Semiconductor Instruments
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| Brand | MOJI-NANO |
|---|---|
| Origin | Shandong, China |
| Manufacturer Type | Original Equipment Manufacturer (OEM) & Material Developer |
| Product Category | Domestic Advanced Photoresist for Maskless Direct Laser Writing |
| Model | 3D Micro/Nano-Scale Photoresist Series |
| Pricing | Available upon Technical Consultation |
| Brand | MONODE |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Category | Imported Instrument |
| Model | MONODE Barcode Reader |
| Price | USD 1,400 (approx.) |
| Brand | Monode |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | BRAVO IV |
| Price | USD 7,200 (FOB USA) |
| Brand | Monode |
|---|---|
| Origin | USA |
| Model | ICE |
| Marking Area | 120 mm × 100 mm |
| Column Height | 400 mm |
| Connectivity | Ethernet & Wi-Fi |
| User Interface | Touchscreen, Multilingual (22 languages) |
| Supported Content | Alphanumeric text, DataMatrix, QR codes, barcodes |
| Data Input | CSV file import |
| Logging | Timestamped marking log with traceability |
| Integration | PLC-compatible I/O, barcode printer interface |
| Compliance | CE, RoHS, FCC Part 15 |
| Brand | Monode |
|---|---|
| Origin | USA |
| Model | Monode Portable Pin Maker |
| Power Source | Rechargeable Lithium-ion Battery (5 Ah) |
| Marking Window | 50 mm × 30 mm |
| Marking Force | Adjustable |
| Marking Speed | Variable (file-driven) |
| Battery Runtime | Up to 3 h continuous / ~8 h intermittent |
| Compliance | HPGL-compatible output |
| Included Accessories | 1 charger + 2 batteries |
| Enclosure | Industrial-grade portable carry case with linear guide rails on X/Y axes |
| Weight & Form Factor | Compact, cordless, handheld design |
| Brand | MONODE |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Category | Imported Equipment |
| Model | Vestige Series Revolution |
| Laser Source | Pulsed Fiber (10 W or 20 W), Diode-Pumped, Air-Cooled |
| Compliance | FDA 21 CFR 1040.10, ANSI Z136.1-2000, MIL-STD-130 |
| Label Feed | Motorized Roll-to-Roll (4″ × 1000 ft) |
| Integrated Fume Extraction | HEPA-Filter Replaceable |
| UID Verification | Patented In-Line Validation Engine |
| Maintenance Profile | Low-Cost Scheduled Maintenance |
| Brand | Moorefield |
|---|---|
| Origin | United Kingdom |
| Heating Method | Cold-Wall Design |
| Base Pressure | 5×10⁻⁷ mbar |
| Substrate Dimensions | 20 × 40 mm² |
| Maximum Temperature | 1100 °C |
| Growth Time | <30 min |
| Process Gases | Ar, H₂, CH₄ |
| Mass Flow Controllers (MFCs) | Integrated for Precise Gas Delivery |
| Plasma Option | Optional RF Source (150 W, 13.56 MHz) for oCVD-WPG Variant |
| Compliance | Compatible with ISO Class 5 Cleanroom Environments |
| Safety Features | Exhaust Dilution Module, Vacuum Interlock, Thermal Shutdown |
| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | ANNEAL |
| Instrument Type | High-Vacuum Rapid Thermal Annealing (RTA) System |
| Sample Size | 4-inch / 6-inch wafers |
| Max Temperature | 1000 °C |
| Base Vacuum | <5×10⁻⁷ mbar |
| Temperature Uniformity | ±1 °C |
| Gas Compatibility | Ar, O₂, N₂, H₂, and custom gas mixtures |
| Heating Options | Quartz Lamp (≤600 °C), CCC Carbide (≤1000 °C, inert/reducing), SiC-coated Carbon (O₂-compatible up to 1000 °C) |
| Control Interface | Integrated touchscreen with programmable thermal profiles |
| Safety | H₂-safe dilution exhaust, interlocked chamber access, real-time pressure/temperature/failure monitoring |
| Cleanroom Compatibility | ISO Class 4 (Class 10) compliant design |
| Brand | Moorfield |
|---|---|
| Origin | UK |
| Model | MiniLab |
| Vacuum Base Pressure | 5×10⁻⁷ mbar |
