Other Semiconductor Inspection Instruments
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| Origin | Japan |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | ELS-F125 |
| Pricing | Available Upon Request |
| Origin | Guangdong, China |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic (China-made) |
| Model | PY |
| Pricing | Available Upon Request |
| Brand | ETAC |
|---|---|
| Origin | Japan |
| Model | MLR23 |
| Measurement Modes | AC & DC |
| AC Resistance Ranges | 2 mΩ, 20 mΩ, 200 mΩ, 2 Ω, 20 Ω, 200 Ω, 2 kΩ |
| DC Resistance Ranges | 200 mΩ, 2 Ω, 20 Ω, 200 Ω, 2 kΩ, 20 kΩ, 200 kΩ |
| Channel Capacity | 32–288 channels |
| Measurement Speed | 10 ms (High-Speed Mode), 200 ms (High-Accuracy Mode) |
| Control Interface | Windows-based application software |
| Compliance | Designed for semiconductor interconnect reliability assessment per JEDEC JESD22-A108, A114, and IPC-9701 guidelines |
| Brand | EULITHA AG |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Template |
| Pricing | Upon Request |
| Brand | Filmetrics |
|---|---|
| Origin | USA |
| Model(s) | F50, F40 |
| Optical Measurement Principle | Spectral Reflectance Analysis (Visible–NIR) |
| Supported Substrates | Si, glass, Al, GaAs, stainless steel, polycarbonate, polymer films |
| Film Types | Transparent, semi-transparent, absorbing thin films (e.g., SiO₂, SiNₓ, DLC, photoresist, a-Si, poly-Si) |
| Interface | USB 2.0 |
| Software Platform | Filmetrics F20 Suite (Windows-compatible) |
| Preloaded Material Library | >100 optical constants (n, k) |
| Multilayer Capability | Yes, up to 10 layers (with user-defined or fitted optical models) |
| Minimum Measurable Thickness | ~1 nm (dependent on material dispersion and substrate reflectivity) |
| Maximum Measurable Thickness | ~50 µm (for low-absorption dielectrics on reflective substrates) |
| Measurement Speed | <2 seconds per spot |
| Calibration | Factory-calibrated |
| Brand | FRT |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Category | Imported Instrument |
| Model | FRT Optical Surface Metrology System |
| Pricing | Available Upon Request |
| Brand | Gel-Pak |
|---|---|
| Origin | USA |
| Model | APV / VRP / MB Series |
| Surface Resistivity | < 10⁹ Ω (APV & VRP), ≤ 10¹¹ Ω/sq (MB) |
| Material | Silicone-Free Crosslinked Polyurethane Elastomer |
| Adhesion Grade | EH-02 (Low Tack) to EH-07 (High Tack) |
| Hardness | 60–68 Shore A |
| Shear Modulus (G) | 200 kPa |
| Operating Temperature | +10 °C to +35 °C |
| Storage/Transport Temperature | −10 °C to +75 °C |
| Compliance | ANSI/ESD S20.20, IEC 61340-5-1, RoHS |
| Brand | Gel-Pak |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | Gel-Pak BMP |
| Price Range | USD 10–14 |
| Brand | Gel-Pak |
|---|---|
| Origin | USA |
| Model | GP-CLIP-22C, GP-CLIP-22C-M |
| Material | Conductive black polypropylene |
| ESD Surface Resistivity | 10³–10⁶ Ω |
| Max Operating Temperature | 85 °C |
| Compliance | ESD-S20.20 compliant |
| Packaging Type | Vacuum Release (VR) tray retention clip |
| Application | 2-inch semiconductor wafer carrier fixation |
| Brand | Gel-Pak |
|---|---|
| Origin | USA |
| Model | MB Series |
| Construction | Polyether Polyurethane Membrane + POLYREX® PG-33 Polystyrene Housing |
| Transparency | High-Optical Clarity |
| Reusability | Yes |
| Compliance | ESD-S20.20 Compliant (for SD variants) |
| Dimensions Range | 38 × 38 × 16 mm to 300 × 300 × 50 mm |
| Frame Options | Transparent, Black, White, Blue Clips |
| Brand | Gel-Pak |
|---|---|
| Origin | USA |
| Model | Gel-Pak Vertec® VFM |
| Material | Vertec TPE elastomer (FDA/USP compliant) & semiconductor-grade polycarbonate |
