KLA
Filter
Showing 1–30 of 55 results
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | Filmetrics (a KLA company) |
| Type | Benchtop Spectroscopic Reflectometry System |
| Model | F3-sX |
| Wavelength Options | 980 nm / 1310 nm / 1550 nm |
| Thickness Range | 15 nm – 3 mm (depending on configuration and film type) |
| Spot Size | 10 µm |
| Material Library | >130 preloaded optical constants |
| Software | FILMeasure 8 (local acquisition & analysis), FILMeasure Standalone (remote data processing) |
| Compliance | Designed for semiconductor fab, R&D, and QC environments supporting GLP/GMP traceability workflows |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | Filmetrics F50 |
| Measurement Principle | Broadband Spectral Reflectometry |
| Maximum Sample Diameter | 450 mm |
| Stage Type | Motorized R-Theta Platform |
| Scan Patterns | Polar, Rectangular, Linear, and User-Defined |
| Wavelength Options | UV–NIR (model-dependent, e.g., F50-UV: 190–1100 nm |
| F50-NIR | 900–1700 nm) |
| Measurement Speed | Up to 2 points per second |
| Predefined Scan Templates | >30 built-in |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments, supports audit-ready data logging per FDA 21 CFR Part 11 requirements when integrated with validated software configuration |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Filmetrics R50 |
| Automation Level | Manual |
| Sheet Resistance Range | 1 mΩ/□ – 200 MΩ/□ |
| Sheet Resistance Accuracy | ±1% |
| Substrate Size Compatibility | 4-inch to 12-inch wafers |
| Software | RSMapper™ |
| Probe Compatibility | Fully compatible with KLA’s full suite of four-point probe sensors |
| XY Stage | 200 mm motorized |
| Z-Travel | 100 mm precision-controlled |
| Measurement Configurations | Customizable grid, linear, radial, and user-defined point patterns |
| Application Scope | Conductive & semiconducting thin films on Si, GaAs, SiC, sapphire, glass, and flexible substrates |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Product Type | Imported Semiconductor Process Metrology Instrument |
| Automation Level | Fully Automated |
| Probe Configurations | Four-Point Probe (4PP) and Eddy Current (EC) |
| Maximum Sample Diameter | 200 mm (R54-200) or 300 mm (R54-300) |
| Maximum Sample Height | 15 mm |
| Sheet Resistance Range | 10⁻² to 10⁸ Ω/sq |
| Measurement Coordinate Modes | Rectangular, Linear, Polar, Custom Grid |
| XY Stage Precision | High-resolution motorized stage with ±100 mm travel (200 mm total range) |
| Enclosed Chamber | Yes, for light- and environment-sensitive samples |
| Software Platform | RSMapper™ v5.x with GLP-compliant audit trail, 21 CFR Part 11 optional modules |
| Compliance | ASTM F84, ISO 10777, SEMI MF67, USP <1054>, supports GMP/GLP documentation workflows |
| Brand | KLA |
|---|---|
| Origin | Malaysia |
| Model | D-500 |
| Measurement Principle | Contact Stylus Profilometry |
| Vertical Measurement Range | 0.002 µm to 1200 µm |
| Vertical Resolution | Sub-nanometer (typical) |
| Probe Tip Radius | 0.7 µm (standard), optional tips available |
| Normal Force Range | 0.03–15 mg |
| Scan Length | 55 mm |
| Horizontal Sample Stage | 140 mm manual X-Y stage |
| Max Sample Size | 100 mm × 100 mm |
| Step Height Repeatability | < 0.1% of measured height (RMS) |
| Surface Roughness Parameters | Ra, Rq, Rz, Rt, Rsk, Rku, with ISO 4287/4288 and ASME B46.1 compliant filtering |
| Optical System | Integrated 5 MP color camera with trapezoidal distortion correction and arc error compensation |
