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| Brand | attocube Systems AG |
|---|---|
| Origin | Germany |
| Product Type | Motorized Translation Stage |
| Model | oPOSITIONING |
| Operating Temperature Range | 10 mK to 373 K |
| Magnetic Field Compatibility | Up to 31 T |
| Vacuum Compatibility | Down to 5×10⁻¹¹ mbar |
| Closed-Loop Positioning Resolution | 1 nm |
| Maximum Travel Range | 50 mm |
| Minimum Stage Footprint | 11 × 11 mm |
| Load Capacity | Up to 2 kg |
| Typical Step Size | 50 nm at 300 K, 10 nm at 4 K (linear actuators) |
| Control Options | Open-loop, RES (resistive sensor), or NUM (optical encoder) feedback |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Product Type | Motorized Translation & Rotation Stage |
| Model | atto3DR |
| Sample Mounting Area | 4.9 mm × 4.9 mm × 1.2 mm |
| Electrical Contacts | 20-pin Chip Carrier Interface |
| Angular Range | ±90° per axis (mechanical reserve: ±10°) |
| Minimum Step Size | 1 m° @ 300 K |
| Max. Rotation Speed | ~30°/s @ 300 K |
| Feedback Sensor | Resistive Encoder |
| Encoder Resolution | ~6 m° |
| Repeatability | ~50 m° |
| Linearity Error | ~1% |
| Compatible Cryostat Environment | Dilution Refrigerators (down to <20 mK), He atmosphere |
| Plug-and-Play Integration | Yes |
| Control Interface | GUI & LabVIEW API |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | IDS3010 |
| Light Source | Single-frequency laser |
| Measurement Range | 0–5 m |
| Linear Measurement Accuracy | ±1 pm |
| Sampling Bandwidth | 10 MHz |
| Operating Environment | 10 mK, 1×10⁻¹⁰ mbar vacuum, up to 10 MGy radiation tolerance |
| Interface Options | HSSL, AquadB, CANopen, Profibus, EtherCAT |
| Probe Wavelengths | 650 nm (alignment), 1530 nm (measurement) |
| Probe Spot Sizes | 2 µm to 7.6 mm (depending on configuration) |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | attoNVM |
| Temperature Range | 1.8–300 K |
| Magnetic Field Range | ±9 T (vector, 1–1–1 T) or ±1 T (vector, 1–1–1 T) |
| Brand | attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoCFM I |
| Instrument Type | Point-Scanning Confocal Microscope |
| Temperature Range | 1.8 K – 300 K |
| Magnetic Field | Up to 12 T (vector magnet optional) |
| Vacuum Range | 1×10⁻⁶ mbar – 1 atm |
| Numerical Aperture (NA) | 0.82 |
| Optical Resolution | ~550 nm (@635 nm) |
| Coarse Sample Positioning | 5 × 5 × 5 mm³ |
| Fine Scan Range | 30 × 30 µm² @ 4 K |
| Working Distance | 0.7 mm |
| Compatible Cryostats | attoDRY1000/2100, Quantum Design PPMS (1" & 2" bore) |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoDRY Lab |
| Instrument Type | Magnetic Force Microscope (MFM) |
| Positioning Noise | 0.12 nm RMS |
| Sample Stage Travel Range | 5 mm × 5 mm × 5 mm |
| Temperature Range | 1.5 K – 300 K (configurable) |
| Maximum Magnetic Field | 15 T |
| Cooling Time (to base temperature) | ~1–2 hours |
| Control Interface | Integrated touchscreen with automated thermal and magnetic field sequencing |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Instrument Type | Confocal Raman Microscope |
| Spectral Range | 400–1000 nm |
| Spectral Resolution | <1 cm⁻¹/pixel (with 1800 lines/mm grating) |
| Spatial Resolution | <400 nm (at 532 nm excitation) |
| Minimum Detectable Raman Shift | 10 cm⁻¹ |
| Spectral Reproducibility | ±0.1 cm⁻¹ (typical, after spectral calibration) |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoCMC |
| Instrument Type | Vertical |
| Base Temperature | 2.3 K |
