Optical Measurement Instruments
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| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | PL3140 |
| Core Technology | Diode-Pumped Solid-State (DPSS) Mode-Locked Oscillator + Flashlamp-Pumped Regenerative & Linear Amplifier |
| Pulse Width | ≤10 ps (FWHM) |
| Wavelength | 1053 nm (fundamental), optionally frequency-doubled (526.5 nm), tripled (351 nm), or quadrupled (263.25 nm) |
| Pulse Energy | Up to 80 mJ @ 1053 nm |
| Repetition Rate | Up to 10 Hz |
| Timing Jitter | <10 ps RMS (pre-trigger output) |
| Harmonic Generation | Actively temperature-stabilized, angle-tuned KD*P/KDP crystals |
| Tunability | Optional OPG covering 210–2600 nm |
| Control Interface | USB (standard), RS232 (optional), LabVIEW™ drivers included |
| Energy Stability | <1.5% RMS (1053 nm, 100-shot average) |
| Energy Adjustment | 1–80 mJ in ~1% increments |
| Pre-Trigger Delay Range | 0–500 ns (0.25 ns step) |
| PRETRIG mode | 0–1000 µs (33 ns step) |
| Internal Energy Monitor | Real-time pulse-by-pulse measurement with analog/digital output |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Type | Diode-Pumped Solid-State (DPSS) Picosecond Laser System |
| Model | PL2210 / PL2140 / SL300 / PL2241 / PL1143 |
| Wavelengths | 1064 nm, 1054 nm, 532 nm, 355 nm, 266 nm, 213 nm |
| Pulse Width | 2–200 ps (model-dependent) |
| Repetition Rate | 3 Hz to 250 Hz |
| Pulse Energy | Up to 500 mJ @ 1064 nm |
| Cooling | Air-cooled |
| Harmonics | 2nd–4th harmonic generation optional |
| Stability | Energy stability < 1.5% RMS (short-term), < 1.0% RMS (long-term) |
| Synchronization | Low-jitter external trigger output available |
| Brand | Ekspla |
|---|---|
| Origin | Imported (Lithuania) |
| Model | PS1245CO |
| Cooling Capacity | 0.5–2 kW (selectable) |
| Max Coolant Flow Rate | 7 L/min |
| Max Operating Pressure | 3.5 bar |
| Coolant Temperature Range | 25–45°C (adjustable via 10-turn potentiometer) |
| Coolant Conductivity Requirement | 1–20 µS/cm (deionized/distilled water) |
| Cabinet Format | 19″ rack-mountable, 7U height |
| Integrated Functions | Real-time coolant temperature & level indication, overheat/low-pressure/low-level interlock protection, inline deionization & particulate filtration |
| Brand | Ekspla |
|---|---|
| Origin | Imported (Lithuania) |
| Manufacturer Type | Authorized Distributor |
| Model | PS5050 NL300D |
| Output Power | Up to 3.2 kJ/s (at 10 Hz) |
| Max. Peak Charge Rate | < 6.8 kJ/s |
| Charging Voltage Options | 1000 V / 1400 V / 1800 V |
| Pulse Repetition Rate | Up to 150 Hz |
| Output Voltage Regulation | ±0.1 % |
| Pulse-to-Pulse Stability | 0.1 % |
| Load Regulation | 0.1 % |
| Linearity | 0.2 % |
| Voltage Resolution | 1 V |
| Ignition Pulse Voltage | 16 kV (optional up to 30 kV) |
| Ignition Pulse Duration | > 1000 ns |
| Simmer Current | 0.6 A |
| Simmer Voltage | < 300 V |
| Striking Voltage | < 900 V |
| Max. Capacitance Supported (CPFN) | < 240 µF |
| Input Mains | Single-phase 230 V (−10%, +5%) or three-phase 380 V (−10%, +5%) |
| Power Consumption (avg./peak) | < 4 kW / < 6 kW |
| Operating Temperature | 0–40 °C |
| Humidity | 10–90 % RH (non-condensing) |
| Compliance | EN 61010-1, EN 55011 |