| Software | Alpha-Step Analysis Suite with GLP-compliant audit trail, report generation, and 21 CFR Part 11 ready configuration options |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | Alpha-Step D-600 |
| Measurement Principle | Stylus-based mechanical profilometry with optical lever amplification |
| Vertical Range | Up to 1200 µm |
| Vertical Resolution | Sub-nanometer (typical) |
| Stylus Normal Force | Adjustable from 0.03 mg to 15 mg |
| Optical System | Integrated 5 MP color camera with trapezoidal distortion correction and arc trajectory compensation |
| Footprint | Compact desktop configuration |
| Compliance | Designed for ISO 25178, ISO 4287, ASTM E1077, ASTM E1316, and semiconductor industry metrology workflows (SEMI, JEDEC) |
| Software | Alpha-Step Analysis Suite with audit trail, user access control, and export compliance per FDA 21 CFR Part 11 requirements |
| Brand | KLA |
|---|---|
| Origin | Malaysia |
| Model | D-600 |
| Measurement Principle | Mechanical Stylus Profilometry (Optical Lever Sensor) |
| Vertical Measurement Range | 0.003 µm to 1200 µm |
| Vertical Resolution | Sub-nanometer (typical) |
| Probe Tip Radius | 0.7 µm (standard), optional from 0.1 µm to 50 µm |
| Normal Force Range | 0.03–15 mg |
| Scan Length | 55 mm |
| Sample Max Diameter | 200 mm |
| Step Height Repeatability | < 0.1% RSD (at ≥100 nm steps) |
| Optical System | 5 MP color camera with trapezoidal distortion correction and arc compensation |
| Brand | KLA |
|---|---|
| Origin | Guangdong, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | D500 |
| Price Range | USD 42,000 – 56,000 (FOB) |
| Measurement Principle | Optical Lever-Based Contact Profilometry |
| Vertical Measurement Range | 10 nm – 1000 µm |
| Vertical Accuracy | ±0.01% of full-scale range |
| Probe Tip Radius | 2 µm |
| Adjustable Normal Force | 0.03–15 mg |
| Maximum Single-Scan Length | 30 mm |
| Step Height Repeatability | 0.5 nm (RMS, measured on 1 µm SiO₂ step standard over 15 repeated scans) |
| Vertical Resolution | 0.038 nm |
| Maximum Sample Size | 140 mm diameter circular stage |
| Brand | KLA |
|---|---|
| Origin | Malaysia |
| Model | D600/P-7 |
| Measurement Principle | Mechanical Stylus Profiling with Optical Reflectance Height Detection |
| Vertical Measurement Range | 0.1 nm to 1200 µm |
| Vertical Accuracy | ±0.1 µm |
| Probe Normal Force | 0.03–15 mg |
| Maximum Scan Length | 55 mm (D600), 150 mm (P-7) |
| Step Height Repeatability | 0.10% (1σ) |
| Vertical Resolution | 0.38 Å |
| Maximum Sample Size | 200 mm diameter |
| Brand | KLA |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Candela 8420 |
| Pricing | Available Upon Request |
| Instrument Category | Optical Non-Patterned Wafer Defect Inspection System |
| Primary Application | Surface Defect Detection on Unpatterned Wafers |
| Wafer Diameter | 2–8 inches |
| Throughput | 30 WPH |
| Resolution | 83 nm |
| Brand | KLA |
|---|---|
| Origin | Singapore |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | CS20 |
| Quotation | Upon Request |
| Instrument Category | Optical Non-Patterned Wafer Defect Inspection System |
| Primary Application | Bare (Non-Patterned) Silicon Wafer Surface Defect Detection |
| Throughput | 30 WPH for 150 mm (6″) wafers, 27 WPH for 200 mm (8″) wafers |
| Resolution | 83 nm |
| Substrate Diameter Range | 50.8 mm – 200 mm (2″ – 8″) |
| Thickness Range | 350 µm – 1,100 µm |
| Minimum Detectable Defect Size | 0.3 µm (PSL sphere equivalent, ≥95% capture rate on bare Si) |