| Maximum Substrate Diameter | 11 inches |
| Deposition Techniques | Thermal Evaporation, Low-Temperature Organic Evaporation, Magnetron Sputtering, Electron Beam Evaporation |
| Chamber Configurations | Front-Loading Box, Top-Hinged Bell Jar, Glovebox-Compatible Dual-Door, Tall-Aspect-Ratio Vertical |
| Compliance | ISO 9001–Certified Manufacturing, GLP-Ready Architecture, FDA 21 CFR Part 11–Compatible Software Options Available |
| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | nanoETCH |
| RF Power Range | <30 W (milliwatt-resolution control) |
| Base Pressure | <5×10⁻⁷ mbar |
| Sample Stage Options | 3-inch & 6-inch |
| Vacuum System | Turbomolecular pump with optional backing pump |
| Gas Delivery | Mass Flow Controller (MFC)-regulated |
| Control Interface | Integrated touchscreen HMI with programmable etch recipes |
| Data Logging | PC-compatible USB/Ethernet interface |
| Safety Compliance | CE, IEC 61000-6-4, IEC 61000-6-2 |
| Brand | Moorfield |
|---|---|
| Origin | UK |
| Model | oPVD S10A, oPVD S10A-WA, oPVD T15A |
| Vacuum Base Pressure | <5×10⁻⁷ mbar |
| Substrate Size | up to 8 inches (S10A-WA), up to 4 inches (S10A & T15A) |
| Substrate Heating | up to 500 °C |
| Target Compatibility | 2-inch water-cooled magnetron sputtering targets (S10A/S10A-WA) |
| Gas Control | up to 3 MFC-controlled process gases (Ar, O₂, N₂) |
| Deposition Modes | DC/RF magnetron sputtering, reactive sputtering, co-sputtering, resistive/low-temperature organic evaporation |
| Film Uniformity | high across full substrate area |
| Cleanroom-Compatible Design | yes |
| Software | integrated touchscreen HMI with programmable recipes, audit-trail-capable control logic |
| Brand | MPI |
|---|---|
| Origin | Taiwan |
| Model | TS150 & TS200 & TS300 |
| Probe Station Type | Manual RF Probe Station |
| Wafer Compatibility | 150 mm (6″), 200 mm (8″), 300 mm (12″) |
| Platen Lift Range | 0–300 µm / 3 mm (3-stage) |
| Positioning Repeatability | ±1 µm |
| XY-θ Motion Stage | 25 × 25 mm with micrometer adjustment |
| Z-Axis Fine Adjustment | 25 mm travel with 1 mm engraved scale |
| RF MicroPositioner Capacity | up to 4 four-port RF probes or 10 DC probes |
| Thermal Chuck Compatibility | ERS-series temperature-controlled chucks (–60 °C to +300 °C) |
| Optical Options | MPI SZ10 stereo zoom, MZ12 monocular zoom, 90° tilt standard |
| Vibration Isolation | Integrated damping base |
| EMI Shielding | Optional light-tight, EMI-shielded enclosure |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | TS200-SE Probe System |
| Price Range | USD 13,500 – 40,500 (FOB) |
| Product Category | Temperature-Controlled Manual Probe Station |
| Operation Mode | Manual |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | MR200 |
| Price Range | USD 13,500 – 40,500 (FOB) |
| Maximum Scribing Length | 200 mm |
| Scribing Force Range | 10 g – 130 g |
| Diamond Blade Contact Width | 5 µm – 10 µm |
| Zoom Microscope Magnification | 8× – 40× (continuous, stepless) |
| Optical Resolution at 10× | < 10 µm |
| X/Y Manual Stage Travel | 200 mm × 200 mm |
| Fine Positioning Accuracy | 0.01 mm (X/Y), 0.006° (rotation) |
| Wafer Chuck Diameter | 200 mm (standard), optional 100 mm |
| Vacuum Hold-Down Pressure | < 75 mbar |
| Power Supply | 100–220 V AC, 60 W |
| Dimensions (W×D×H) | 430 mm × 700 mm × 550 mm |
| Weight | ~16 kg |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | MVS |
| Pricing | Available Upon Request |
| Brand | Nano-Master |
|---|---|
| Origin | USA |
| Manufacturer | Nano-Master, Inc. |
| Type | Magnetron Sputter Deposition System |
| Substrate Size | 6-inch (152 mm) |
| Maximum Substrate Temperature | 700 °C |
