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| Brand | Oxford Instruments |
|---|---|
| Origin | United Kingdom |
| Model | ALD OpAL |
| Substrate Size | Up to 200 mm |
| Process Temperature | Up to 200 °C |
| Precursor Sources | Up to 4 (liquid or solid) |
| Plasma-Enhanced ALD Capability | Optional, field-upgradable |
| Chamber Design | Direct-load, open-frame thermal ALD platform |
| Safety Integration | Compatible with N₂-purged gloveboxes and exhaust hoods |
| Service Support | Lifetime process support, including new recipe development and material-specific optimization guidance |
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