| Surface resistivity | >1×10¹⁴ Ω |
| Storage temperature | −10 to +65 °C |
| Outgassing (70 °C, 2 h, static headspace GC-MS per IDEMA M8-98) | Total volatile organics ≤0.32 ppm |
| Contact area on FAC device | ≤10% (edge-only) |
| Channel options | 5–7 channels (5-channel variant features six TPE retention ridges) |
| Brand | Genmark |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | Sort-Max Wafer Sorter |
| Pricing | Available Upon Request |
| Brand | ACCRETECH (Tokyo Seimitsu) |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Hakuto IBE-4000 |
| Pricing | Upon Request |
| Brand | ACCRETECH (Tokyo Seimitsu) |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | 20 IBE-C |
| Pricing | Upon Request |
| Brand | HalfMoon |
|---|---|
| Origin | Japan |
| Wavelength Range | 190–1100 nm |
| Thickness Measurement Range | 1 nm – 250 µm |
| Optical Configuration | Non-contact, Spectroscopic Interferometry |
| Detector | PDA or CCD, 512-channel, thermoelectrically cooled |
| Light Sources | Deuterium (D₂) lamp (UV), Tungsten-Halogen (W) lamp (Vis), D₂ + W combination |
| Standard Measurement Aperture | Microscope-coupled objective port |
| Compliance | Designed for ISO/IEC 17025-aligned lab environments, compatible with GLP/GMP data integrity workflows (audit trail, user access control, electronic signatures per FDA 21 CFR Part 11) |
| Brand | HalfMoon |
|---|---|
| Origin | Japan |
| Model | 01 |
| Type | In-situ, Fiber-optic-based Spectroscopic Reflectometry System |
| Deployment | Inline/At-line Integration for Semiconductor Processing Equipment |
| Environmental Rating | Vacuum-Compatible (up to 1×10⁻⁶ Pa), Cleanroom Class 100 Certified |
| Measurement Principle | Broadband Spectral Reflectometry (400–1100 nm) with Real-time Interference Analysis |
| Brand | HalfMoon |
|---|---|
| Origin | Japan |
| Supplier Type | Authorized Distributor |
| Import Status | Imported |
| Wavelength Range | 250–800 nm (optional 350–1000 nm) |
| Thickness Measurement Range | 0.1 nm to >10 µm |
| Detector | Thermoelectrically Cooled Photodiode Array, 512 channels |
| Angle of Incidence/Reflection | 45°–90° (motorized, fully adjustable) |
| Power Supply | AC 1500 VA |
| Dimensions (H×D×W) | 1300 × 900 × 1750 mm |
| Weight | ~350 kg |
| Measurement Principle | Spectroscopic Ellipsometry (SE) |
| Brand | HalfMoon |
|---|---|
| Origin | Japan |
| Model Series | FE-300V / FE-300UV / FE-300NIR / FE-300NIR+ |
| Optical Principle | Normal-Incidence Spectroscopic Reflectometry (Spectroscopic Reflectance Analysis) with Nonlinear Least-Squares Fitting of Optical Constants (n, k) |
| Wavelength Ranges | 450–780 nm (FE-300V), 300–800 nm (FE-300UV), 900–1600 nm (FE-300NIR), 1470–1600 nm (FE-300NIR+) |
| Thickness Range | 10 nm – 1.5 mm (model-dependent) |
| Thickness Accuracy | ≤ ±0.2 nm (for thin films < 1 µm) |
| Repeatability (2σ) | ≤ 0.1 nm |
| Spot Size | ~Φ3 mm |
| Max Sample | 8-inch wafer (≤5 mm thick) |
| Measurement Time | 0.1–10 s per point |
| Light Sources | Tungsten-halogen lamp (V/NIR), Deuterium lamp (UV) |
| Interface | USB 2.0 |
| Dimensions | 280 × 570 × 350 mm (W×D×H) |
| Weight | ~24 kg |
| Software | Standard reflectance peak/valley analysis, FFT, optimization-based fitting, nonlinear least-squares inversion |
| Optional Modules | Multi-layer optical model builder, reference standard calibration suite, dispersion-corrected material database |
| Brand | HalfMoon |
|---|---|
| Origin | Japan |
| Model | MCPD-9800 / MCPD-3700 / MCPD-7700 |
| Wavelength Range | MCPD-9800: 360–1100 nm (High Dynamic Range) |
