Other Semiconductor Industry Instruments
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| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Imported |
| Model | L9570-01 |
| Pricing | Available Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer | Hamamatsu Photonics K.K. |
| Type | Imported |
| Model | C15740-01 |
| Wafer Sizes Supported | 100 mm (4″) or 150 mm (6″) |
| Measurement Time | ~12 min (4″ wafer, 10× objective, PL mode) |
| PL Wavelength Range | R/G/B channels |
| Spatial Resolution | 1 µm/pixel (standard), 0.5 µm/pixel (high-res mode) |
| Measured Parameters | Shape defects, PL intensity distribution, PL peak wavelength mapping |
| Dimensions | 2000 mm (W) × 1878 mm (H) × 1130 mm (D) |
| Weight | ~1800 kg |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer | Hamamatsu Photonics K.K. |
| Type | Imported Instrument |
| Model | C15765-01 |
| Pricing | Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | THEMOS mini |
| Pricing | Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | μAMOS |
| Pricing | Upon Request |
| Laser Wavelength | 1.3 µm (standard), optional 1.1 µm pulsed or high-power 1.3 µm (>400 mW) |
| Spatial Resolution (Backside Imaging) | ≤0.26 µm (with 100× HR NIR objective) |
| Detection Method | Lock-in Amplified OBIRCH (Optical Beam Induced Resistance Change) |
| Voltage/Current Biasing | 4-Quadrant ±10 mV–±10 V / ±100 mA |
| Sample Compatibility | 200 mm / 300 mm wafers (front/backside), diced dies, packaged ICs with polished backside, EPI-substrates |
| Vacuum Requirement | ≥80 kPa |
| Compressed Air | 0.5–0.7 MPa |
| Power Supply | AC 220 V, 50/60 Hz, ~3000 W |
| Main Unit Dimensions | 1360 × 1410 × 2120 mm (W×D×H), ~900 kg |
| Control Console | 880 × 700 × 1542 mm, ~255 kg |
| Brand | HORIBA |
|---|---|
| Origin | Japan |
| Model | GA-370 |
| Measurable Gases | CO, CO₂, CH₄ |
| Background Gases | N₂, O₂, He, Ar, H₂, Air |
| Measurement Principle | Dual-beam Non-Dispersive Infrared (NDIR) with Alternating Flow Modulation |
| Detection Limit (2σ) | 10 ppb |
| Range | 0–1/2/5/10 ppm |
| Repeatability | ≤ ±2% F.S. |
| Linearity | ≤ ±2% F.S. |
| Zero Drift | ≤ ±0.02 ppm/day, ≤ ±0.03 ppm/week |
| Span Drift | ≤ ±2% F.S./day, ≤ ±3% F.S./week |
| Response Time (T90) | ≤ 180 s |
| Sample & Reference Flow Rate | ~3.5 L/min each (at 50–100 kPa) |
| Analog Outputs | Up to two isolated outputs (0–1 V, 0–10 V, 0–16 mA, 4–20 mA, or 0–20 mA) |
| Operating Temperature | 0–40 °C |
| Humidity | ≤ 85% RH (non-condensing) |
| Vibration Tolerance | ≤ 0.29 m/s² at ≤ 100 Hz |
| Dimensions (W×H×D) | 430 × 221 × 555 mm (including protrusions) |
| Weight | ~18 kg |
| Power Supply | 100–240 V AC, ±10%, max. 250 V |
| Brand | inTEST–Temptronic |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Import |
| Model | Custom-Configurable Platform |
| Pricing | Available Upon Request |
| Brand | McScience |
|---|---|
| Origin | South Korea |
| Model | K5000 |
| Category | Imported Semiconductor Inspection Instrument |
| Supplier Type | Authorized Distributor |
| Pricing | Available Upon Request |
| Brand | KLA |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | P7 |
| Price | USD 70,000 (FOB Shenzhen) |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | CS10 / CS20 |
| Detection Sensitivity | 80 nm particles |
