Empowering Scientific Discovery

Qingdi Quantum Scientific Instruments (Beijing) Co., Ltd.

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BrandMoorfield
OriginUK
ModeloPVD S10A, oPVD S10A-WA, oPVD T15A
Vacuum Base Pressure<5×10⁻⁷ mbar
Substrate Sizeup to 8 inches (S10A-WA), up to 4 inches (S10A & T15A)
Substrate Heatingup to 500 °C
Target Compatibility2-inch water-cooled magnetron sputtering targets (S10A/S10A-WA)
Gas Controlup to 3 MFC-controlled process gases (Ar, O₂, N₂)
Deposition ModesDC/RF magnetron sputtering, reactive sputtering, co-sputtering, resistive/low-temperature organic evaporation
Film Uniformityhigh across full substrate area
Cleanroom-Compatible Designyes
Softwareintegrated touchscreen HMI with programmable recipes, audit-trail-capable control logic
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Brandiplas
OriginGermany
ModelCYRANNUS®
Operating Pressure Range10 mbar to atmospheric pressure
Plasma Generation MethodExternal multi-electrode microwave excitation (2.45 GHz or 915 MHz)
Substrate CompatibilityUp to 300 mm diameter planar or curved substrates
Compatible Precursor GasesCH₄/H₂/O₂/Ar/He/N₂ (inert and reactive)
Deposited MaterialsSingle-crystal diamond, polycrystalline diamond, nanocrystalline diamond, DLC, Al₂O₃, c-BN
Plasma StabilityHigh reproducibility under dynamic gas flow, pressure, and voltage fluctuations
Safety ComplianceFully shielded microwave cavity
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BrandMoorfield
OriginUK
ModelMiniLab
Vacuum Base Pressure5×10⁻⁷ mbar
Maximum Substrate Diameter11 inches
Deposition TechniquesThermal Evaporation, Low-Temperature Organic Evaporation, Magnetron Sputtering, Electron Beam Evaporation
Chamber ConfigurationsFront-Loading Box, Top-Hinged Bell Jar, Glovebox-Compatible Dual-Door, Tall-Aspect-Ratio Vertical
ComplianceISO 9001–Certified Manufacturing, GLP-Ready Architecture, FDA 21 CFR Part 11–Compatible Software Options Available
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BrandMoorefield
OriginUnited Kingdom
Heating MethodCold-Wall Design
Base Pressure5×10⁻⁷ mbar
Substrate Dimensions20 × 40 mm²
Maximum Temperature1100 °C
Growth Time<30 min
Process GasesAr, H₂, CH₄
Mass Flow Controllers (MFCs)Integrated for Precise Gas Delivery
Plasma OptionOptional RF Source (150 W, 13.56 MHz) for oCVD-WPG Variant
ComplianceCompatible with ISO Class 5 Cleanroom Environments
Safety FeaturesExhaust Dilution Module, Vacuum Interlock, Thermal Shutdown
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BrandArradiance
OriginUSA
ModelGEMStar-8 XT
Substrate SizeUp to 200 mm (8-inch) wafers
Process Temperature300°C aluminum alloy hot-wall chamber with convective temperature control
Precursor Channels8 independent precursor lines with CF-40 vacuum flanges
Chamber Dimensions (W × H × D)78 × 56 × 28 cm
Thickness Uniformity<1% across 200 mm substrate
Thermal Uniformity99.9%
Maximum Sample Thickness32 mm
Plasma OptionIntegrated 13.56 MHz ICP plasma source (300 W, air-cooled)
Mass Flow Controllers4 MFCs (3 for plasma gases, 1 for carrier gas)
ComplianceCF-40 standard vacuum interface, glovebox-compatible side-mount configuration
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[BrandADVANCE RIKO
OriginJapan
ModelAPD
Vacuum Chamber Dimensions400 × 400 × 300 mm (L×W×H)
Pumping System450 L/s Turbomolecular Pump
Plasma SourceUp to 3 Configurable Arc Cathodes
Operating Pressure RangeHigh Vacuum to Low-Pressure Reactive Gases (N₂, O₂, H₂, Ar)
Target GeometryCylindrical or Tubular, Ø10 mm × 17 mm
Target Resistivity< 0.01 Ω·cm
Energy Storage Capacitance360 µF × 5 (Optional Expansion)
Pulse Frequency1–5 Hz
Discharge Voltage70–400 V (Max 150 V at 1800 µF)
Human-Machine InterfaceIntegrated Touchscreen Control Panel
Powder Collection Module (APD-P)Ø95 mm × 30 mm Vessel, 1–50 rpm Rotation, Yield: 13–20 cm³/h (Density- and Size-Dependent)
Thin-Film Configuration (APD-S)Uniform Deposition on 2-inch Substrates]
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