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| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | ANNEAL |
| Instrument Type | High-Vacuum Rapid Thermal Annealing (RTA) System |
| Sample Size | 4-inch / 6-inch wafers |
| Max Temperature | 1000 °C |
| Base Vacuum | <5×10⁻⁷ mbar |
| Temperature Uniformity | ±1 °C |
| Gas Compatibility | Ar, O₂, N₂, H₂, and custom gas mixtures |
| Heating Options | Quartz Lamp (≤600 °C), CCC Carbide (≤1000 °C, inert/reducing), SiC-coated Carbon (O₂-compatible up to 1000 °C) |
| Control Interface | Integrated touchscreen with programmable thermal profiles |
| Safety | H₂-safe dilution exhaust, interlocked chamber access, real-time pressure/temperature/failure monitoring |
| Cleanroom Compatibility | ISO Class 4 (Class 10) compliant design |
| Brand | ADVANCE RIKO |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | CAS-AYII |
| Instrument Type | Non-Vacuum Rapid Thermal Annealing System |
| Sample Dimensions | 70 mm (W) × 220 mm (L) × 0.5–2.0 mm (T) |
| Temperature Range | 50 °C to 1000 °C (max. 1150 °C) |
| Max. Heating Rate | 30 °C/s |
| Max. Cooling Rate | −70 °C/s (from 1000 °C to 400 °C) |
| Annealing Temperature Accuracy | High |
| Annealing Temperature Uniformity | High |
| Brand | Advance Riko |
|---|---|
| Origin | Japan |
| Model | HT-RTA59HD |
| Instrument Type | Non-vacuum Rapid Thermal Annealer |
| Sample Dimensions | 15 mm × 15 mm × 1 mm |
| Temperature Range | Ambient to 1800 °C |
| Maximum Heating Rate | 1800 °C in ≤10 s (for 15 mm × 15 mm sample) |
| Cooling Rate | 180 °C/s |
| Temperature Accuracy | High |
| Temperature Uniformity | High |
| Heating Method | High-intensity infrared lamp array with optimized reflective cavity |
| Sample Holder Material | Alumina or high-purity graphite |
| Thermocouple Compatibility | JIS B standard φ0.3 mm (W-Re optional) |
| Interface | USB-connected PC control and real-time temperature monitoring |
| Optional Quench Configuration | CAS-59AQ water-quench module |
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