| Sample Size Support | 2–8 inch wafers (standard), customizable fixtures |
| Operation Modes | Manual (CS10) / Automated Transport (CS20) |
| Optical Channels | 4-channel detection (scattered light, reflected light, phase shift, Z-height) |
| Environmental Class | ISO Class 4 (10 cleanroom equivalent) |
| Compliance | Designed for semiconductor fab environments |
| Software | Integrated defect classification, statistical distribution mapping, root-cause traceability, and automated pass/fail reporting |
| Brand | Klocke Nanotechnik |
|---|---|
| Origin | Germany |
| Model | Micro Production |
| Type | Precision Nanomanipulation & 3D Coordinate Metrology Platform |
| Application Domain | Semiconductor Process Development, In-situ SEM/TEM Nanomanipulation, MEMS/NEMS Characterization, Nanofabrication Integration |
| Compliance | Designed for ISO 14644-1 Class 5 cleanroom environments |
| Positioning Resolution | Sub-nanometer (≤1 nm) in X/Y/Z |
| Force Sensing Capability | Integrated piezoresistive microforce feedback (mN range) |
| Vacuum Compatibility | Fully compatible with high-vacuum SEM/TEM chambers (10⁻⁷ mbar and below) |
| Interface | Standardized flange mounts (CF, KF, or custom) for JEOL, Zeiss, Thermo Fisher (FEI), Hitachi, TESCAN, and Raith systems |
| Brand | MicroChem |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Semiconductor Photoresist |
| Model | KMPR 1000 Series |
| Pricing | Available Upon Request |
| Developer Compatibility | PGMEA or TMAH aqueous solutions |
| Film Thickness Range | 2–75 µm (single spin-coat up to 100 µm) |
| Aspect Ratio | >5:1 |
| Adhesion | Enhanced metal adhesion |
| Stability | High electroplating bath compatibility |
| Cracking Resistance | Reduced thermal cracking tendency |
| Application Modes | Temporary or permanent patterning |
| Storage Temperature | –10 °C |
| Brand | Kaufman & Robinson, Inc. (KRI) |
|---|---|
| Origin | USA |
| Model | EH 3000 HC |
| Discharge Voltage/Current | 50–300 V / up to 20 A |
| Beam Divergence (HWHM) | >45° |
| Cooling | Water-cooled |
| Compatible Gases | Ar, Xe, Kr, O₂, N₂ |
| Dimensions | Ø9.7" × H6" |
| Application | IBAD for high-density, uniform optical thin-film deposition |
| Brand | Kaufman & Robinson, Inc. |
|---|---|
| Origin | USA |
| Model | eH 400 |
| Discharge Voltage Range | 40–300 V DC |
| Discharge Current | Up to 5 A |
| Beam Diameter | ~4 cm |
| Beam Divergence (HWHM) | >45° |
| Anode Configuration | Modular, Grooved or Standard |
| Cooling | Water-Cooled Front Plate |
| Dimensions (D×H) | 3.7″ × 3.0″ |
| Operating Gases | Ar, Xe, Kr, O₂, N₂, Organic Precursors |
| Mounting Distance | 6–30″ |
| Gas Control Channels | 4 (programmable) |
| Compatible Vacuum Environments | Load-Lock & UHV Systems |
| Applications | Ion-Assisted Deposition (IAD), In-Situ Pre-Cleaning, Low-Energy Etching (≤300 eV), III-V Semiconductor Processing, Polymer Substrate Treatment |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | KDC Series (KDC-10, KDC-40, KDC-75, KDC-100, KDC-160) |
| Beam Current | >10–650 mA |
| Acceleration Voltage | 100–1200 V |
| Grid Diameter | 1–16 cm Φ |
| Operating Gases | Ar, Kr, Xe, O₂, N₂, H₂ |
| Typical Chamber Pressure | < 0.5 mTorr |
| Beam Modes | Focused, Parallel, Divergent |