| MCPD-3700 | 220–1000 nm (UV-Vis-NIR) |
| MCPD-7700 | 220–1100 nm (High Sensitivity) |
| Compliant with ISO 13655 | 2017 (Spectral Measurement of Reflectance and Transmittance) and ASTM E308-22 (Computing CIE Colors from Spectrophotometric Data) |
| Brand | HalfMoon |
|---|---|
| Origin | Japan |
| Model | 1 |
| Wavelength Range | 300–800 nm |
| Incident/Reflectance Angle Range | 45°–90° |
| Measurement Method | Rotating Polarizer Element Configuration |
| Sample Stage | Manual Positioning (100 × 100 mm Max) |
| Spectral Detection | Polychromator-Based Multi-Channel Detection (≥400 Wavelength Channels) |
| Angle Drive Mechanism | Sine-Bar Actuated Reflectance Angle Adjustment |
| Optical Constants Output | Refractive Index (n) and Extinction Coefficient (k) |
| Dimensions | 650 H × 400 D × 560 W mm |
| Weight | ~50 kg |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | C10346-01 |
| Wavelength Range | 200 nm – 950 nm |
| Wavelength Accuracy | ±0.75 nm |
| Spectral Resolution (FWHM) | <2 nm |
| Power Supply | AC 100–240 V, 50/60 Hz |
| Power Consumption | ~70 VA |
| Digital Output Terminals | TTL, up to 5 channels (3 active when measurement trigger is used) |
| Digital Input Terminal | TTL trigger input (1 channel) |
| Busy Signal Output | TTL, 1 channel (4-channel configuration) |
| Analog Output | 2 channels, 0–10 V |
| Fiber Optic Connector | SMA |
| Communication Interface | USB 2.0 Type B |
| Operating Temperature | +10 °C to +30 °C |
| Dimensions | Not specified |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer | Hamamatsu Photonics K.K. |
| Type | Imported Instrument |
| Model | C16506-01 |
| Pricing | Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer | Hamamatsu Photonics K.K. |
| Type | Imported Instrument |
| Model | C10506-07-06 |
| Pricing | Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Product Origin | Imported |
| Model | L9570-01 |
| Pricing | Available Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer | Hamamatsu Photonics K.K. |
| Type | Imported |
| Model | C15740-01 |
| Wafer Sizes Supported | 100 mm (4″) or 150 mm (6″) |
| Measurement Time | ~12 min (4″ wafer, 10× objective, PL mode) |
| PL Wavelength Range | R/G/B channels |
| Spatial Resolution | 1 µm/pixel (standard), 0.5 µm/pixel (high-res mode) |
| Measured Parameters | Shape defects, PL intensity distribution, PL peak wavelength mapping |
| Dimensions | 2000 mm (W) × 1878 mm (H) × 1130 mm (D) |
| Weight | ~1800 kg |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer | Hamamatsu Photonics K.K. |
| Type | Imported Instrument |
| Model | C15765-01 |
| Pricing | Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Origin Category | Imported Instrument |
| Model | THEMOS mini |
| Pricing | Upon Request |
| Brand | Hamamatsu |
|---|---|
| Origin | Japan |
| Manufacturer Type | Original Equipment Manufacturer (OEM) |
| Import Status | Imported |
| Model | μAMOS |
| Pricing | Upon Request |
| Laser Wavelength | 1.3 µm (standard), optional 1.1 µm pulsed or high-power 1.3 µm (>400 mW) |
| Spatial Resolution (Backside Imaging) | ≤0.26 µm (with 100× HR NIR objective) |
| Detection Method | Lock-in Amplified OBIRCH (Optical Beam Induced Resistance Change) |
| Voltage/Current Biasing | 4-Quadrant ±10 mV–±10 V / ±100 mA |
| Sample Compatibility | 200 mm / 300 mm wafers (front/backside), diced dies, packaged ICs with polished backside, EPI-substrates |
| Vacuum Requirement | ≥80 kPa |
| Compressed Air | 0.5–0.7 MPa |
| Power Supply | AC 220 V, 50/60 Hz, ~3000 W |
| Main Unit Dimensions | 1360 × 1410 × 2120 mm (W×D×H), ~900 kg |
| Control Console | 880 × 700 × 1542 mm, ~255 kg |