| Remote Interfaces | RS-232, CAN |
| Housing | 19" rack-mountable (standard 4U) |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | OEM Manufacturer (not distributor) |
| Product Type | Imported |
| Model | PT200 |
| Core Architecture | Diode-Pumped Solid-State (DPSS) Pump Laser + Integrated Picosecond Optical Parametric Oscillator (OPO) |
| Tuning Range | 690–3400 nm (standard), optional UV extension via SHG |
| Pulse Duration | 5 ps (PT257/PT259), 70 ps (PT277) |
| Repetition Rate | 1 MHz (PT259), 88 MHz (PT257/PT277) |
| Peak Power | Up to 5 kW |
| Beam Quality | M² ≤ 1.3 (nearly diffraction-limited) |
| Linewidth | <0.3 cm⁻¹ (FT-limited, PT277) |
| Output Monitoring | Optional integrated wavelength meter |
| Control Interface | USB (standard), RS232 (optional), LabVIEW™ drivers included |
| Compliance | CE-marked, RoHS-compliant, designed for GLP/GMP-adjacent research environments |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | OEM Manufacturer |
| Product Category | Imported Instrument |
| Model | PT277-XIR |
| Core Technology | Synchronously Pumped Optical Parametric Oscillator (OPO) with Diode-Pumped Solid-State (DPSS) Pump Laser |
| Tuning Range | 1405–2020 nm (signal), 2250–4400 nm (idler), 5000–16000 nm (mid-IR) |
| Spectral Linewidth | < 5 cm⁻¹ (full tuning range) |
| Pulse Repetition Rate | 87 MHz |
| Pulse Duration (pump) | ~8 ps |
| Output Power | >100 mW @ 2200–4000 nm |
| Beam Diameter (1/e²) | ~3 mm |
| Beam Divergence (full angle, FWHM) | < 5 mrad (signal) |
| Wavelength Tuning Resolution | 0.1 nm (signal), 1 nm (idler/mid-IR) |
| Control Interfaces | USB (virtual COM), RS232, LAN, optional WLAN |
| Remote Control Protocol | REST API compliant |
| Cooling | Active water-to-air chiller required |
| Operating Ambient | 22 ± 2 °C, ±1 °C stability, 20–80% RH (non-condensing) |
| Power Supply | 100–240 VAC, 50/60 Hz, <1 kVA |
| Cleanroom Class | ISO Class 9 or better |
| Brand | Ekspla |
|---|---|
| Origin | Imported |
| Model | PT403 |
| Output Wavelength Range | 210–2300 nm |
| Repetition Rate | 1 kHz |
| Pulse Width | 15 ps (typ.) |
| Linewidth | <8 cm⁻¹ |
| Beam Divergence | <2 mrad |
| Tuning Step (SH/Signal/Idler) | 0.05/0.1/1 nm |
| Compliance | CE, RoHS, IEC 60825-1 Class 4 Laser Product |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Scientific Laser System |
| Model | SL212 |
| Pulse Duration | <150 ps |
| Wavelength | 1064 nm (fundamental), with optional harmonic generation (532 nm, 355 nm, 266 nm) |
| Pulse Energy | Up to 250 mJ @ 1064 nm |
| Pumping Scheme | Diode-pumped Q-switched oscillator + flashlamp-pumped power amplifier |
| Pulse Contrast Ratio | High pre-pulse suppression (>10⁸:1 typical) |
| Thermal Stabilization | Active temperature control for harmonic generators |
| Control Interface | PC-based via USB/Ethernet, LabVIEW™ drivers included, front-panel keypad for remote operation |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported High-Energy Picosecond Laser System |
| Model | SL230 |
| Pulse Duration | 100 ps |
| Central Wavelength | 1064 nm (fundamental), with optional 532 nm, 355 nm, and 266 nm harmonics |
| Maximum Pulse Energy | 250 mJ @ 1064 nm |
| Repetition Rate | Up to 50 Hz |