| Vibration Stability | High |
| Dimensions | 446 × 266 × 641 mm³ |
| Cooling Method | Air-Cooled |
| Refrigeration Power | 50 mW @ 2.8 K |
| Cold Head Diameter | 45 mm |
| Electrical Feedthroughs | Standard 6, Optional 12 |
| Max. Electrical Power Consumption | 1.4 kW |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoCSFM |
| Operating Temperature Range | 1.5 K – 300 K |
| Magnetic Field Range | 0 – 15 T |
| Optical Spectral Range | 400 – 1600 nm |
| Objective Lens | Cryogenic Confocal Objective (NA = 0.82, Working Distance = 4 mm) |
| Scan Range | 30 × 30 µm (at 4 K) |
| Spatial Resolution | < 50 nm (lateral), < 5 nm (z-height control) |
| Magnetic Field Sensitivity | ≤ 3 nT/√Hz (100 s integration) |
| NV-center-based Diamond Nanosensor Integration | Yes |
| AFM Platform | Tuning-Fork-Based Non-Contact AFM |
| ESR Detection Method | Spin-Dependent Fluorescence via Confocal Microscopy |
| Drift Stability | < 10 nm over 1 h (room-temperature base stability reference) |
| Compliance | Designed for GLP/GMP-aligned lab environments |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoAFM/attoMFM/attoSHPM |
| Temperature Range | mK to 373 K |
| Magnetic Field Compatibility | up to 15 T |
| Scan Range (4 K) | 30 µm × 30 µm |
| Lateral Resolution (MFM) | < 11 nm |
| Lateral Resolution (SHPM) | 250 nm |
| Z-bit Resolution (4 K, full range) | 7.6 pm |
| Z-bit Resolution (4 K, scan range) | 0.12 pm |
| RMS Z-noise (4 K) | 0.05 nm |
| Vacuum/Atmosphere | 1×10⁻⁶ mbar to 1 bar (He exchange gas) |
| Compatible Cryostats/Magnets | Quantum Design PPMS (1″ & 2″ bore), custom dilution refrigerators |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | ANR101/RES |
| Product Type | Motorized Translation Stage |
| Operating Temperature Range | 10 mK – 373 K |
| Magnetic Field Compatibility | 0 – 31 T |
| Vacuum Compatibility | Ambient – 5×10⁻¹¹ mbar |
| Closed-Loop Positioning Resolution | 1 nm |
| Maximum Travel Range | 50 mm |
| Minimum Stage Footprint | 11 × 11 mm |
| Load Capacity | Up to 2 kg |
| Actuation Voltage | 60 V or 150 V (low-voltage compatible) |
| Material | Beryllium Copper (BeCu) |
| Compliance | Designed for GLP/GMP-aligned quantum transport & optical spectroscopy workflows requiring traceable positioning under cryogenic, ultra-high vacuum, and high-field conditions |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoDRY800xs |
| Instrument Type | Vertical |
| Temperature Range | 3.8 K to 300 K |
| External Dimensions | 17 in × 28 in (432 mm × 711 mm) |
| Cooling Method | Closed-cycle helium refrigeration, helium-free operation |
| Vibration Performance | Sub-microradian angular stability, <5 nm RMS vertical displacement below 10 Hz |
| Vacuum Enclosure | User-customizable, optically accessible, multi-port design |
| Integration Height | Compatible with standard optical table height (762 mm ± 10 mm) |
| Electrical Feedthroughs | 36 DC leads included |
| Optical Compatibility | Designed for low-temperature achromatic objectives (e.g., attoLFT series), ≥12 mm working distance, AR-coated viewports (250–1100 nm) |
| Brand | attocube Systems AG |
|---|---|
| Origin | Germany |
| Product Type | Motorized Translation Stage |
| Model | attoECS |
| Travel Range | up to 50 mm |
| Minimum Step Size | 50 nm (open-loop), 10 nm (closed-loop with optical encoder) |
| Repeatability | ±200 nm |
| Accuracy | <0.01% of full scale |
| Load Capacity | up to 240 N (24 kg) |
| Operating Environment | Ambient air, dry nitrogen, or ultra-high vacuum (UHV) compatible |
