Empowering Scientific Discovery

Hongteng Quantum Technology (Shenzhen) Co., Ltd.

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BrandAxic
OriginFrance
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelSSDR400
Heating MethodHot-Wall
Application FieldSemiconductor & Advanced Materials
Deposition Rate1 µm/h (typical for diamond)
Base Vacuum1×10⁻⁶ mbar
Operating Pressure2–200 mbar
Chamber Internal Diameter6 inch (Ø152 mm)
Substrate StageØ158 mm with Z-axis motion
Microwave Frequency915 MHz
Max Microwave Power36 kW
Process Duration CapabilityUp to 500 h (continuous)
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BrandAxic
OriginFrance
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelSSDR150
Heating MethodHot-Wall
Application DomainSemiconductor
Deposition Rate1 nm/s (typical for diamond growth)
Base Vacuum1×10⁻⁶ mbar
Operating Pressure Range20–400 mbar
Chamber Internal Diameter6 inch (Ø152 mm)
Microwave Power6 kW @ 2.45 GHz
Substrate StageØ60 mm with Z-axis translation
Temperature ControlUp to 1200 °C (±2 °C stability)
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BrandPlasma-Therm
OriginUSA
Equipment TypeImported Semiconductor CVD System
ModelPECVD Series
Heating MethodHot-Wall
Application DomainSemiconductor Fabrication, MEMS, III-V & Wide-Bandgap Devices (GaAs, SiC, CPV), LED, SOI, TSV
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