| Defect Types | Particles, scratches (≥100 µm × 0.1 µm × 50 Å), pits (≥20 µm Ø × 50 Å depth), stains (≥20 µm Ø × 10 Å thickness), bumps |
| Detection Threshold | Signal amplitude > 3× peak-to-valley background noise |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Product Type | Optical Patterned Defect Inspection System |
| Model | Candela® 6300 |
| Detection Sensitivity | Sub-0.1 Å surface roughness change |
| Spatial Bandwidth | 0.22–2000 µm |
| Measurement Modes | Radial & tangential topography profiling, roll-off analysis, texture uniformity, particle/scratch detection |
| Compliance | Designed for semiconductor and data storage manufacturing environments |
| Brand | KLA |
|---|---|
| Origin | Malaysia |
| Product Type | Contact Profilometer / Surface Roughness Tester |
| Operating Principle | Stylus-Based Profilometry |
| Model Range | D-500, D-600, P-7, P-17 |
| Compliance | Designed for ISO 25178, ISO 4287, ASTM E1093, USP <1056>, and GLP/GMP-aligned workflows |
| Brand | KLA |
|---|---|
| Origin | Germany |
| Distributor Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | F20 |
| Price | USD 27,500 (FOB Hamburg) |
| Brand | KLA |
|---|---|
| Origin | Malaysia |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | F20 |
| Wavelength Range | 380–1050 nm |
| Thickness Measurement Range | 1 nm – 10 mm |
| Measurement Accuracy | ±0.02 nm |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Product Type | Imported Instrument |
| Model | F54 Series |
| Pricing | Upon Request |
| Thickness Range | 4 nm – 100 µm (depending on configuration) |
| Wavelength Range | 190–1700 nm (F54-UVX) |
| Spot Size | Down to 1 µm (with 50× objective) |
| Aperture Options | 500, 250, 100, and 50 µm |
| Measurement Speed | Up to 2 points per second |
| Maximum Sample Diameter | 450 mm |
| Built-in Material Library | >130 refractive index & extinction coefficient datasets |
| Compliance | ASTM F398, ISO/IEC 17025-compatible operation environment |
| Software | Filmetrics F54 Metrology Suite v6.x (Windows 10/11, USB 3.0 interface) |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Product Type | Imported Instrument |
| Model | F54-XY Series |
| Pricing | Upon Request |
| Thickness Range (F54-XY) | 20 nm – 50 µm |
| Wavelength Range (F54-XY) | 380–1050 nm |
| Thickness Range (F54-XY-UV) | 4 nm – 35 µm |
| Wavelength Range (F54-XY-UV) | 190–1100 nm |
| Thickness Range (F54-XY-NIR) | 100 nm – 120 µm |
| Wavelength Range (F54-XY-NIR) | 950–1700 nm |
| Thickness Range (F54-XY-EXR) | 20 nm – 120 µm |
| Wavelength Range (F54-XY-EXR) | 380–1700 nm |
| Thickness Range (F54-XY-UVX) | 4 nm – 120 µm |
| Wavelength Range (F54-XY-UVX) | 190–1700 nm |
| Maximum Sample Size (F54-XY-200) | 200 mm |
| Maximum Sample Size (F54-XYT-300) | 300 mm |
| Measurement Speed | Up to 2 fields of view per second |
| Stage Type | Motorized XY stage (F54-XY-200) |
| Pattern Recognition | Yes, supports both arrayed and non-arrayed wafers |
| Software | FILMapper v6.x or later |
| Compliance | NIST-traceable calibration standards included |
| Material Library | >130 built-in optical constants |
| Brand | KLA |
|---|---|
| Origin | Fujian, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | R50 |
| Price Range | USD $42,000 – $140,000 (FOB) |
| Automation Level | Fully Automated |
| Sheet Resistance Range | 5 mΩ/□ to 5 MΩ/□ |
| Measurement Accuracy | ±1% |
| Repeatability | <0.2% |
| XY Stage Options | 100 mm × 100 mm or 200 mm × 200 mm |
| Maximum Sample Diameter | 200 mm |
| Measurement Modes | Contact Four-Point Probe (4PP) and Non-Contact Eddy Current (EC) |
