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| Brand | Microphase |
|---|---|
| Origin | Japan |
| Model | MPCVD-50 |
| Heating Method | Hot-Wall |
| Base Vacuum | 10 Pa |
| Operating Pressure Range | Adjustable from atmospheric to low vacuum (10–10⁵ Pa) |
| Maximum Temperature | 1200 °C |
| Quartz Tube Dimensions | Ø50 mm / Ø70–110 mm × 1000 mm |
| Substrate Size Range | 60 mm × 60 mm to 120 mm × 120 mm |
| Precursor Gases | H₂, N₂, CH₄, C₂H₅OH (ethanol) |
| Deposited Materials | Vertically aligned CNT arrays, CNT powders, freestanding CNT films, and patterned CNT structures |
| Gas Control | Triple-channel mass flow controllers (MFCs) for inert, hydrocarbon, and reducing gases |
| Ethanol Delivery | Precision syringe pump with gravimetric calibration |
| Compliance | Designed for ISO/IEC 17025-compliant lab environments |
| Brand | k-Space Associates |
|---|---|
| Model | kSA ACE |
| Origin | USA |
| Vacuum Compatibility | Ultra-High Vacuum (UHV) / High Vacuum |
| Substrate Compatibility | Standard Semiconductor Wafers (e.g., Si, GaAs, InP, sapphire) |
| Source Flexibility | Unlimited (compatible with effusion cells, e-beam evaporators, magnetron sputter targets, PLD plumes) |
| Base Rotation | Supported |
| Optical Configuration | Triple Hollow Cathode Lamp (HCL) Integration |
| Detection Principle | Atomic Absorption Spectroscopy (AAS) |
| Element Capacity | Up to 3 elements simultaneously |
| Calibration Light Source | Pulsed Xenon Flash Lamp |
| Thermal Stability | Actively Temperature-Stabilized Optical Path |
| Data Interface | TCP/IP + Analog Voltage Output (0–10 V, proportional to absorbance/growth rate) |
| Software | kSA ACE Control & Analysis Suite (Windows-based, GLP-compliant logging) |
| Brand | Microphase |
|---|---|
| Origin | Japan |
| Model | MPCVD-Graphene |
| Heating Method | Hot-Wall |
| Deposition Gases | C₂H₂, C₂H₄, or CH₄ |
| Deposited Materials | Graphene Films, Carbon Nanotubes |
| Base Vacuum | Adjustable |
| Operating Pressure | MFC-Controlled |
| Quartz Tube Dimensions | OD 50 mm × ID 46 mm × L 1200 mm |
| Heating Zone | Ø60 mm × L260 mm |
| Max Temperature | 1200 °C |
| Usable Temp Range | 400–1100 °C |
| Temperature Control | Programmable PID |
| Gas Channels | 3 (hydrocarbon, H₂, Ar) |
| Vacuum Pump | Rotary Vane, 20 L/min |
| Sample Temperature Monitoring | Direct Thermocouple |
| Cooling Mechanism | Manual 300 mm Sliding Furnace |
| Overall Dimensions | W1400 × H1000 × D500 mm |
| Brand | Microphase |
|---|---|
| Origin | Japan |
| Model | MPCNT-Basic |
| Price Range | USD 30,000–40,000 |
| Heating Method | Hot-Wall |
| Base Vacuum Level | Low Vacuum (10⁻¹–10⁰ Pa) |
| Operating Pressure | Adjustable |
| Carbon Sources | Ethanol (liquid), other carbon-bearing liquids (e.g., bioethanol, methanol) or gaseous hydrocarbons |
| Deposited CNT Morphologies | Powder CNTs, fiber-type CNTs (o-fiber), coil-type CNTs (o-coil), and continuous film-type CNTs |
| Substrate Compatibility | Si, quartz, alumina, stainless steel, Ti, Pt, NiCu alloys, and other catalytically active or inert substrates |
| Temperature Range | 400–800 °C with real-time monitoring |
| Catalyst Requirement | In-situ catalytic activation via ethanol’s inherent reducing capability — no pre-deposited catalyst layer or external H₂ required |
| Brand | Anric |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AT |
| Substrate Size | 4–6 inch |
| Process Temperature Range | RT to 350 °C |
| Precursor Channels | 5 |
| Weight | 50–70 kg |
| Dimensions (W × H × D) | 50 cm × 75 cm × 75 cm |
| Thickness Uniformity | ±1% |
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