Electron Microscope
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| Brand | VitroTEM |
|---|---|
| Origin | Netherlands |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Naiad |
| Pricing | Available Upon Request |
| Brand | Nano analytik |
|---|---|
| Origin | Germany |
| Model | AFM Series (SmartProbe Platform) |
| Instrument Type | Atomic Force Microscope |
| Vertical Position Detection Noise | 0.01 nm RMS |
| Maximum Sample Diameter | ≤10 cm |
| Scanner Range (Adeona) | 15 µm × 15 µm × 4 µm |
| Dimensions (Vacuum-Compatible Version) | 140 mm × 100 mm × 60 mm |
| Integrated Actuation & Sensing | Piezoresistive readout + bimaterial excitation on SmartProbe |
| XYZ Nanopositioning Range (Vacuum Variant) | 20 µm × 10 µm × 10 µm |
| Brand | Nano analytik |
|---|---|
| Origin | Germany |
| Model | SPL |
| Instrument Type | Atomic Force Microscope-based Scanning Probe Lithography System |
| Positioning Detection Noise | 0.01 nm (X, Y, Z) |
| Maximum Sample Diameter | 150 mm (6 in) |
| Stage Travel Range | 18 mm × 18 mm (expandable to 150 mm × 150 mm) |
| Minimum Feature Size | 5 nm (verified) |
| Direct-Write Speed | 300 µm/s |
| Overlay Accuracy | < 7 nm |
| Stitching Accuracy | < 10 nm |
| Maximum Writing Area per Field | 200 µm × 200 µm |
| Footprint | 80 cm × 100 cm × 190 cm |
| AFM Imaging Range | 10 µm × 10 µm × 5 µm (expandable to 200 µm × 200 µm) |
| Vertical RMS Noise | 0.01 nm |
| Closed-Loop Scan Linearity | 99.7% |
| Real-Time FPGA Feedback Bandwidth | 8 MHz |
| Data Acquisition Resolution | 16-bit (amplitude/phase) |
| Output Formats | BMP, PNG, JPG, TXT |
| Brand | NanoMagnetics |
|---|---|
| Origin | United Kingdom |
| Model | ezAFM |
| Instrument Type | Material-Grade AFM |
| Position Detection Noise | 75 fm/√Hz |
| Maximum Sample Dimensions | 10 × 10 × 5 mm |
| XY Stage Travel Range | 38 × 38 mm |
| Scan Areas | 120 × 120 × 40 µm (Z resolution: 0.2 nm) or 40 × 40 × 4 µm (Z resolution: 0.02 nm) |
| Lateral Resolution | 16 nm (large scan) / 5 nm (high-res scan) |
| Optical View System | Full HD CCD, 2 µm resolution, 390 × 230 µm FOV, 2516 × 1960 pixels, 30 fps |
| Controller | 24-bit ADC/DAC, FPGA/DSP-based digital feedback |
| Standard Imaging Modes | Contact, Tapping, Phase, LFM, MFM |
| Extended Modes (ezAFM+) | EFM, KPFM, C-AFM, SSRM, PRFM, FMM, nanomechanical mapping, liquid-phase, vacuum-compatible configurations |
| Brand | NanoMEGAS |
|---|---|
| Origin | Belgium |
| Model | ADT-3D |
| Compatible TEM Voltage | 120–300 kV |
| Compatible Sources | LaB6, W, FEG |
| Minimum Crystal Size (Organic) | ~100 nm |
| Minimum Crystal Size (Inorganic) | ~20 nm |
| Tilt Range (Cell Parameter Determination) | −15° to +15°, 1° step |
| Recommended Tilt Range (Structure Solution) | −45° to +45°, 1° step or continuous rotation (MicroED) |
| Data Acquisition Modes | Manual or automated PED |
| Detector Compatibility | CCD cameras ≥1k × 1k resolution |
| Sample Holder Support | Single-tilt, tomography, cryo holders |
| Output | 3D reciprocal space reconstruction, unit cell parameters (2–5% error), space group assignment, integrated 3D reflection intensities |