| Gas Flow Rate | 1–30 sccm |
| Dimensions (L × D) | 11.5–25.2 cm × 4–23.2 cm |
| Brand | KRI (Kimball Physics / Kaufman Research Institute) |
|---|---|
| Origin | USA |
| Model | KDC 100 |
| Ion Energy Range | 100–1200 eV |
| Max Ion Current | >400 mA |
| Grid Diameter | 12 cm |
| Cathode Configuration | Dual Filament |
| Magnetic Confinement | DC |
| Anode Voltage | 0–100 V DC |
| Neutralizer Options | Sidewinder Filament, LFN-2000, or standard filament |
| Beam Profile | Parallel or Divergent |
| Mounting | Quick-Release or Movable Flange |
| Operating Gas Compatibility | Inert (Ar, Xe), Reactive (O₂, N₂, CF₄), and Mixed Gases |
| Recommended Source-to-Substrate Distance | 8–36 inches |
| Gas Control Channels | Up to 4 independently regulated gas inlets |
| Optional | Motorized Tilt Mount for Beam Angle Adjustment |
| Compliance | Designed for integration into UHV and HV vacuum systems (≤1×10⁻⁷ Torr base pressure) |
| Brand | KRI (Kaufman & Robinson, Inc.) |
|---|---|
| Origin | USA |
| Model | KDC Series (KDC-10, KDC-40, KDC-75, KDC-100, KDC-160) |
| Ion Extraction Aperture Diameter | 1 cm to 16 cm |
| Beam Voltage (Vb) | Up to 1000 V DC |
| Beam Current (Ib) | Up to 84 mA |
| Acceleration Voltage (Va) | −200 V DC |
| Operating Gas | Argon (Ar) |
| Confinement | DC Magnetic Confinement |
| Cathode | Thermionic Filament |
| Anode Voltage | 0–100 V DC |
| Grid Type | Dedicated Self-Aligning Grid |
| Compliance | Designed for integration into IBF systems compliant with ISO 10110-7 (optical surface form), SEMI F26 (silicon wafer processing), and GLP-aligned vacuum process environments |
| Brand | Kaufman & Robinson, Inc. |
|---|---|
| Origin | USA |
| Model | RFICP 140 |
| Anode RF Power | 1 kW (1.8 MHz) |
| Ion Beam Energy | 100–1200 eV |
| Max. Ion Current | >500 mA |
| Gas Compatibility | Ar, O₂, N₂, others |
| Gas Flow Rate | 5–40 sccm |
| Operating Pressure | <0.5 mTorr |
| Beam Aperture | 14 cm Ø |
| Grid Material | Molybdenum / Graphite |
| Beam Optics | OptiBeam™ self-aligning ion optics |
| Neutralizer | LFN 2000 |
| Dimensions | 25.1 cm H × 24.6 cm D |
| Flange | 12" CF |
| Brand | LAUDA |
|---|---|
| Origin | Germany |
| Model | IN250XTW |
| Temperature Range | -45 °C to +220 °C |
| Heating Power | 3.5 kW |
| Refrigeration Capacity (at 20 °C) | 2.1 kW |
| Max. Flow Rate / Pump Pressure | 65 L/min / 3.1 bar |
| Bath Volume | 2.5–8.7 L |
| Dimensions (W×D×H) | 430 × 550 × 760 mm |
| Compliance | DIN EN 61010-1 |
| Brand | Laurell |
|---|---|
| Origin | USA |
| Model | WS-650Mz-23N |
| Maximum Speed | 12,000 rpm |
| Acceleration | 0–12,000 rpm/sec |
| Speed Accuracy | ≤ ±1 rpm (NIST-traceable) |
| Speed Stability | < ±1% |
| Time Resolution | 0.1 sec (1–5999.9 sec/step) |
| Chuck Compatibility | Ø10–150 mm wafers or 125×125 mm square substrates |
| Chamber Diameter | 9.5 in (241 mm) |
| Controller | PLC-based with SPIN3000 software integration |
| Construction Material | NPP (Natural Polypropylene) |
| Programmability | 20 stored recipes, up to 51 steps per recipe |
| Vacuum System | Oil-free pump, 220–240 VAC, 50/60 Hz |
| Leveling | Included NIST-calibrated digital level |
| Origin | Japan |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | LBC-1 |
| Price Range | USD 110,000 – 138,000 |
