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Hong Kong Electronic Equipment Co., Ltd.

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BrandPVA TePla
OriginGermany
ModelGIGA 690
Instrument TypeImported Microwave Plasma Cleaner
CategoryPlasma Surface Treater for Sample Preparation
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BrandPVA TePla
OriginGermany
ModelGIGA 80 Plus
TechnologyDual-mode (Microwave + RF) Plasma
Chamber TypeSingle-chamber, frame-based batch processing
Max. Frame Size100 × 300 mm
Application FocusSemiconductor packaging pre-bonding, molding, and underfill processes
ComplianceDesigned for ISO Class 5–7 cleanroom integration
Control ArchitectureFully automated PLC-based operation with recipe management
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BrandTeltec Semiconductor Pacific Limited
OriginHong Kong
ModelRIE-ICP FA System
ConfigurationRIE/PE and ICP dual-mode plasma etching platform
Wafer CompatibilityUp to 300 mm
Etch ModesReactive Ion Etching (RIE), Plasma Enhanced (PE), Inductively Coupled Plasma (ICP)
Process FlexibilityAnisotropic and isotropic etching capability
Target MaterialsSiO₂, Si₃N₄, poly-Si, Al, Cu, low-k dielectrics, PI (polyimide), TEOS-based films
Application DomainFailure Analysis (FA), Cross-sectioning, Delayering, Package-level and Die-level deprocessing
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