| Drive Voltage | <45 V |
| Encoder Resolution (optional) | 1 nm |
| Dimensions (min) | 30 × 30 × 9.5 mm³ |
| Compliance | ISO 9001 certified manufacturing |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoDRY800 |
| Instrument Type | Upright |
| Temperature Range | 3.8 K to 320 K |
| Temperature Stability | <15 mK |
| Vibration Level | <5 nm peak-to-peak (vertical, 1500 Hz bandwidth) |
| Sample Chamber Diameter | 75 mm |
| Base Pressure | <5×10⁻⁶ mbar |
| Leak Rate | <5×10⁻⁹ mbar·L/s |
| Cool-down Time (to 5 K) | <4.5 h |
| Cooling Power | >170 mW @ 5 K |
| Compressor Power | 3 kW |
| Cooling Method | Closed-cycle, helium-free |
| Dimensions (Optical Table Mounting) | 900 mm × 1800 mm × 305 mm (height of vibration isolation legs: 597 mm) |
| Brand | attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoDRY800 / attoDRY1000 / attoDRY1100 / attoDRY2100 |
| Cooling Principle | Pulse-tube cryocooler |
| Base Temperature | 3.8 K (attoDRY800), 4 K (attoDRY1000/1100), 1.5–1.8 K (attoDRY2100) |
| Temperature Range | 1.5–320 K (model-dependent) |
| Temperature Stability | < ±5 mK (attoDRY2100), < ±10 mK (attoDRY1000/1100), < ±15 mK (attoDRY800) |
| Vertical Vibration Amplitude (Z-axis) | < 0.15 nm (attoDRY1000/1100/2100), < 5 nm peak-to-peak (attoDRY800) |
| Sample Chamber Diameter | 49.7 mm (attoDRY1000/1100/2100), 75 mm (attoDRY800) |
| Magnetic Field Options | Up to 9 T (superconducting), vector magnet configurations available |
| Optical Access | Integrated optical vacuum chamber with high-NA low-temperature objectives (NA ≥ 0.8) |
| Control Interface | Touchscreen-based automated temperature & field control (attoDRY1100/2100), manual control (attoDRY800/1000) |
| Refrigeration Power | >5 mW @ 5 K, >1000 mW @ 4.2 K (attoDRY1000/1100/2100) |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | atto CMC |
| Instrument Type | Vertical |
| Base Temperature | 2.3 K |
| Vibration Stability | High |
| Dimensions | 446 × 266 × 641 mm³ |
| Cooling Method | Air-Cooled |
| Refrigeration Power | 50 mW @ 2.8 K |
| Cold Head Diameter | 45 mm |
| Electrical Feedthroughs | Standard 6, Optional 12 |
| Max. Electrical Power Consumption | 1.4 kW |
| IGLU Compressor Integration | Yes |
| Rack-Mountable | 19-inch compatible |
| Control | Remote via Ethernet/RS232 |
| Automation Level | Fully Automated Cool-Down & Operation |
| Brand | Attocube Systems AG |
|---|---|
| Origin | Germany |
| Model | attoAFM/attoMFM/attoSHPM |
| Temperature Range | mK to 373 K |
| Magnetic Field Compatibility | Up to 15 T |
| Scan Range (4 K) | 30 µm × 30 µm |
| Lateral Resolution (MFM) | <11 nm |
| Lateral Resolution (SHPM) | 250 nm (high-res mode) |
| Z-Noise (4 K) | 0.05 nm RMS |
| Z-Bit Resolution (full range) | 7.6 pm |
| XY-Bit Resolution (4 K, 12 µm scan) | 0.18 nm |
| Vacuum/He Atmosphere | 1×10⁻⁶ mbar to 1 bar |
| Compatible Cryostats | Quantum Design PPMS, 1″ & 2″ bore systems |
| Modular Functionality | AFM, MFM, SHPM, c-AFM, EFM, STM, SNOM, Confocal Microscopy |
| Brand | Arradiance |
|---|---|
| Origin | USA |
| Model | GEMStar-8 XT |
| Substrate Size | Up to 200 mm (8-inch) wafers |
| Process Temperature | 300°C aluminum alloy hot-wall chamber with convective temperature control |
| Precursor Channels | 8 independent precursor lines with CF-40 vacuum flanges |
| Chamber Dimensions (W × H × D) | 78 × 56 × 28 cm |
| Thickness Uniformity | <1% across 200 mm substrate |
| Thermal Uniformity | 99.9% |