| Mapping Configurations | Linear, Rectangular, Polar, and User-Defined Grids |
| Compliance | ASTM F84, ISO 10474, SEMI MF67, USP <1031>, GLP/GMP-ready audit trail support |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | Fimetrics P3D |
| Measurement Principle | White-Light Interferometry |
| Type | Non-Contact 3D Surface Profilometer / Roughness Analyzer |
| Key Resolution | Sub-nanometer vertical resolution (≤0.1 nm typical) |
| Field-of-View Scalability | Multi-field stitching enabled |
| Optical Configuration | Phase-shifting and vertical-scanning interferometry (CSI) |
| Compliance Basis | Designed for ISO 25178-2, ISO 4287, ASTM E1392, and VDI/VDE 2634 Part 3 |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | Gemini |
| Price Range | USD $65,000 – $130,000 |
| Instrument Type | Multi-Axis Nanomechanical Testing System |
| Maximum Indentation Depth | 50 µm |
| Effective Load Range | 50 mN |
| Load Resolution | 3 nN |
| Displacement Range | 50 µm |
| Displacement Resolution | 4 nm |
| Maximum Friction Force | 50 mN |
| Indenter Tip Material | Single-Crystal Diamond |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | HRP®-260 |
| Measurement Principle | Stylus-based contact profilometry with dual-stage scanning (macro-stage + high-resolution piezo stage) |
| Scan Range | 200 mm (macro), 90 µm (high-res piezo) |
| Step Height Range | 0.1 nm to 327 µm |
| Normal Force Range | 0.03–50 mg |
| Sample Diameter Support | 75–200 mm (opaque & transparent substrates) |
| Automation | Fully automated wafer handling, pattern recognition, SECS/GEM compliance |
| Software | Integrated metrology suite with ISO 4287/4288, ASME B46.1, and SEMI E10/E126 compliant analysis modules |
| Data Management | Audit-trail enabled, FDA 21 CFR Part 11 ready, GLP/GMP traceable reporting |
| Brand | KLA |
|---|---|
| Origin | Malaysia |
| Model | HRP®-260 |
| Product Type | Contact Profilometer / Surface Roughness Tester |
| Operating Principle | Stylus-Based Profilometry |
| Horizontal Scan Range (Long-Range Stage) | 200 mm (no stitching required) |
| High-Resolution Stage Travel | 90 µm × 90 µm |
| Vertical Resolution | 1 nm |
| Stylus Normal Force Range | 0.03–50 mg |
| Step Height Measurement Range | <1 nm to 327 µm |
| Stylus Tip Radius Options | 20 nm – 50 µm |
| Stylus Included | DuraSharp® diamond stylus (40 nm radius) |
| Wafer Handling | Automatic robotic loading for 75–200 mm opaque (e.g., Si, GaAs) and transparent (e.g., sapphire) substrates |
| Compliance | SEMI E4, E5, E30, E37 |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | iMicro |
| Maximum Load Capacity | 1 N |
| Force Resolution | 6 nN |
| Force Noise Floor | <200 nN |
| Indentation Depth Range | up to 80 µm |
| Depth Resolution | 0.04 nm |
| Depth Drift Rate | <0.05 nm/s |
| Time Constant | 20 µs |
| Scratch Option | up to 50 mN load, 2.5 mm lateral displacement, 500 µm/s max speed |
| Stage Travel (X/Y/Z) | 100 mm × 150 mm × 25 mm |
| Load Stiffness | >3,500,000 N/m |
| Tip Calibration | Integrated TiP-Calibration system |
| Software Platform | InView (scriptable experiment design), optional NanoBlitz 3D topography & tomography module |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | iMicro |
| Instrument Type | Integrated Nanoindentation and Scratch Tester |
| Maximum Normal Load | 1 N |
| Load Resolution | <1 nN |
| Displacement Range | ±25 µm |
| Displacement Resolution | <0.05 nm |
| Indenter Types | Dozens of diamond indenters (Berkovich, cube corner, Vickers, spherical, flat punch, etc.) |