| Compliance | Fully compatible with standard TEM workflows under GLP-aligned data handling practices |
| Brand | NanoMEGAS |
|---|---|
| Origin | Belgium |
| Model | ASTAR® |
| Compatibility | 120–300 kV TEM (including Cs-corrected FEG-TEM) |
| Spatial Resolution | 1–4 nm (FEG-TEM), <10 nm (LaB₆ TEM) |
| Acquisition Speed | Up to >1000 fps (with direct electron detectors) |
| PED Tilt Angle Range | 0.2°–2.5° |
| Output Data Types | Orientation Maps, Phase Maps, Correlation Index, Confidence Index, Virtual BF/DF Images, Grain Boundary Networks, Pole Figures, Strain-Compatible Integration (with TopSPIN) |
| Compliance | Fully compatible with GLP/GMP workflows requiring audit trails |
| Brand | NanoMEGAS |
|---|---|
| Origin | Imported (Non-China) |
| Manufacturer Type | Authorized Distributor |
| Model | DigiSTAR |
| Pricing | Upon Request |
| Brand | NanoMEGAS |
|---|---|
| Origin | Belgium |
| Model | TopSPIN STRAIN |
| Application | Automated High-Resolution Strain Mapping in Scanning Transmission Electron Microscopy (STEM) using 4D Scanning Precession Electron Diffraction (4D-SPED) |
| Spatial Resolution | 2–3 nm (FEG-TEM) |
| Strain Sensitivity | < 2 × 10⁻⁴ |
| Typical Acquisition Time | 5–10 min (150 × 150 pixels) |
| Pixel Dwell Time | 10–40 ms |
| Strain Quantification Accuracy | ±0.02% (at 200 kV FEG-TEM) |
| Analysis Engine | AppFive proprietary algorithm |
| Output Modalities | Point, line, and 2D strain tensor maps (εₓₓ, ε_zz, ε_xz), orientation/phase/strain/STEM co-registration |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | Academia |
| Instrument Type | Materials-Focused AFM |
| Primary Technique | Combined Scanning Probe Microscopy (SPM) with Integrated Near-Field Optical & Raman Capabilities |
| Scan Range | XY = 70 µm, Z = 5 µm (optional 10 µm scanner) |
| Positional Resolution | <1 nm (70 µm scanner), <0.1 nm (10 µm scanner) |
| Max Sample Size | 15 mm × 15 mm |
| Detection Method | Optical Beam Deflection |
| Operational Modes | Contact, Non-Contact, Tapping |
| Probe Compatibility | Nanonics glass probes, electro-thermal probes, NanoFountainPen™, and standard commercial SPM cantilevers |
| Software Platform | LabVIEW-based modular architecture with user-customizable modules |
| Compliance Ready | Designed for GLP/GMP-aligned workflows |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | CryoView4000 |
| Z-positioning noise | <0.2 nm |
| Sample diameter | <100 mm |
| Sample thickness | <30 mm |
| Sample stage travel range | 80 µm × 80 µm × 70 µm |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView 2500 |
| Instrument Type | Hybrid SNOM/AFM System |
| Detection Noise (Positional) | 0.2 nm |
| Sample Size Capacity | 6 mm diameter |
| XYZ Scan Range per Stage | >80 µm |
| Dual-Stage Architecture | Probe Stage + Sample Stage |
| Feedback Mechanism | Tuning Fork (TF)-Based AFM |
| Optical Compatibility | Mid-IR to THz spectral range |
| Illumination/Collection Flexibility | Top-, Side-, and Bottom-Optical Access |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView1000 |
| Instrument Type | Material-Focused AFM |
| Positional Noise | XY < 20 nm |
| Max Sample Diameter | < 100 mm |
| Max Sample Thickness | < 15 mm |