| Pulse-to-Pulse Jitter (External Trigger) | < 0.2 ns RMS |
| Sync Pulse Jitter (Pre-trigger) | < 100 ps RMS |
| Harmonic Generation | Thermo-stabilized KD*P/KDP crystal-based, angle-tuned, with wavelength-separated output ports |
| Cooling | Water/Water heat exchanger integrated in 19″ rack-mount unit |
| Control Interface | USB-connected Windows® PC application + backlit remote keypad |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported High-Energy Picosecond Laser System |
| Model | SL330 |
| Pulse Energy | Up to 500 mJ @ 1064 nm |
| Pulse Duration | 150 ps (standard), tunable down to 170 ps or up to 1500 ps with optional -VPx module |
| Pre-pulse Contrast Ratio | >10:1 |
| Timing Jitter | <100 ps (rms) relative to Q-switch trigger |
| Output Wavelengths | 1064 nm (fundamental), with optional harmonics generation at 532 nm, 355 nm, and 266 nm via temperature-controlled KD*P/KDP crystals |
| Control Interface | RS232 + LabVIEW™ drivers |
| Cooling | Integrated closed-loop chiller system |
| Form Factor | Compact laser head + 19″ rack-mounted power supply & thermal management unit |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | SYLOS 2A |
| Core Technology | Optical Parametric Chirped-Pulse Amplification (OPCPA) |
| Pulse Duration | <7 fs |
| Repetition Rate | 1 kHz |
| Peak Power | >5 TW |
| Average Power | >35 W |
| Pulse Energy | >35 mJ |
| Central Wavelength | 880 nm |
| CEP Stability | <220 mrad (rms, >24 h) |
| ASE Suppression | Passively CEP-stabilized, ASE-free output |
| Form Factor | Table-top ultrafast laser system |
| Compliance | Designed for ELI-ALPS specifications, compatible with GLP-aligned lab infrastructure |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Laser Type | Diode-Pumped Solid-State (DPSS) Q-Switched UV Laser |
| Wavelength | 355 nm |
| Average Output Power | Up to 3.5 W |
| Pulse Duration | <15 ns (typ.) |
| Repetition Rate | Up to 100 kHz |
| Beam Quality (M²) | <1.3 |
| Cooling | Air-Cooled |
| Compliance | CE, RoHS, IEC 60825-1:2014 Class 4 Laser Product |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | UltraFlux FT2101 |
| Core Technology | OPCPA-based Solid-State + Fiber Frontend |
| Pulse Energy | 0.35 mJ |
| Tuning Range | 680–960 nm |
| Pulse Duration | 30–50 fs (10 fs optional) |
| Repetition Rate | 1 kHz |
| Pulse Stability | < 1 % rms |
| Footprint | 1.2 × 0.75 m |
| CEP-Stabilized Option | Available |
| Harmonic Outputs | 2ω (345–475 nm), 3ω (235–315 nm), Idler (1200–2200 nm), Supercontinuum (1 μJ, 10 fs, 680–960 nm) |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported |
| Model | UltraFlux HE |
| Core Architecture | Solid-State Laser System Based on Optical Parametric Chirped Pulse Amplification (OPCPA) |
| Max Pulse Energy | 1 J @ 5 Hz |
| Min Pulse Duration | ≤10 fs |
| Repetition Rate | Single Shot to 100 Hz |
| Output Wavelength Tuning Range (Signal) | 750–960 nm |
| Harmonic Outputs | SH (375–480 nm), TH (250–320 nm), FH (210–230 nm) |
| Pulse Energy Stability | ≤1 % RMS |
| Long-Term Power Stability | ≤1.5 % RMS (8 h) |
| Temporal Contrast (APFC) | 10¹⁰ : 1 |
| Beam Profile | Super-Gaussian (6th–11th order) |
| Cooling Requirement | Water-cooled (up to 14 L/min, 2 bar, ≤20 °C) |
