- All
- Favorite
- Popular
- Most rated
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | Cluster |
| Substrate Size | 30 × 40 cm |
| Chamber Configuration | 8-port cluster architecture |
| Deposition Methods | Plasma-Enhanced CVD (PECVD), Hot-Wire CVD (HWCVD), DC/RF Sputtering |
| Control System | Fully computer-integrated with programmable process sequencing |
| Category | Cluster-Type Thin-Film Deposition System |
| Import Status | Imported Equipment |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | SiNx-PECVD |
| Throughput | >475 wafers/hr |
| SiNx Film Uniformity | <5% (1σ, across 156 mm × 156 mm wafer) |
| Deposition Technology | RF (13.56 MHz) Plasma-Enhanced CVD |
| Precursor Gases | Silane (SiH₄) and Ammonia (NH₃) |
| Substrate Temperature | 200–400 °C |
| Chamber Configuration | Single-wafer, Load-lock compatible |
| Process Control | Fully automated recipe-based operation with real-time RF power, pressure, and gas flow monitoring |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | Reel-to-Reel Cassette System |
| Web Width | 15 cm – 30 cm |
| Process Capabilities | PECVD, HWCVD, Sputtering |
| Patent | US Patent No. 6,258,408B1 |
| Architecture | 8-Port Cluster Tool with Robotic Cassette Transport |
| Control | Fully Computer-Controlled |
| Chamber Independence | Individual Chamber Servicing Enabled |
| Cross-Contamination Mitigation | Cassette-Based Isolation Between Process Steps |
| Compliance | Designed for GLP/GMP-aligned thin-film R&D environments |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | MVS-PECVD |
| Price | USD $1,000,000 |
| Chamber Configuration | Modular Cluster Tool (8–10 port), In-Line, or Single-Chamber Options |
| Substrate Compatibility | Rigid (15.6×15.6 cm, 30×40 cm) and Flexible Web (15–30 cm width) |
| Deposition Technologies | PECVD, HWCVD, Sputtering, Annealing |
| Vacuum Architecture | High-Vacuum (≤1×10⁻⁷ Torr base pressure) |
| Process Control | Fully Computer-Controlled with Real-Time Parameter Logging |
| In-Situ Characterization Option | Integrated UHV-compatible optical/electrical test module |
Show next