| Stage Travel Range | 85 µm × 85 µm |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView2000 |
| Instrument Type | Materials-Focused AFM/NSOM Hybrid System |
| Scan Mode | Tip Scanning |
| XY Resolution | <5 nm |
| Z Resolution | <1 nm |
| XY Scan Range | 70 µm (standard), optional 30 µm and 10 µm scanners |
| Z Scan Range | 70–120 µm |
| XY Step Size | <1 nm (70 µm scanner), <0.1 nm (10 µm scanner) |
| Scanner Thickness | 7 mm |
| Scanner Mass | 75 g |
| Max Sample Radius | 16 mm (customizable) |
| Probe Compatibility | Full commercial SPM probe interoperability including NSOM, conductive AFM, hollow probes, insulated nanowire sensors, dual-wire glass-insulated probes, low-k modulus probes, and deep-trench AFM probes |
| Operational Modes | NSOM reflection/transmission/collection/near-field fluorescence/PL |
| Controller | Nanonics Analog Controller with NT software (Windows 95/98/XP compatible) |
| Environmental Capabilities | Cryogenic operation down to 4 K (liquid helium), UHV compatibility, integrated gas/liquid delivery, in situ reaction chamber, co-located optical microscopy and micro-Raman coupling |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MultiView4000 |
| Instrument Type | Material-Focused AFM |
| Positioning Noise | XY < 20 nm |
| Sample Dimensions | Ø < 100 mm |
| Stage Travel Range | 170 µm × 170 µm |
| XY Resolution | < 5 nm |
| Z Resolution | < 1 nm |
| Scan Range (Combined Piezo + Sample Scanner) | up to 160 µm (XY) |
| Minimum Step Size | < 0.1 nm (10 µm scanner) |
| Scanner Thickness | 7 mm |
| Mass | 75 g |
| Probe Compatibility | Commercial SPM, NSOM, conductive, hollow, insulated glass nanowire, dual-wire, low-k AFM, deep-trench AFM probes |
| Operating Modes | NSOM reflection/transmission/collection/fluorescence/PL |
| Brand | Nanonics |
|---|---|
| Model | MV1000 / MV2000 / MV4000 |
| Instrument Type | AFM-Integrated Scanning Electrochemical Microscope |
| Z-Positioning Noise | 0.2 nm |
| Sample Diameter | < 6 mm |
| XYZ Scan Range | 80 µm × 80 µm × 80 µm |
| Probe | Hollow glass nanopipette with Pt nanowire electrode (50–100 nm tip diameter) |
| Electrochemical Control | Bipotentiostat (±10 V, ±0.25 A), current sensitivity: 10⁻¹²–0.1 A/V |
| Compatible Electrodes | Up to four side-mounted or back-contacted reference/counter electrodes (e.g., Ag/AgCl) |
| Liquid Cell Material | PEEK |
| Optical Access | Fully open top and bottom optical pathways |
| Environmental Options | Optional inert-gas chamber (N₂/Ar) |
| Software Compliance | Supports audit trail, user access control, and data integrity per FDA 21 CFR Part 11 requirements |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Manufacturer Type | OEM Manufacturer |
| Origin Category | Imported |
| Model | MV2000 |
| Instrument Type | Materials-Focused Hybrid SPM Platform |
| Positional Detection Noise | 0.2 nm (RMS) |
| Maximum Sample Size | 6 mm (standard) |
| Sample Stage Scan Range | 80 µm × 80 µm × 80 µm (XYZ) |
| Z-Direction Resolution | < 0.05 nm (RMS) |
| XY Lateral Resolution (AFM) | < 0.15 nm |
| Near-Field Optical Resolution | ≤ 50 nm (aperture-limited) |
| Far-Field Optical Resolution | ~500 nm (non-confocal), ~200 nm (confocal) |