| Compliance | ISO Class 7 Cleanroom Environment Required |
| Optional Features | CEP Stabilization (≤400 mrad), Deformable Mirror (Strehl >0.9), Air-Water Hybrid Cooling, Dazzler-based Dispersion Control |
| Brand | Ekspla |
|---|---|
| Origin | Lithuania |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Category | Imported Scientific Laser System |
| Model | UltraFlux HR |
| Core Technology | Optical Parametric Chirped Pulse Amplification (OPCPA) |
| Tuning Ranges | 750–960 nm (signal), 375–480 nm (SH), 250–320 nm (TH), 210–230 nm (FH) |
| Max Pulse Energy | 14 mJ @ 1 kHz |
| Pulse Duration | 40 ± 20 fs |
| Pulse Energy Stability | ≤1 % RMS |
| Long-Term Power Stability | ≤1.5 % RMS (8 h) |
| Temporal Contrast (APFC) | >10¹⁰:1 (±50 ps) |
| Beam Profile | Gaussian / Super-Gaussian (6th–11th order) |
| Beam Pointing Stability | ≤30 µrad (RMS) |
| Optical Jitter (with PLL option) | ≤2 ps |
| Harmonic Outputs | Optional, non-simultaneous SH/TH/FH modules |
| Cooling | Air-cooled or Air-Water hybrid (no external chiller required) |
| Compliance | CE-marked, RoHS-compliant, designed for GLP/GMP-adjacent research environments |
| Brand | El.En. |
|---|---|
| Model | BLADE RF177G |
| Wavelength | 9.3 µm |
| Output Power | 150 W (CW) |
| Laser Type | Sealed RF-excited CO₂ gas laser |
| Beam Mode | TEM₀₀ (typical) |
| Cooling | Water-cooled |
| Power Supply | Integrated RF generator |
| Enclosure Option | OEM bare-platform version available |
| Electrical Efficiency | >12% (typical) |
| Beam Diameter (1/e²) | ~3.5 mm |
| Beam Divergence (full angle) | <1.5 mrad |
| Polarization | Linear, vertical |
| Warm-up Time | <5 min to stable output |
| MTBF | >20,000 hours |
| Brand | ELAS |
|---|---|
| Origin | Imported (Non-Chinese) |
| Manufacturer Type | Authorized Distributor |
| Model | FemtoLAB (Laboratory Systems) |
| Core Components | Industrial-Grade Femtosecond Laser Source (PHAROS), Galvanometric Beam Steering, Nanopositioning XYZ Stages, SCA Control Software |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments |
| Software | SCA v4.x with hardware-integrated real-time control and GLP-compliant audit trail logging |
| Physical Footprint | ≤1.0 m × 2.5 m (fully assembled on optical table) |
| Laser Source | PHAROS femtosecond laser (1030 nm, up to 20 W avg. power, <290 fs pulse width, repetition rate 1–200 kHz) |
| Harmonic Generation | SHG (515 nm), THG (343 nm), FHG (257 nm) modules integrated |
| Positioning Accuracy | ±20 nm (closed-loop piezo-driven XYZ stages) |
| Beam Steering | Dual-axis galvo-scanners (±15° mechanical scan angle, <50 µrad pointing stability) |
| Autofocus | Motorized objective Z-stage + CMOS machine vision feedback loop |
| Optional Modules | SLM-based beam shaping, harmonic mirror turrets, 4F relay optics, polarization rotators, WATT PILOT attenuators |
| Brand | ELAS |
|---|---|
| Model | MASTER Series |
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Core Components | Semiconductor-based Ultrafast Laser System (Picosecond & Femtosecond) |
| Laser Types | Pulsed IR/Vis/UV (1064 nm, 532 nm, 355 nm, 1028 nm) |
| Positioning Accuracy | ±1 µm (XY/Z), Repeatability: ≤0.10 µm |
| Max XY Travel | 200 mm |
| Max Z Travel | 100 mm |
| Max XY Speed | 2000 mm/s |
