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| Brand | Nanoscribe |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Quantum X shape |
| Exposure Mode | Proximity-Based Two-Photon Absorption |
| Resolution | 100 nm (feature size) |
| Light Source | Femtosecond Pulsed Near-Infrared Laser |
| Wavelength | 780 nm |
| Intensity Uniformity | ±1% |
| Maximum Exposure Area | 100 mm diameter |
| Surface Roughness (Ra) | ≤ 5 nm |
| Shape Accuracy | ≤ 200 nm |
| Single Print Field Diameter | ≥ 4,000 µm |
| Max Scanning Speed | 6.25 m/s (at 10× objective) |
| Substrate Compatibility | Up to 200 mm (8″) wafers, glass, silicon, opaque substrates |
| Compatible Photoresists | Nanoscribe IP-series (polymer), GP-Silica (glass-like), and third-party resists |
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