| Thermal Imaging Resolution | ≥ 100 nm |
| Electrical Resistance Mapping Resolution | ≥ 25 nm |
| Operating Temperature Range (Thermal Probes) | Up to 300 °C |
| Feedback Mechanism | Tuning Fork (standard), Laser Reflectance (optional) |
| Probe Compatibility | Glass fiber NSOM probes (patented bent-cantilever design), commercial Si/SiN AFM probes, custom multi-functional probes (optical/thermal/electrical/Raman-enhancing) |
| Brand | Nanonics |
|---|---|
| Origin | Israel |
| Model | MV4000 |
| Instrument Type | Material-Focused Hybrid Correlative Microscope |
| Positional Detection Noise | 0.2 nm |
| Maximum Sample Diameter | <100 mm |
| Maximum Sample Thickness | <15 mm |
| Sample Stage Travel Range | 85 × 85 × 85 µm |
| Brand | Nanonics |
|---|---|
| Origin | Imported (Non-Chinese) |
| Model | NSOM |
| Instrument Type | Materials-Focused SPM Platform |
| Core Function | Scanning Near-Field Optical Microscopy (SNOM/NSOM) with Integrated AFM, Thermal, Electrical, and Raman Capabilities |
| Optical Resolution | ≤50 nm (near-field), 200 nm (confocal), diffraction-limited (far-field) |
| Scan Range | Up to 160 µm (XYZ, dual-probe configuration) |
| Z-Resolution | < 0.02 nm (XY), < 0.05 nm (Z, RMS) |
| Probe Types | Patented glass-fiber probes (metal-coated, hollow, TERS-optimized), compatible with commercial Si cantilevers |
| Feedback | Tuning fork (standard), laser reflection (optional) |
| Detector Compatibility | APD, PMT, InGaAs, CCD, spectrometers |
| Laser Range | Deep UV to NIR |
| Thermal Sensitivity | 0.01 °C |
| Electrical Resolution | < 25 nm (resistive imaging) |
| Max Z-Depth | 140 µm |
| Multi-Probe Support | Up to 4 independently controlled probes |
| Compliance | Designed for GLP/GMP-aligned workflows |
| Brand | Nanosensors (distributed by SHNTI) |
|---|---|
| Origin | Switzerland |
| Probe Type | Tapping Mode AFM Cantilevers |
| Substrate Material | Boron-Doped Silicon (5×10²⁰/cm³) |
| Substrate Dimensions | 1.6 mm × 3.6 mm × 0.4 mm |
| Reflective Coating | Au (3× reflectivity vs. uncoated) |
| Tip Radius | ≤10 nm (SEM-verified, S-series option available) |
| Tip Height | 10–15 µm |
| Cantilevers per Chip | 2 rectangular beams |
| Aspect Ratio | 3:1 |
| Half-Angle | ≤22° |
| Conductive Coating Options | TiN, W₂C, Pt, Au |
| Compatibility | Universal SPM platforms (Bruker, Keysight, Park Systems, NT-MDT, etc.) |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | FLEX-AFM |
| Instrument Type | Atomic Force Microscope |
| XY Positioning Noise | ≤ 0.15 nm (RMS, in air & liquid) |
| Sample Dimensions | Ø ≤ 100 mm, Thickness ≤ 5 mm |
| Sample Stage Travel Range | 300 mm × 300 mm |
| Scan Range | 100 µm × 100 µm × 10 µm (XY × Z) |
| XY Drive Resolution | 0.152 nm |
| Z Drive Resolution | 0.046 nm |
| Minimum Z Noise Floor | 0.15 nm (RMS, closed-loop) |
| Compatible Environments | Ambient air, liquid, controlled atmosphere (e.g., inert gas, low-oxygen), temperature-controlled stages |
| Controller | C3000 (24-bit, dual-channel lock-in amplifiers, digital feedback) |
| Optical Integration | Fully compatible with inverted optical microscopes |
