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| Brand | Nanoscribe |
|---|---|
| Country of Origin | Germany |
| Model | Professional GT2 |
| Laser Wavelength | 405 nm |
| Printing Resolution | < 1 µm |
| Maximum Structure Height | 10 mm |
| Build Chamber Dimensions | 120 mm × 70 mm |
| Pressure Control Range | −800 to +1000 mbar |
| Bidirectional XY Repeatability | < 500 nm |
| Printing Method | Two-Photon Polymerization (2PP) |
| Compatible Materials | Photoresists (e.g., IP-L, IP-S, OrmoComp), conductive nanocomposites, metal precursor-loaded resins |
| Functional Capabilities | Electrochemical deposition integration, 2D/3D hybrid patterning, sub-micrometer dose-controlled liquid dispensing, surface functionalization |
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