| Max Acceleration | 30 m/s² |
| Spot Size | Down to 3 µm |
| Pulse Duration | <10 ps (ps-Master), <200 fs (fs-Master) |
| Repetition Rate | Single-shot to 500 kHz |
| Beam Quality | M² < 1.5 (ps), M² < 1.2 (fs) |
| Platform | Vibration-isolated Granite Base |
| Safety Class | Integrated Class 1 Enclosure |
| Software | SCA – Windows-based Laser Process Control & Pattern Design Suite |
| Power Requirement | Up to 4500 W |
| Dimensions (W×D×H) | ~1300 × 1200 × 1700 mm |
| Brand | ELAS |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | Mini MASTER GN532 |
| Core Component | Diode-Pumped Solid-State (DPSS) Green Laser System (532 nm) |
| Application | Ultrafast Laser Micromachining for Photovoltaic Edge Isolation |
| Laser Class | Class 1 Enclosed Workstation |
| Automation Level | Semi-Automated with Integrated Galvo-Scanning & Sliding Door Interface |
| Compliance | Designed to meet IEC 60825-1:2014 (Laser Safety), ISO 13857 (Safety of Machinery), and supports GLP/GMP-aligned process documentation workflows |
| Software | Proprietary GUI with real-time pulse parameter control, job logging, and audit-trail-ready operation history |
| Brand | ELAS |
|---|---|
| Origin | Imported |
| Manufacturer Type | Authorized Distributor |
| Model | Mini MASTER |
| Core Component | Semiconductor-Based Ultrafast Laser System |
| Laser Types | Nanosecond, Picosecond, and Custom Wavelength Options (1064 nm / 532 nm / 355 nm) |
| Scanning Field | 100 × 100 mm |
| f-Theta Lens Focal Length | 160 mm |
| Max Marking Speed | 3.5 m/s |
| Max Positioning Speed | 15.0 m/s |
| Minimum Achievable Spot Size | ≤ 3 µm |
| Laser Pulse Synchronization | Yes |
| Beam Quality (M²) | < 1.3 (ns), < 1.5 (ps) |
| Power Requirement | Up to 2000 W |
| Dimensions (W×D×H) | 1110 × 760 × 1440 mm |
| Safety Class | IEC 60825-1 Class 1 Enclosed System |
| Software Platform | SCA Laser Micro Machining Suite (Windows OS) |
| Brand | ELAS |
|---|---|
| Model | PicoLAB Laboratory Systems |
| Type | Picosecond DPSS Laser Micro-Machining Workstation |
| Laser Source | Nd:YVO₄ (1064 nm / 355 nm) |
| Pulse Duration | < 10 ps |
| Avg. Power | 16 W @ 1064 nm / 4 W @ 355 nm |
| Repetition Rate | Single Shot to 500 kHz |
| Beam Quality (M²) | < 1.5 |
| Spatial Mode | TEM₀₀ |
| Positioning Stages | X/Y Travel 600 mm × 400 mm |
| Stage Accuracy | ±4.5 µm |
| Repeatability | ±0.5 µm |
| Resolution | 0.1 µm |
| Galvo-Scanner | Dual-Axis, Synchronized with Stages |
| Safety Class | IEC 60825-1 Class 1 Enclosed System |
| Vision System | High-Resolution Machine Vision with Sample Recognition |
| Operating Temp. | 18–27°C (±1°C stability) |
| Power Supply | 240 VAC, 50–60 Hz, < 3 kW |
| Brand | ELAS |
|---|---|
| Model | Ventu FNP1064 |
| Laser Type | MOPFA Q-switched Yb-doped fiber laser |
| Wavelength | 1064 nm (nominal, 1060–1070 nm range) |
| Avg. Output Power | 20 W |
| Pulse Duration | 120 ns |
| Repetition Rate | 20–100 kHz |
| Beam Diameter | ~6 mm |
| Beam Quality (M²) | < 1.6 |
| Positioning System | 3-phase ironless linear motor stage |
| Travel Range | 300 × 300 mm |
| Bidirectional Repeatability | 0.7 µm |
| On-Axis Accuracy | 5 µm |
| Max Speed | 500 mm/s |
| Max Acceleration (no load) | 20 mm/s² |