| Modular Add-ons | ECS 204 electrochemical stage, ATS 204 automated translation stage, Isostage active vibration isolation, acoustic enclosure, glovebox integration kit |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | FlexAFM |
| Instrument Type | Material-Focused AFM |
| Position Detection Noise | <35 pm |
| Maximum Sample Diameter | ≤120 mm |
| Control Electronics | C3000i (24-bit), upgradeable to CX (28-bit) |
| Software | Nanosurf Software Suite |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments, supports GLP/GMP audit trails via optional software modules |
| Brand | Nanosurf |
|---|---|
| Origin | Switzerland |
| Model | Naio STM |
| Position Detection Noise | 0.15 nm |
| Sample Area | 500 nm × 500 nm |
| XY Scan Range | 500 nm × 500 nm |
| XY Resolution | 7.6 pm |
| Z Scan Range | 200 nm |
| Z Resolution | 3 pm |
| Maximum Tunneling Current | 100 nA |
| Sample Stage Diameter | 10 mm |
| Max Sample Thickness | 3 mm |
| Imaging Modes | Constant-Current & Constant-Height |
| Spectroscopy Modes | I–V, I–z |
| Max Image Pixels | 2048 × 2048 |
| Max Spectral Points | 32768 |
| XY Tilt Compensation | Hardware-based |
| Interface | USB 2.0 |
| Dimensions | 204 mm × 204 mm × 104 mm |
| Weight | 3.45 kg |
| Brand | Narishige |
|---|---|
| Origin | Japan |
| Model | JCM-7000 |
| Instrument Type | Desktop SEM |
| Magnification Range | 10×–100,000× (print output: 128 mm × 96 mm) |
| 24×–202,168× (on-screen display | 280 mm × 210 mm) |
| Accelerating Voltage | 5 kV, 10 kV, or 15 kV (software-selectable constant-voltage mode) |
| BSE Image Resolution | Not specified (system optimized for compositional and topographic contrast) |
| Specimen Dimensions | Ø80 mm × 50 mm (without stage夹具) |
| Detector Types | Everhart-Thornley secondary electron detector |
| Stage Motion | Motorized X/Y = ±40 mm each |
| Tilt | −15° to +45° |
| Rotation | 360° continuous |
| Vacuum Modes | High Vacuum (HV) and Low Vacuum (LV) |
| Operating System | Windows 10 |
| Data Formats | TIFF, BMP, JPEG, PNG (still) |
| Electron Source | Tungsten filament with integrated Wehnelt cap |
| Brand | NCS |
|---|---|
| Origin | Beijing, China |
| Manufacturer Type | Direct Manufacturer |
| Product Category | Domestic |
| Model | FE-1050 Series |
| Instrument Form Factor | Floor-Standing |
| Electron Gun Type | Thermal Field Emission |
| Secondary Electron (SE) Resolution | 1.5 nm @ 1 kV, 0.9 nm @ 15 kV |
| Magnification Range | 10× to 1,000,000× |
| Accelerating Voltage | 0.02–30 kV |
| Backscattered Electron (BSE) Resolution | 2.5 nm @ 1 kV, 1.5 nm @ 15 kV |
| Sample Chamber Port Count | 27 |
| Stage Motion | 5-Axis Motorized (X = 140 mm, Y = 140 mm, Z = 60 mm, Rotation = 360°, Tilt = −10° to +80°) |
| Standard Detectors | In-Column SE Detector, Everhart-Thornley SE Detector, Optional Insertable BSE Detector, Optional STEM Detector, Triple-Channel IR CCD Chamber Monitoring System |
| Origin | Czech Republic |
|---|---|
| Manufacturer Type | Distributor |
| Origin Category | Imported |
| Model | LiteScope |
| Price Range | USD 65,000–130,000 |
| Instrument Type | Atomic Force Microscope |
| Positional Detection Noise | AFM-in-SEM Integration |
| Sample Dimensions | In-situ AFM-compatible |