| Thickness Uniformity | <1% (1σ, across 6″ wafer) |
| Base Pressure | ≤1 × 10⁻⁷ Torr |
| Pumping Speed | 260 L/s Turbo Molecular Pump (optional) |
| Power Supplies | 1 kW DC + 300–600 W RF (13.56 MHz) |
| Magnetron Configuration | Up to 3 off-axis planar magnetrons |
| Chamber | 14″ cubic aluminum vacuum chamber with viewport |
| Control Interface | LabVIEW-based PC control with multi-level password protection and full interlock safety architecture |
| Brand | Nano-Master |
|---|---|
| Origin | Germany |
| Model | SWC-3000 |
| Maximum Substrate Size | 300 mm (12") round or 230 mm × 230 mm (9" × 9") square |
| Control System | Microprocessor-based automation |
| Optional Modules | PVA brush station, Chemical Dispense Unit (CDU), N₂ ionizer, IR drying lamp, custom photomask/wafer chucks |
| Origin | USA |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | P130 / S130 |
| Price Range | USD 280,000 – 420,000 |
| UV Light Source | 405 nm LED |
| XY Resolution | 2–10 µm |
| Layer Thickness | 5–20 µm |
| Build Volume (P130) | 3.84 × 2.16 × 10 mm (Mode 1) / 38.4 × 21.6 × 10 mm (Mode 2) / 50 × 50 × 10 mm (Mode 3) |
| Build Volume (S130) | Up to 100 × 100 × 50 mm |
| Optical System | High-NA Projection Micro-Lithography Optics |
| Post-Processing | Integrated Vacuum Despersion + UV Curing Station |
| Power Requirement | 200–240 V AC, 50/60 Hz, 3 kW |
| Weight | 450 kg |
| Dimensions | 1720 × 650 × 1820 mm |
| Origin | Jiangsu, China |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Regional Origin | Domestic (PRC) |
| Model | Custom Grating Fabrication |
| Pricing | Available Upon Technical Consultation |
| Brand | Nanoscribe |
|---|---|
| Country of Origin | Germany |
| Model | Photonic Professional GT2 |
| Category | Two-Photon Polymerization (TPP) Microfabrication System |
| Automation Level | Fully Automated |
| User Interface | Intuitive Graphical Workflow Environment |
| Compliance Framework | Designed for ISO 14644-1 Class 5 cleanroom integration |
| Software Architecture | Windows-based, FDA 21 CFR Part 11–ready audit trail support (optional configuration) |
| Brand | Nanoscribe |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Quantum X shape |
| Exposure Mode | Proximity-Based Two-Photon Absorption |
| Resolution | 100 nm (feature size) |
| Light Source | Femtosecond Pulsed Near-Infrared Laser |
| Wavelength | 780 nm |
| Intensity Uniformity | ±1% |
| Maximum Exposure Area | 100 mm diameter |
| Surface Roughness (Ra) | ≤ 5 nm |
| Shape Accuracy | ≤ 200 nm |
| Single Print Field Diameter | ≥ 4,000 µm |
| Max Scanning Speed | 6.25 m/s (at 10× objective) |
| Substrate Compatibility | Up to 200 mm (8″) wafers, glass, silicon, opaque substrates |
| Compatible Photoresists | Nanoscribe IP-series (polymer), GP-Silica (glass-like), and third-party resists |
| Brand | NAURA |
|---|---|
| Origin | Beijing, China |
| Model | GSE C200 |
| Wafer Size Capacity | ≤8-inch |
| Plasma Source Type | High-Density Inductively Coupled Plasma (ICP) |
| Etch Uniformity | <±3% (1σ, across 200 mm wafer) |
| Material Compatibility | Si, SiO₂, Si₃N₄, GaN, GaAs, InP, LiNbO₃, Nb, PI, metals, organics |
| Application Scope | R&D, failure analysis, pilot-line process development |
| Compliance | Designed to meet SEMI S2/S8 safety guidelines |
| Software | Integrated recipe management with audit trail logging (21 CFR Part 11–ready configuration available) |
| Brand | NAURA |
|---|---|
| Origin | Beijing, China |
| Model | HORIC D200 Series |
| Wafer Sizes | 4", 6", 8" |
| Compatible Substrates | Silicon (Si), Silicon Carbide (SiC), Silicon-on-Gallium Nitride (Si/GaN) |
