Empowering Scientific Discovery

Shenzhen Vector Scientific Instruments Co., Ltd.

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BrandTSD
ModelIVG-2040 / IVG-3040
Max Wafer Size200 mm (8") / 300 mm (12")
Grinding Wheel OD203 mm / 303 mm
Spindle Power6.0 kW / 9.5 kW
Spindle Speed0–6000 rpm / 0–4000 rpm
Table Speed0–380 rpm
Z-Axis Feed Rate0.1–1000 µm/sec
In-Line Thickness Measurement Repeatability±0.001 mm
In-Line Thickness Range (OMM)0–4800 µm
Integrated Auto Load/UnloadYes
Non-Contact Gauging (NCG)Optional
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BrandTSD
ModelIVG Series
OriginBeijing, China
TypeSemi-Automatic Dual-Axis Wafer Thinning System
Maximum Wafer Size200 mm (IVG-2020) / 300 mm (IVG-3020)
Grinding Wheel OD203 mm / 303 mm
Spindle Power6.0 kW / 9.5 kW
Spindle Speed0–6000 rpm / 0–4000 rpm
Chuck Rotation Speed0–380 rpm
Z-Axis Feed Rate0.1–1000 µm/sec
In-Line Thickness Measurement Range0–4800 µm
Thickness Repeatability±1 µm
Non-Contact Gauging (NCG)Optional
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BrandTSD
OriginBeijing, China
Manufacturer TypeAuthorized Distributor
Country of OriginChina
ModelIHG-2010
PriceUpon Request
Maximum Wafer Size6-inch (150 mm)
Grinding Wheel ODØ200 mm
Spindle Speed Range0–3000 rpm
Chuck Table Speed0–400 rpm
Z-Axis Travel70 mm
Z-Axis Feed Rate0.1–1000 µm/sec (optional high-resolution mode: 0.01 µm/sec)
Industry Compliance OptionsSECS/GEM interface, MES integration support
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BrandMengqi
OriginImported
Manufacturer TypeAuthorized Distributor
Wafer Size Capacity8-inch
Grinding Wheel OD203 mm
Spindle Speed Range0–6000 rpm
Chuck Rotation Speed0–400 rpm
Z-Axis Stroke130 mm
Z-Axis Feed Rate0.1–1000 µm/sec (optional down to 0.01 µm/sec)
In-situ Thickness Measurement Resolution0.1 µm
In-situ Thickness Repeatability±0.001 mm
Material CompatibilitySi, GaAs, SiC, GaN, Sapphire, and other brittle semiconductor substrates
CustomizationFully configurable chuck, coolant delivery, metrology integration, and process recipe management
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