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| Origin | USA |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | DG535 |
| Price | Upon Request |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | Cluster |
| Substrate Size | 30 × 40 cm |
| Chamber Configuration | 8-port cluster architecture |
| Deposition Methods | Plasma-Enhanced CVD (PECVD), Hot-Wire CVD (HWCVD), DC/RF Sputtering |
| Control System | Fully computer-integrated with programmable process sequencing |
| Category | Cluster-Type Thin-Film Deposition System |
| Import Status | Imported Equipment |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | SiNx-PECVD |
| Throughput | >475 wafers/hr |
| SiNx Film Uniformity | <5% (1σ, across 156 mm × 156 mm wafer) |
| Deposition Technology | RF (13.56 MHz) Plasma-Enhanced CVD |
| Precursor Gases | Silane (SiH₄) and Ammonia (NH₃) |
| Substrate Temperature | 200–400 °C |
| Chamber Configuration | Single-wafer, Load-lock compatible |
| Process Control | Fully automated recipe-based operation with real-time RF power, pressure, and gas flow monitoring |
| Origin | Germany |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported Instrument |
| Model | SpecEL-2000-VIS |
| Pricing | Upon Request |
| Brand | Edmund Optics |
|---|---|
| Origin | USA |
| Model | 225 |
| Filter Type | Longpass |
| Substrate Material | Optical Glass (UV-Longpass), Optical Polymer (NIR-Longpass) |
| Transmission Range | UV-Blocking / Visible-Transmitting (UV-LP) or Visible-Blocking / NIR-Transmitting (NIR-LP) |
| Available Diameters | Multiple Standard Sizes (e.g., 12.5 mm, 25 mm, 50 mm) |
| Optical Density (OD) @ Blocking Region | ≥4.0 (typical) |
| Surface Quality | 60–40 scratch-dig |
| Clear Aperture | ≥90% of diameter |
| Operating Temperature | –20 °C to +70 °C (glass) |
| Compliance | RoHS 2015/863/EU, REACH SVHC-free |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | Reel-to-Reel Cassette System |
| Web Width | 15 cm – 30 cm |
| Process Capabilities | PECVD, HWCVD, Sputtering |
| Patent | US Patent No. 6,258,408B1 |
| Architecture | 8-Port Cluster Tool with Robotic Cassette Transport |
| Control | Fully Computer-Controlled |
| Chamber Independence | Individual Chamber Servicing Enabled |
| Cross-Contamination Mitigation | Cassette-Based Isolation Between Process Steps |
| Compliance | Designed for GLP/GMP-aligned thin-film R&D environments |
| Brand | MVSystems |
|---|---|
| Origin | USA |
| Model | MVS-PECVD |
| Price | USD $1,000,000 |
| Chamber Configuration | Modular Cluster Tool (8–10 port), In-Line, or Single-Chamber Options |
| Substrate Compatibility | Rigid (15.6×15.6 cm, 30×40 cm) and Flexible Web (15–30 cm width) |
| Deposition Technologies | PECVD, HWCVD, Sputtering, Annealing |
| Vacuum Architecture | High-Vacuum (≤1×10⁻⁷ Torr base pressure) |
| Process Control | Fully Computer-Controlled with Real-Time Parameter Logging |
| In-Situ Characterization Option | Integrated UHV-compatible optical/electrical test module |
| Brand | Yenista |
|---|---|
| Origin | France |
| Model | XTM(A)-50 |
| Type | Bandwidth-Tunable Tunable Optical Filter |
| Category | Imported Instrument |
| Distribution Status | Authorized Distributor |
| Brand | Edmund Optics |
|---|---|
| Model | NT72-375 |
| Dimensions | 12 in × 12 in × 0.007 in |
| Operating Temperature Range | 20–25 °C (68–77 °F) |
| Material | Cholesteric Liquid Crystal Polymer Film |
| Substrate | Polyester (PET) |
| Response Time | < 1 s |
| Reusability | Fully reversible, >10⁴ thermal cycles |
| Storage Stability | 2 years at 25 °C / 50% RH |
| Compliance | RoHS 2 compliant, REACH SVHC-free |
| Brand | Edmund Optics |
|---|---|
| Origin | USA |
| Model | 226 |
| Diffuser Surface | Frosted White Coating |
| Coating Thickness | 0.45 mm (±0.35 mm, –0.2 mm) |
| Shape Options | Circular or Square |
| Compliance | ISO 10110-7 (Surface Quality), MIL-PRF-13830B (Scratch-Dig) |
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