| Stage Travel Range | 100 × 100 × 100 µm |
| Brand | NIKON |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | JCM-7000 |
| Instrument Type | Desktop SEM |
| Electron Gun | Tungsten Filament |
| SEM Class | Entry-Level Tungsten-Filament SEM |
| Secondary Electron Image Resolution | 20 nm |
| Magnification Range | 10×–60,000× |
| Accelerating Voltages | 5 kV, 10 kV, 15 kV |
| Backscattered Electron Image Resolution | 20 nm |
| Vacuum Modes | High Vacuum & Low Vacuum |
| Sample Chamber Capacity | Ø ≥80 mm × H ≥50 mm |
| Motorized Stage Travel | X ≥40 mm, Y ≥40 mm |
| Detector Configuration | Secondary Electron Detector (SED) + Backscattered Electron Detector (BSED) |
| Imaging Modes | SE, BSE (compositional & topographic), Real-Time 3D Reconstruction |
| Dual-Channel Simultaneous Display | Yes |
| Image Storage Resolutions | 1280×960, 2560×1920, 5120×3840 pixels |
| Power Supply | AC 100–240 V, 50/60 Hz, ≤700 VA |
| Operating Temperature | 15–30 °C |
| Relative Humidity | 30–60 % RH (non-condensing) |
| Ground Resistance | <100 Ω |
| Brand | Norcada |
|---|---|
| Origin | Canada |
| Model | NHB-SNL |
| Price Range | USD $45,000–$95,000 |
| Application Domain | Energy Storage & Battery Research |
| Instrument Type | In Situ Heating & Electrical Biasing Holder |
| Maximum Pressure | 100 Pa (compatible with TEM/SEM vacuum environments) |
| Current Measurement Range | pA to nA (configurable controller-dependent) |
| Temperature Range | Up to 1100 °C (in situ heating) |
| Voltage Range | Up to 40 V DC |
| Fluid Compatibility | Sealed MEMS cell design enables stable liquid/gas phase operation under high vacuum (≤10⁻⁵ mbar) |
| Origin | Imported |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Model | Ntegra Spectra |
| Pricing | Available Upon Request |
| Brand | NT-MDT |
|---|---|
| Origin | Russia |
| Model | Solver Next |
| Instrument Type | Atomic Force Microscope |
| Z-direction Position Detection Noise | 0.02 nm (low-current mode) |
| Maximum Sample Dimensions | Ø ≤ 20 mm, Height ≤ 10 mm |
| XY Sample Stage Travel Range | 5 mm × 5 mm |
| Scan Range (Closed-loop) | 100 µm × 100 µm × 10 µm |
| Z-noise (RMS, 10–1000 Hz) | ≤ 0.04 nm (closed-loop), 0.02 nm (low-current mode) |
| XY Nonlinearity | ≤ 0.1% (closed-loop) |
| Video Microscope Resolution | 2 µm |
| Temperature Control Range | Room Temperature to 150 °C |
| Brand | NT-MDT |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | Solver P47-Pro |
| Pricing | Available Upon Request |
| Measurement Modes | STM, AFM (Contact/Tapping/Non-contact), LFM, Phase Imaging, Force Modulation, Force Spectroscopy, Adhesion Mapping, MFM, EFM, Kelvin Probe, SSRM, Nanoindentation, Voltage/Force Nanolithography |
| Scanning Configurations | Sample Scanning, Tip Scanning, Dual-Scan Option |
| Max Sample Size (Sample Scan) | Ø40 mm × 10 mm |
| XY Sample Positioning Range | 5 × 5 µm |
| Positioning Accuracy | ±5 µm |
| Environmental Operation | Ambient Air, Controlled Atmosphere, Liquid Cell Compatible |
| Temperature Control | Room Temperature to 130 °C |
| Optical System | Custom-Configurable |
| SPM Techniques Supported | >40 Quantitative Modes |