| Process Capabilities | Phosphorus Diffusion, Boron Diffusion, Thermal Oxidation, Annealing, Alloying |
| Application Domains | R&D Laboratories, Compound Semiconductor Fabrication |
| Compliance | GB/T Standards, IEC 61000-6-2/6-4, SEMI S2-0215, CE Marked (EMC & LVD) |
| MES Integration | SECS/GEM, OPC UA, Custom API Support |
| Brand | NBM |
|---|---|
| Origin | USA |
| Model | Micro PLD |
| Substrate Heating Temperature | 1200 °C |
| Base Vacuum | 1×10⁻⁶ Torr |
| Substrate Diameter | 2 inch |
| Target Positions | 4 |
| Substrate Rotation Speed | 20 rpm |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | 180 PED |
| Quotation | Upon Request |
| Vacuum Chamber | 18" spherical chamber with 8" CF viewport, 6.75" CF PED source port, three 6" CF ports, two additional 2.75" and 1.33" CF ports |
| Electron Gun Energy | 8–20 keV |
| Pulse Energy | 100–800 mJ |
| Pulse Width | 100 ns |
| Max Repetition Rate | 10 Hz at 15 kV, 5 Hz at 20 kV |
| Beam Cross-Section (Min) | 8 × 10⁻² cm² |
| Peak Power Density | 1.3 × 10⁸ W/cm² |
| Z-Axis Alignment Range | 50 mm |
| XY Alignment Range | ±20 mm |
| Spark Plug Lifetime | ~3 × 10⁷ pulses |
| Substrate Heater | Ø2" max / 10×10 mm² min |
| Substrate Rotation | 1–30 RPM (360° continuous) |
| Target Carousel | 6 × 1" or 3 × 2" targets |
| Target Grid Scanning | Programmable raster ablation pattern |
| Target Height Adjustment | Motorized |
| Target Shutters | Individual shutters per target to prevent cross-contamination |
| Process Gas Compatibility | O₂, N₂, Ar |
| Pulse Energy Stability | ±10% |
| Base Pressure | ≤8 × 10⁻⁸ Torr (with dry pump + turbomolecular pump) |
| Software Platform | Windows 7 + LabVIEW 2013 |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Ion-Assisted PLD System |
| Pricing | Upon Request |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Model | Large-Area PLD Systems |
| Substrate Diameter | 4" (100 mm), 6" (150 mm), 8" (200 mm) |
| Chamber Type | 18-inch-diameter spherical or cylindrical vacuum chamber |
| Max. Substrate Temperature | 850 °C (for 4″), 750 °C (for 6″), 700 °C (for 8″) |
| Target Mount | 4 × 2-inch rotary target assembly |
| Thickness Uniformity | ±5% or better across full wafer |
| Process Gases | O₂, N₂, Ar with mass flow controllers (MFCs) |
| Load Lock | Integrated |
| Automation Platform | Windows 7 + LabVIEW 2013 |
| Laser Scanning | Programmable beam rastering with inverse-velocity dwell-time compensation |
| Oxygen-Compatible High-Temperature Operation | Yes |
| Brand | Neocera |
|---|---|
| Origin | Finland |
| Model | PED-120 |
| Vacuum Chamber | 12" Ø |
| Base Pressure | <1×10⁻⁶ Torr |
| Substrate Heater | 2" diameter, 950 °C max, ±1 °C stability |
| Target Capacity | six 1" or three 2" targets |
| Target-to-Substrate Distance | 4" |
| Gas Flow Control | 100 sccm MFC (O₂-compatible) |
| Turbo Pump | 260 L/s with cryo-trap |
| Roughing Pump | 4 m³/hr oil-free rotary vane |
| Electron Source | PEBS-20, 8–20 kV, 0.1–0.8 J/pulse, ~100 ns pulse width, ≤15 Hz rep rate, beam spot ≥6×10⁻² cm², energy density up to 1.3×10⁸ W/cm² |
| Z-axis travel | 50 mm, XY-axis travel: ±20 mm |
| Operating Lifetime | ≥10⁷ pulses |
| Max PEBS Housing Temp | 85 °C |
| Brand | Neocera |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Pioneer 120 Advanced PLD System |
| Substrate Heating | Up to 850°C, Radiant Heater, O₂-Compatible |
| Substrate Size | 10 mm × 10 mm to 2-inch diameter |
| Vacuum Base Pressure | ≤5×10⁻⁹ Torr |
| Chamber Diameter | 12 inches |
| Target Capacity | 6×1″ or 3×2″ targets |
| Turbo Pump Speed | 260 L/s (software-controlled) |
| In-situ Diagnostics | RHEED-compatible |
| Load Lock | Optional |
| Software Platform | Windows 7 + LabVIEW 2013 |