| Controller | InQuest high-speed controller (100 kHz data acquisition, 20 µs time constant) |
| Software | InView Suite (RunTest, ReviewData, InFocus, InView University, mobile app) |
| Compliance | Fully supports ISO 14577-1/2/3, ASTM E2546, and GLP/GMP-aligned audit trails |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | iNano |
| Instrument Type | Bio-Nanoindenter |
| Effective Load Range | 1 N |
| Load Resolution | < 10 nN |
| Displacement Range | 50 µm |
| Displacement Resolution | < 0.05 nm |
| Indenter Types | Dozens of interchangeable geometries (Berkovich, cube corner, Vickers, spherical, flat, etc.) |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | iNano |
| Maximum Force | 50 mN |
| Force Resolution | 3 nN |
| Force Noise | <200 nN (RMS) |
| Time Constant | 20 µs |
| Maximum Indentation Depth | 50 µm |
| Displacement Noise | <0.1 nm |
| Digital Displacement Resolution | 0.02 nm |
| Drift Rate | <0.05 nm/s |
| Dynamic Frequency Range | 0.1 Hz – 1 kHz |
| Z-Stage Travel | 25 mm |
| X-Stage Travel | 100 mm |
| Y-Stage Travel | 150 mm |
| Load Frame Stiffness | >1,000,000 N/m |
| Scratch Max Normal Load | 50 mN |
| Scratch Max Distance | 2.5 mm |
| Scratch Max Speed | 500 µm/s |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | iNano |
| Load Resolution | <100 nN |
| Displacement Resolution | <0.01 nm |
| Maximum Load Capacity | 500 mN |
| Thermal Drift | <0.05 nm/s (typical) |
| Compliance | ASTM E2546, ISO 14577, ISO 20513, USP <1062>, FDA 21 CFR Part 11 compliant software options available |
| Brand | KLA |
|---|---|
| Origin | USA |
| Manufacturer | KLA Corporation |
| Instrument Type | Nanoindentation and Scratch Tester |
| Model | iNano® |
| Force Range | 0.1 µN – 50 mN |
| Displacement Range | ±25 µm |
| Force Resolution | < 10 nN |
| Displacement Resolution | < 0.01 nm |
| Thermal Drift | < 0.05 nm/s (at 25 °C, stabilized) |
| Maximum Scratch Load | 50 mN |
| Available Indenter Types | Berkovich, Cube-Corner, Spherical (1–100 µm radius), Conical, Flat Punch |
| Integrated Microscope | 10×–100× digital zoom, 1 µm lateral resolution |
| Controller | InQuest™ high-speed electronics (100 kHz sampling, 20 µs time constant) |
| XY Stage Travel | 100 mm × 100 mm |
| Z-Stage Travel | 25 mm |
| Compliance with Standards | ASTM E2546, ISO 14577-1/2/3, JIS H 8509 |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | InSEM HT |
| Instrument Type | High-Temperature In-Situ Nanoindentation and Mechanical Testing System for SEM/FIB Integration |
| Maximum Indentation Depth | 50 µm |
| Effective Load Range | 50 mN |
| Load Resolution | 3 nN |
| Displacement Range (X/Y) | 20 mm, (Z): 25 mm |
| Displacement Resolution | 4 nm |
| Maximum Friction Force | 0.05 N |
| Indenter Type | Diamond Berkovich / Cube-Corner / Spherical |
| Thermal Drift | < 0.05 nm at 800 °C |
| Operating Temperature Range | RT to 800 °C under vacuum |
| Compatibility | Integrated with SEM, FIB, or standalone high-vacuum chamber |
| Standards Compliance | ISO 14577-1/2/3, ASTM E2546, applicable to GLP/GMP-relevant mechanical property validation workflows |
| Brand | KLA |
|---|---|
| Origin | USA |
| Model | InSEM HT |
| Instrument Type | Nanoindentation System |
| Temperature Range | Up to 800 °C |
| Actuator Options | InForce 50 (50 mN) and InForce 1000 (1000 mN) |
| Data Acquisition Rate | 100 kHz |
| Time Constant | 20 µs |
| XYZ Stage Travel | 20 mm × 20 mm × 25 mm |
| Software Platform | InView (Windows® 10 compatible) with User Method Development, CSM, NanoBlitz 3D, AccuFilm™, ProbeDMA™, DataBurst™ |