| Dimensions | 1500 × 1500 × 900 mm |
| Weight | ~350 kg |
| Input Voltage | 220 V AC |
| Max Power Consumption | < 3 kW |
| Operating Temp | 18–27 °C |
| RH | 10–80 % (non-condensing) |
| Brand | ElectroOptic |
|---|---|
| Origin | Belarus |
| Model | Abris-M 2000 |
| Spectral Range | 350–2000 nm |
| Resolution | 60 lp/mm |
| Field of View | 40° |
| Magnification | 1× |
| Lens | F1.4 / 26 mm, uncoated |
| Focus Range | 0.15 m to ∞ |
| Power Supply | 1.5 V AAA battery (35 h runtime) or DC 3 V, ≤20 mA |
| Weight | 0.38 kg |
| Dimensions | 155 × 78 × 55 mm |
| Operating Temperature | −10 °C to +40 °C |
| Compliance | CE-marked optical safety device for laser alignment and IR visualization |
| Brand | ElectroOptic |
|---|---|
| Origin | Belarus |
| Model | CONTOUR-IR |
| Spectral Range | 400–1700 nm |
| Sensor Type | CCD (1/3″, 582 × 752) |
| Lens | F1.4 / 26 mm, C-mount |
| FOV | 20° |
| SNR | 48 dB |
| Frame Rate | 25 fps (CCIR standard) |
| Resolution | 570 TV lines |
| Video Output | Composite video (RCA, 1 Vp-p, 75 Ω) |
| Power Supply | DC 10–14 V, 150 mA |
| Operating Temperature | 5–40 °C |
| Weight | 0.3 kg |
| Dimensions | 56 × 110 mm |
| Sensitivity | ~5 µW/mm² @ 1310 nm |
| Compliance | CE, RoHS |
| Origin | UK |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Models | Elliot E4500, E4100, E3500, E3200 |
| Price Range | USD 68,000 – 136,000 |
| Brand | ELLITOP |
|---|---|
| Origin | Beijing, China |
| Model | EGS01 |
| Spectral Range | 190–25000 nm (expandable) |
| Single-Measurement Duration | 5–10 s (full spectrum), <5 s (fast mode) |
| Sample Size Compatibility | 4″, 6″, 8″, 12″ wafers (customizable) |
| Spectral Resolution | 0.5 nm (190–1000 nm), 3.5 nm (1000–2500 nm) |
| Thickness Measurement Accuracy | ≤ ±0.5 nm |
| Refractive Index Accuracy | ≤ ±0.005 |
| Brand | ELLITOP |
|---|---|
| Origin | Beijing, China |
| Model | EIS01 |
| Spectral Range (Vis) | 370–1000 nm |
| Incident Angle | Motorized variable from 30° to 90° |
| Single-Wavelength Measurement Time | ~15 s (configuration-dependent) |
| Thickness Repeatability | ±0.05 nm |
| Refractive Index Repeatability | ±0.001 |
| Brand | ELLITOP |
|---|---|
| Origin | Beijing, China |
| Model | EMPro |
| Incidence Angle Range | 40°–90° (manual adjustment in 5° increments) |
| Single-Measurement Time | ≤0.6 s (typical) |
| Measurement Principle | Null-ellipsometry with rotating analyzer (RA) configuration |
| Delta Range | 0°–360° continuous |
| Sensitivity | Sub-angstrom thickness resolution for ultra-thin films |
| Alignment System | Integrated high-resolution video auto-collimation stage |
| Software Architecture | Windows-based, compliant with FDA 21 CFR Part 11 audit trail requirements |
| Compliance | Supports ISO/IEC 17025-compliant calibration documentation and GLP/GMP traceable reporting |
| Brand | ELLITOP |
|---|---|
| Origin | Beijing, China |
| Model | EMPro-PV |
| Spot Size | <1 mm |
| Incident Angle Range | 40°–90° (manually adjustable in 5° increments) |
| Single-Measurement Time | 0.6 s (typical) |
| Brand | ELLITOP |
|---|---|
| Origin | Beijing, China |
| Model | EP800 |
| Spectral Range | 245–1000 nm (customizable) |
| Incident Angles | 60° or 65° (selectable) |
| Measurement Repeatability | 0.01 nm |