| Maximum Sample Thickness | 32 mm |
| Plasma Option | Integrated 13.56 MHz ICP plasma source (300 W, air-cooled) |
| Mass Flow Controllers | 4 MFCs (3 for plasma gases, 1 for carrier gas) |
| Compliance | CF-40 standard vacuum interface, glovebox-compatible side-mount configuration |
| Brand | Applied NanoFluorescence |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | Nano Spectralyzer NS3 |
| Pricing | Available Upon Request |
| [Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | APD |
| Vacuum Chamber Dimensions | 400 × 400 × 300 mm (L×W×H) |
| Pumping System | 450 L/s Turbomolecular Pump |
| Plasma Source | Up to 3 Configurable Arc Cathodes |
| Operating Pressure Range | High Vacuum to Low-Pressure Reactive Gases (N₂, O₂, H₂, Ar) |
| Target Geometry | Cylindrical or Tubular, Ø10 mm × 17 mm |
| Target Resistivity | < 0.01 Ω·cm |
| Energy Storage Capacitance | 360 µF × 5 (Optional Expansion) |
| Pulse Frequency | 1–5 Hz |
| Discharge Voltage | 70–400 V (Max 150 V at 1800 µF) |
| Human-Machine Interface | Integrated Touchscreen Control Panel |
| Powder Collection Module (APD-P) | Ø95 mm × 30 mm Vessel, 1–50 rpm Rotation, Yield: 13–20 cm³/h (Density- and Size-Dependent) |
| Thin-Film Configuration (APD-S) | Uniform Deposition on 2-inch Substrates] |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | CAS-AYII |
| Instrument Type | Non-Vacuum Rapid Thermal Annealing System |
| Sample Dimensions | 70 mm (W) × 220 mm (L) × 0.5–2.0 mm (T) |
| Temperature Range | 50 °C to 1000 °C (max. 1150 °C) |
| Max. Heating Rate | 30 °C/s |
| Max. Cooling Rate | −70 °C/s (from 1000 °C to 400 °C) |
| Annealing Temperature Accuracy | High |
| Annealing Temperature Uniformity | High |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | F-PEM |
| Operating Atmosphere | Ambient Air |
| Temperature Range | Room Temperature to 600 °C (Heating Zone) |
| Sample Size | Square, 40 mm × 40 mm × (5–30) mm Thickness |
| Power Supply | AC200V, 5 kW (Main Unit) |
| Dimensions | W600 × D600 × H1700 mm |
| Weight | ~120 kg |
| Contact Force | Up to 160 kgf (via Constant-Pressure Spring Mechanism) |
| Measured Parameters | Maximum Output Power (P<sub>max</sub>), Heat Flow Rate (Q), Thermoelectric Conversion Efficiency (η) |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | F-CAL |
| Measurement Principle | Heat Flow Method |
| Thermal Resistance Range | 1×10⁻⁵ m²·K/W |
| Repeatability | <2% fluctuation |
| Test Atmosphere | Ambient air |
| Hot-Side Temperature Setting | 50°C |
| Sample Geometry | Square, 25 mm or 40 mm edge length, thickness 1–5 mm |
| Instrument Type | Steady-State Thermal Resistance Analyzer |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Model | PEM-2 |
| Maximum Temperature Gradient | 500 °C (up to 800 °C heating surface) |
| Sample Geometry | Square, 20/30/40 mm × 5–30 mm thickness |
| Contact Pressure | 2 MPa (at 30 mm square sample) |
| Atmosphere | Inert gas compatible |
| Measurement Method | One-dimensional heat flux input method |
| Measured Parameters | Thermoelectric conversion efficiency (η), electrical power output (P), thermal input flux (Q) |
| Heating System | High-precision infrared gold-mirror furnace |
| Cooling System | Integrated water-cooled lower stage |
| Load Control | Automated variable resistive load adjustment |
| Software | Fully integrated control with thermal stability detection, real-time data logging, and automated test sequencing |
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