °C |
| Weight | 0.3 kg |
| Dimensions | 56 × 110 mm |
| Sensitivity | ~5 µW/mm² @ 1310 nm |
| Compliance | CE, RoHS |
| Brand | ElectroOptic |
|---|---|
| Origin | Russia |
| Model | CONTOUR-IR |
| Sensor Type | Silicon-based CCD |
| Spectral Range | 700–1100 nm |
| Interface | USB 2.0 or GigE (configurable) |
| Pixel Resolution | 1392 × 1040 (standard) |
| Pixel Size | 6.45 µm × 6.45 µm |
| Read Noise | <15 e⁻ (rms, typical) |
| Dark Current | <0.001 e⁻/pixel/s @ 25°C |
| Cooling | Thermoelectric (Peltier), ΔT ≤ −20°C below ambient |
| Dynamic Range | >60 dB |
| Compliance | CE, RoHS |
| Brand | ElectroOptic |
|---|---|
| Origin | Belarus |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | CONTOUR-IR |
| Interface | USB 2.0 (480 Mbps nominal, 400 MB/s effective) |
| Sensor Format | 1/3" CMOS |
| Spectral Range | 400–1700 nm |
| Lens Mount | C-mount |
| Lens Specification | f/1.4, 26 mm |
| Field of View | 25° |
| Resolution (Format 1) | 1280 × 1024 @ 15 Hz (or 7 Hz) |
| Resolution (Format 2) | 640 × 480 @ 60 Hz (or 30 Hz) |
| Frame Rate | Up to 60 fps (subsampled), CCIR-compliant 25 fps (interlaced) |
| Dynamic Range / SNR | 48 dB |
| Bit Depth | 8-bit luminance output |
| Sensitivity | 300 µW/cm² @ 1310 nm |
| Included Accessories | IR filter set, spacer rings, calibration tools |
| Brand | ElectroOptic |
|---|---|
| Origin | Russia |
| Model | CONTOUR-M |
| Spectral Range | 400–1700 nm |
| Sensor Type | High-Sensitivity Silicon CCD |
| Display | 4-inch TFT LCD |
| Mounting Thread | 1/4"-20 internal thread |
| Form Factor | Handheld, Compact Design |
| Intended Use | IR beam alignment, NIR system characterization, IR microscopy support, luminescence visualization, and cultural heritage diagnostics |
| Brand | Electrophysics |
|---|---|
| Origin | USA |
| Model | 7290A-E |
| Detector Type | Uncooled Microbolometer |
| Spectral Range | 7–14 µm |
| Resolution | 640 × 480 pixels |
| Frame Rate | 30 Hz |
| Thermal Sensitivity (NETD) | ≤ 80 mK |
| Dynamic Range | 12 bits |
| Interface | USB 2.0 with Internal/External Sync Support |
| Dimensions (L×W×H) | 140 × 114 × 114 mm |
| Lens Mount | 2″–32 TPI Threaded |
| Compliance | RoHS, CE, FCC Class B |