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| Brand | Oxford Instruments |
|---|---|
| Origin | United Kingdom |
| Model | PlasmaPro 100 Cobra |
| Wafer Capacity | Single-wafer and batch processing up to 200 mm |
| Temperature Range | −150 °C to +400 °C |
| Electrode Cooling/Heating | Liquid nitrogen, recirculating chiller, or resistive heating |
| RF Power Delivery | Top-mounted electrode with dual-frequency (LF/RF) capability |
| ICP Source Options | 65 mm, 180 mm, 300 mm |
| Process Pressure Range | Wide operational window enabled by high-pumping-speed vacuum system |
| Substrate Thickness Compatibility | Up to 10 mm |
| Backside He–cooling | Integrated electrostatic chuck with helium backside cooling |
| Endpoint Detection | Real-time optical emission spectroscopy (OES) monitoring |
| Chamber Architecture | Symmetric, low-inductance plasma chamber with uniform gas distribution and high-conductance pumping path |
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