| Laser Wavelength | 532 nm (Green) |
| Laser Power Output | 10 mW |
| Beam Stability | ±2% |
| Spot Size | Ø100 µm |
| Maximum Scan Area | 50 mm × 50 mm (X-Y Stage Travel: ±30 mm) |
| Photocurrent Measurement Range | 10 pA – 1 A (Keithley Model 2401) |
| Irradiation Configuration | Top-side or Bottom-side (Optional) |
| Brand | Leica |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | DM3 XL |
| Pricing | Upon Request |
| Brand | Linkam |
|---|---|
| Origin | United Kingdom |
| Model | LTS420E-P |
| Temperature Range | Ambient to +420 °C (with optional cryogenic cooling to −196 °C) |
| Electrode Configuration | Integrated dual-electrode system |
| Temperature Control Accuracy | ±0.01 °C |
| Temperature Stability | <0.01 °C |
| Optical Aperture Diameter | 2.4 mm |
| Sample Translation Range (X–Y) | 15 × 15 mm |
| Active Sample Area | 53.5 × 43 mm |
| Compatible Substrates | Standard 76 × 26 mm microscope slides or φ16 mm coverslips |
| Heating Rate | 0.1–50 °C/min |
| Minimum Working Distance (Objective/Condenser) | 6.0 mm / 13.2 mm |
| Stage Dimensions | 160 × 80 × 24 mm |
| Brand | Lumina |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | AT Series (AT1, AT1-Auto, AT2, AT2-EFEM) |
| Pricing | Available Upon Request |
| Brand | McScience |
|---|---|
| Origin | South Korea |
| Model | M6000 PIXX |
| Device Type | Imaging-Based Electroluminescence Degradation Analyzer |
| Application Domain | Perovskite LED, OLED, QLED, Flexible Optoelectronic Devices, Inkjet-Printed Emissive Layer Development |
| Compliance Context | Designed for GLP-compliant lifetime testing workflows |
| Software Architecture | Windows-based acquisition and spatiotemporal EL intensity mapping platform |
| Brand | McScience |
|---|---|
| Origin | South Korea |
| Model | M6204 |
| Type | Import Instrument |
| Distribution Channel | Authorized Distributor |
| Pricing | Upon Request |
| Brand | MCC |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported |
| Model | HPB-4 |
| Pricing | Available Upon Request |
| Brand | MCC |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | HPB-5B |
| Pricing | Available Upon Request |
| Cooling Method | Forced Air with Precision Thermal Valves |
| Heating Mechanism | Integrated Heat-Sink Heaters |
| Max Power per DUT | 150 W |
| I/O Channels | 128 Independent |
| Vector Depth | Up to 32 M |
| Scan Memory | >1 GB |
| Repetition Rate | 10 MHz |
| Clock Speed | 400 MHz |
| Timing Resolution | 1 ns |
| Temperature Control | Per-DUT, Real-Time Monitoring & Closed-Loop Adjustment |
| Brand | MCC |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | LC-2 |
| Pricing | Upon Request |
| Board Dimensions | 317 mm × 609 mm (12.5″ × 24″) |
| Max Boards per System | 64 |
| Power per Board | Up to 400 W |
| Current per Board | Up to 240 A |
| I/O Channels | 128 independent |
| Vector Depth | Up to 4 M (upgradable) |
| Clock Resolution | 10 ns |
| Maximum Clock Frequency | 200 MHz |
| Max Device Power per Socket | 20 W |
| Concurrent Device Capacity | 1,536 devices |
| Thermal Control | Individual Chip Temperature Control (ICTC) via Pneumatic Cooling Valves and Heatsink-Based Resistive Heating |
| Brand | McScience |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | K3300PLX |
| Pricing | Available Upon Request |